Patents by Inventor Tatsuo Souda

Tatsuo Souda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240059811
    Abstract: Provided is a monomer composition for which there is little to no concern about safety when used as a raw material or the like in a cosmetic material and that does not cause deterioration in quality such as gelation or the like. A method for manufacturing the monomer composition is also provided. A monomer composition containing a radical polymerizable monomer having a radical polymerizable organic group and an organosilicon-containing organic group in a molecule, wherein a total concentration of a polymerization inhibitor based on a total mass of the radical polymerizable monomer and the polymerization inhibitor is 130 ppm by mass or less.
    Type: Application
    Filed: December 14, 2021
    Publication date: February 22, 2024
    Inventors: Katsuhiro AKIYAMA, Tatsuo SOUDA, Tsunehito SUGIURA
  • Publication number: 20240000693
    Abstract: Provided is a monomer composition which has little to no concern about safety when used as a raw material of a cosmetic material or the like and does not cause deterioration in quality such as gelation. A manufacturing method for the monomer composition is also provided. A radical copolymer composition, comprising a radical copolymer of: a) a radical polymerizable monomer having a radical polymerizable organic group and an organic silicon-containing organic group in a molecule; and b) a radical polymerizable monomer other than component a); wherein the total concentration of a polymerization inhibitor based on the total mass of the radical copolymer and the polymerization inhibitor is 50 ppm by mass or less.
    Type: Application
    Filed: December 14, 2021
    Publication date: January 4, 2024
    Inventors: Katsuhiro AKIYAMA, Tatsuo SOUDA, Tsunehito SUGIURA
  • Patent number: 11820846
    Abstract: A composition comprises: a branched organosilicon compound; an acrylate-functional compound other than the branched organosilicon compound; and optionally a carrier vehicle. The branched organosilicon compound has the following general formula (I): (R1)3Si—X (I); where X comprises a acryloxy-functional moiety, and each R1 is selected from —OSi(R4)3 and R, with the proviso that at least one R1 is —OSi(R4)3; where each R is a substituted or unsubstituted hydrocarbyl group; where each R4 is selected from R, —OSi(R5)3, and —[OSiR2]mOSiR3; where each R5 is selected from R, —OSi(R6)3, and —[OSiR2]mOSiR3; where each R6 is selected from R and —[OSiR2]mOSiR3; with the proviso that at least one of R4, R5 and R6 is —[OSiR2]mOSiR3; and where 0?m?100. A method of preparing a copolymer is further provided.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: November 21, 2023
    Assignees: DOW SILICONES CORPORATION, DOW TORAY CO., LTD.
    Inventors: Nanguo Liu, Tatsuo Souda, Tsunehito Sugiura
  • Publication number: 20220213309
    Abstract: Provided is a copolymer having a carbosiloxane dendrimer structure, where the amount of monomers having a carbosiloxane dendrimer structure is significantly reduced. Also provided is a composition, cosmetic raw material, film-forming agent, and a cosmetic material comprising the copolymer, as well as a method of manufacturing the copolymer and the like. The copolymer is a copolymer of (a1) an unsaturated monomer having a carbosiloxane dendrimer structure having a radically polymerizable organic group, and (a2) an unsaturated monomer having a radically polymerizable vinyl group, which is different from component (a1). The amount of unreacted unsaturated monomers (a1) and saturated monomers derived from the unreacted unsaturated monomers (a1) is 2500 ppm or less relative to the copolymer.
    Type: Application
    Filed: March 12, 2020
    Publication date: July 7, 2022
    Inventors: Tatsuo SOUDA, Tsunehito SUGIURA, Masakado KENNOKI, Masashi MATSUBA
  • Publication number: 20220119597
    Abstract: A branched organosilicon compound (“compound”) is provided having the general formula: (R1)3Si—X—NR2R3, where X is a divalent linking group; R2 is H or R; R3 comprises an acryloxy moiety; each R1 is selected from R and —OSi(R4)3, with the proviso that at least one R1 is —OSi(R4)3; where each R4 is selected from R, —OSi(R5)3, and —[OSiR2]mOSiR3; where each R5 is selected from R, —OSi(R6)3, and —[OSiR2]mOSiR3; and where each R6 is selected from R and —[OSiR2]mOSiR3, with the proviso that at least one of R4, R5 and R6 is —[OSiR2]mOSiR3; 0?m?100; and each R is a substituted or unsubstituted hydrocarbyl group. Also provided is a method of preparing the compound, a copolymer comprising the reaction product of the compound and a second compound reactive with the compound, a method of forming the copolymer, and a composition including at least one of the compound and the copolymer.
