Patents by Inventor Tatsuro Toda

Tatsuro Toda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cured product, modified cured product, and curing method
    Patent number: 11834555
    Abstract: A cured product of a silanol composition comprising a cyclic silanol containing a silanol group and having a cyclic structure formed by a siloxane bond, and a dehydration condensation product thereof, wherein an area ratio of a peak derived from SiO—H stretching observed at 2600 to 3800 cm?1 to an area of a peak derived from Si—O—Si stretching observed at 960 to 1220 cm?1 (SiO—H stretching/Si—O—Si stretching area ratio) is 0.01 or more in an IR spectrum.
    Type: Grant
    Filed: February 19, 2020
    Date of Patent: December 5, 2023
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Kazuhiro Yamauchi, Tomohiro Sugahara, Tatsuro Toda
  • POLYCARBONATE RESIN, POLYCARBONATE RESIN COMPOSITION, OPTICAL MOLDED ARTICLE COMPRISING SAME, AND CYCLIC CARBONATE
    Publication number: 20230192949
    Abstract: A polycarbonate resin comprising a structural unit represented by the following formula (1), wherein weight-average molecular weight Mw measured by size-exclusion chromatography using polymethyl methacrylate as a standard sample is 50,000 or larger and 500,000 or smaller:
    Type: Application
    Filed: January 15, 2021
    Publication date: June 22, 2023
    Applicant: Asahi Kasei Kabushiki Kaisha
    Inventors: Tatsuro Toda, Hisanari Yoneda, Takuto Nakata, Shota Ide, Hiroshi Fukuoka, Katsuhiro Iwase, Masaaki Aramaki, Osamu Haba, Yusuke Tazawa
  • Cured Product, Modified Cured Product, and Curing Method
    Publication number: 20220185964
    Abstract: A cured product of a silanol composition comprising a cyclic silanol containing a silanol group and having a cyclic structure formed by a siloxane bond, and a dehydration condensation product thereof, wherein an area ratio of a peak derived from SiO—H stretching observed at 2600 to 3800 cm?1 to an area of a peak derived from Si—O—Si stretching observed at 960 to 1220 cm?1 (SiO—H stretching/Si—O—Si stretching area ratio) is 0.01 or more in an IR spectrum.
    Type: Application
    Filed: February 19, 2020
    Publication date: June 16, 2022
    Applicant: Asahi Kasei Kabushiki Kaisha
    Inventors: Kazuhiro Yamauchi, Tomohiro Sugahara, Tatsuro Toda