    Type: Application
    Filed: December 30, 2019
    Publication date: April 21, 2022
    Inventors: Nanguo LIU, Tatsuo SOUDA, Tsunehito SUGIURA, Michael TELGENHOFF
  • Publication number: 20220112322
    Abstract: A composition comprises: a branched organosilicon compound; an acrylate-functional compound other than the branched organosilicon compound; and optionally a carrier vehicle. The branched organosilicon compound has the following general formula (I): (R1)3Si—X (I); where X comprises a acryloxy-functional moiety, and each R1 is selected from —OSi(R4)3 and R, with the proviso that at least one R is —OSi(R4)3; where each R is a substituted or unsubstituted hydrocarbyl group; where each R4 is selected from R, —OSi(R5)3, and —[OSiR2]mOSiR3; where each R5 is selected from R, —OSi(R6)3, and —[OSiR2]mOSiR3; where each R6 is selected from R and —[OSiR2]mOSiR3; with the proviso that at least one of R4, R5 and R6 is —[OSiR2]mOSiR3; and where 0?m?100. A method of preparing a copolymer is further provided.
    Type: Application
    Filed: December 27, 2019
    Publication date: April 14, 2022
    Inventors: Nanguo LIU, Tatsuo SOUDA, Tsunehito SUGIURA
  • Publication number: 20210386651
    Abstract: A method of designing a film-forming agent for cosmetics, which can form a film having excellent water resistance and excellent sebum resistance while also having high washability, is provided. The method is also useful for designing a cosmetic containing the film-forming agent. The film-forming agent comprises a copolymer, which is formed by polymerizing a monomer composition. The monomer composition comprises: (A) an unsaturated monomer having at least one polysiloxane structure in the molecule; and (B) an unsaturated monomer having at least one acidic group or salt thereof in the molecule; wherein monomer (A) is present in an amount of at least 30 wt % relative to the weight of to the monomer composition.
    Type: Application
    Filed: August 28, 2021
    Publication date: December 16, 2021
    Inventors: Tatsuo SOUDA, Sayuri KIKUNAGA, Seiji HORI
  • Patent number: 11180595
    Abstract: A copolymer having excellent water resistance and sebum resistance while also exhibiting high washability is provided. Also provided is a composition and cosmetic material containing the copolymer. The copolymer is generally polymerized from a monomer composition comprising: (A) a carbosiloxane dendrimer monomer having a radically polymerizable organic group; and (B) an unsaturated monomer having at least one acidic group or a salt thereof per molecule; wherein monomer (A) is present in the monomer composition in an amount greater than or equal to 30 wt. % relative to the weight of the monomer composition, and a weight ratio (A/B) of monomer (A) to monomer (B) is from 1.0 to 20.0.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: November 23, 2021
    Assignee: DOW TORAY CO., LTD.
    Inventors: Tatsuo Souda, Sayuri Kikunaga, Seiji Hori
  • Publication number: 20210188883
    Abstract: A composition comprising: an organosilane having formula (I) (I) X-A-Z, wherein X is —SiR4nR2(3-n) wherein each R4 is independently OR1 or halogen, wherein each R1 in independently hydrogen or C1-4 hydrocarbyl and each R2 is independently C1-4 hydrocarbyl, and n is from 1 to 3, A is C1-10 hydrocarbylene, wherein the backbone of the hydrocarbylene is substituted with one or more oxygen atoms, one or more nitrogen atoms, or carbonyl, Z is a sugar group, a monoglycerol group, a diglycerol group, a polyglycerol group, or a xylitol group, and wherein the composition is a personal care composition, surface treating composition, an antifog composition, a coating composition, a surface treated powder, a paint composition, or an ink composition.
    Type: Application
    Filed: February 21, 2017
    Publication date: June 24, 2021
    Inventors: Michael Salvatore Ferritto, Lenin James Petroff, Tatsuo Souda
  • Publication number: 20200247928
    Abstract: A copolymer having excellent water resistance and sebum resistance while also exhibiting high washability is provided. Also provided is a composition and cosmetic material containing the copolymer. The copolymer is generally polymerized from a monomer composition comprising: (A) a carbosiloxane dendrimer monomer having a radically polymerizable organic group; and (B) an unsaturated monomer having at least one acidic group or a salt thereof per molecule; wherein monomer (A) is present in the monomer composition in an amount greater than or equal to 30 wt. % relative to the weight of the monomer composition, and a weight ratio (A/B) of monomer (A) to monomer (B) is from 1.0 to 20.0.
    Type: Application
    Filed: June 12, 2018
    Publication date: August 6, 2020
    Inventors: Tatsuo SOUDA, Sayuri KIKUNAGA, Seiji HORI
  • Publication number: 20200222300
    Abstract: A film-forming agent for cosmetics, which can form a film having excellent water resistance and excellent sebum resistance while also having high washability is provided. Also provided is a cosmetic containing this film-forming agent. The film-forming agent comprises a copolymer polymerized from a monomer composition. The monomer composition comprises: (A) an unsaturated monomer having at least one polysiloxane structure in the molecule; and (B) an unsaturated monomer having at least one acidic group or salt thereof in the molecule; wherein monomer (A) is present in an amount of at least 30 wt % relative to the weight of the monomer composition.
    Type: Application
    Filed: June 12, 2018
    Publication date: July 16, 2020
    Inventors: Tatsuo SOUDA, Sayuri KIKUNAGA, Seiji HORI
  • Publication number: 20190031691
    Abstract: An organosilane having formula (I) X-A-Z, wherein X is —SiR4nR2(3-n), where each R4 is independently OR1 or halogen, wherein each R1 is independently hydrogen or C1-10 hydrocarbyl and each R2 is independently C1-10 hydrocarbyl, and n is from 1 to 3, A is C1-10 hydrocarbylene, wherein the backbone of the hydrocarbylene is substituted and the substitution comprises one or more oxygen atoms, one or more nitrogen atoms, or carbonyl, Z is a sugar group, a diglycerol group, a polyglycerol group, or a xylitol group, methods of making the organosilane of formula (I), and applications of the organosilane of formula (I).
    Type: Application
    Filed: February 21, 2017
    Publication date: January 31, 2019
    Inventors: Michael Salvatore FERRITTO, Lenin James PETROFF, Tatsuo SOUDA
  • Patent number: 10066060
    Abstract: The present invention relates to a production method for a liquid high-purity organosilicon compound, the method comprising the steps of: adding, to a mixture containing an organosilicon compound selected from a group consisting of organomodified silcones and organomodified silanes and impurities, an organic wax having affinity with the impurities and having a higher melting point than the organosilicon compound, melting and mixing while heating, and introducing the impurities into the melted organic wax; obtaining a solidified product of the organic wax by cooling the organic wax; and performing solid/liquid phase separation on the organosilicon compound and the solidified product of the organic wax. With the present invention, it is possible to provide a useful method for producing a high-purity organosilicon compound stably and on a commercial scale.
    Type: Grant
    Filed: December 26, 2013
    Date of Patent: September 4, 2018
    Assignee: DOW CORNING TORAY CO., LTD.
    Inventors: Seiki Tamura, Tatsuo Souda, Sayuri Sawayama, Seiji Hori
  • Patent number: 9994680
    Abstract: A co-modified organopolysiloxane having a viscosity at 25° C. of not more than 1,500 mPa·s, a group that has a siloxane dendron structure, a hydrophilic group, and expressed by the following general formula (1): R1aR2bL1cQdSiO(4-a-b-c-d)/2 (1). The invention also relates to a powder treatment agent, a powder in oil dispersion, an external use preparation (particularly a cosmetic composition) composition comprising the co-modified organopolysiloxane. In said general formula (1), R1 is a monovalent hydrocarbon group or a hydrogen atom; R2 is a monovalent hydrocarbon group having from 6 to 30 carbons; L1 is a silylalkyl group having a siloxane dendron structure; and Q is a hydrophilic segment.
    Type: Grant
    Filed: December 26, 2012
    Date of Patent: June 12, 2018
    Assignee: DOW CORNING TORAY CO., LTD.
    Inventors: Akito Hayashi, Tomohiro Iimura, Tatsuo Souda, Seiki Tamura, Haruhiko Furukawa
  • Patent number: 9988499
    Abstract: A production method for a liquid high purity sugar derivative-modified silicone or a composition thereof is disclosed. The method comprises the steps of: 1) capturing hydrophilic impurities in solid particles by causing an impurity containing composition containing liquid sugar derivative-modified silicone and the hydrophilic impurities derived from a sugar derivative to contact the solid particles, the sugar derivative being a hydrophilic modifier of the sugar derivative-modified silicone, and the solid particles being able to capture the hydrophilic impurities; and 2) separating the sugar derivative-modified silicone and the solid particles. The method is useful for production of the liquid high purity sugar derivative-modified silicone and the composition thereof on a commercial scale.
    Type: Grant
    Filed: April 20, 2015
    Date of Patent: June 5, 2018
    Assignee: Dow Corning Toray Co., Ltd.
    Inventors: Hideko Maeshima, Sayuri Sawayama, Tatsuo Souda, Seiki Tamura
  • Patent number: 9980897
    Abstract: The present invention provides a novel organopolysiloxane in which a rich hydrophilic property is exhibited, not only superior miscibility with a hydrophilic component and but also a hydrophobic property are exhibited, and superior miscibility with both a silicone oil and a non-silicone oil such as a hydrocarbon oil, an ester oil or the like, and provide various usages of the aforementioned novel organopolysiloxane by developing the superior characteristics thereof such as good surface activity power, a distinctive sensation during use, increased stability and the like. A co-modified organopolysiloxane having a specified chemical structure in which a sugar alcohol-modified group and a long-chain hydrocarbon group are present in one molecule is produced.
    Type: Grant
    Filed: April 28, 2011
    Date of Patent: May 29, 2018
    Assignee: DOW CORNING TORAY CO., LTD.
    Inventors: Seiki Tamura, Tomohiro Ilmura, Tatsuo Souda, Akito Hayashi, Sayuri Sawayama, Haruhiko Furukawa
  • Patent number: 9975999
    Abstract: A liquid organopolysiloxane having fluidity at least 100° C., a silicon-bonded glycerin derivative group, and a crosslinked structure comprising a carbon-silicon bond at the crosslinking portion.
    Type: Grant
    Filed: December 25, 2012
    Date of Patent: May 22, 2018
    Assignee: DOW CORNING TORAY CO., LTD.
    Inventors: Seiki Tamura, Tatsuo Souda, Tomohiro Iimura, Sayuri Sawayama, Seiji Hori, Haruhiko Furukawa
  • Publication number: 20170218129
    Abstract: A production method for a liquid high purity sugar derivative-modified silicone or a composition thereof is disclosed. The method comprises the steps of: 1) capturing hydrophilic impurities in solid particles by causing an impurity containing composition containing liquid sugar derivative-modified silicone and the hydrophilic impurities derived from a sugar derivative to contact the solid particles, the sugar derivative being a hydrophilic modifier of the sugar derivative-modified silicone, and the solid particles being able to capture the hydrophilic impurities; and 2) separating the sugar derivative-modified silicone and the solid particles. The method is useful for production of the liquid high purity sugar derivative-modified silicone and the composition thereof on a commercial scale.
    Type: Application
    Filed: April 20, 2015
    Publication date: August 3, 2017
    Inventors: Hideko MAESHI-MA, Sayuri SAWAYAMA, Tatsuo SOUDA, Seiki TAMURA
  • Patent number: 9688821
    Abstract: A method of producing a glycerin derivative-modified silicone or a composition comprising the same, including a process that treats the glycerin derivative-modified silicone or the composition comprising the same with one or more type of acidic inorganic salt, which is solid at 25° C. and water soluble, and which is such that a pH at 25° C. of an aqueous solution prepared by dissolving 50 g of the acidic inorganic salt in 1 L of ion exchanged water is 4 or lower; and an external use preparation, cosmetic composition, or raw materials thereof that contain the low odor glycerin derivative-modified silicone obtained by the production method.
    Type: Grant
    Filed: December 26, 2012
    Date of Patent: June 27, 2017
    Assignee: DOW CORNING TORAY CO., LTD.
    Inventors: Seiki Tamura, Tatsuo Souda, Seiji Hori
  • Patent number: 9663432
    Abstract: The present invention relates to a monoalkenyl-containing glycerin derivative with purity of not less than 92% and electrical conductivity of not greater than 50 ?S/cm. The monoalkenyl-containing glycerin derivative can be manufactured by a manufacturing method comprising a step (A): a step of reacting a ketalized glycerin derivative and a monoalkenyl glycidyl ether in the presence of an inorganic base to obtain a ketal of monoalkenyl-containing glycerin derivative; a step (B): a step of purifying the ketal of monoalkenyl-containing glycerin derivative obtained in the step (A) by distillation; and a step (C): a step of hydrolyzing the ketal of monoalkenyl-containing glycerin derivative obtained in the step (B). The present invention is able to provide a high-purity monoalkenyl-containing glycerin derivative that was difficult in the past.
    Type: Grant
    Filed: December 26, 2013
    Date of Patent: May 30, 2017
    Assignee: DOW CORNING TORAY CO., LTD.
    Inventors: Tatsuo Souda, Sayuri Sawayama, Tsunehito Sugiura, Seiki Tamura, Seiji Hori