Abstract: A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.

Abstract: A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.

Abstract: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. Resin component (A) is a polymer comprising recurring units of formula (1) wherein R1 is H, CH2 or CF3, R2 is an acid labile group, R3 is H or CO2CH3, X is O, S, CH2 or CH2CH2, 0.01?a<1 and 0.01?b<1. When processed by ArF lithography, the composition forms a pattern with a satisfactory mask fidelity and a minimal LWR.

Abstract: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. Resin component (A) is a polymer comprising recurring units of formula (1) wherein R1 is H, CH2 or CF3, R2 is an acid labile group, R3 is H or CO2CH3, X is O, S, CH2 or CH2CH2, 0.01?a<1 and 0.01?b<1. When processed by ArF lithography, the composition forms a pattern with a satisfactory mask fidelity and a minimal LWR.

Abstract: There is disclosed a resist composition comprising, at least, a polymer including repeating units represented by the following general formula (1). There can be provided a resist composition that has a good barrier property against water, prevents resist components from leaching to water, has high receding contact angle against water, does not require a protective film, has an excellent process applicability, suitable for the liquid immersion lithography and makes it possible to form micropatterns with high precision.

Abstract: A polymer which is obtained from a combination of (meth)acrylate having a bridged ring lactone group and (meth)acrylate having an acid leaving group with a hexafluoroalcohol group is used as a base resin to formulate a positive resist composition which when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and a minimal line edge roughness due to controlled swell during development. The composition also has excellent dry etching resistance.

Abstract: There is disclosed a resist composition comprising, at least, a polymer including repeating units represented by the following general formula (1). There can-be provided a resist composition that has a good barrier property against water, prevents resist components from leaching to water, has high receding contact angle against water, does not require a protective film, has an excellent process applicability, suitable for the liquid immersion lithography and makes it possible to form micropatterns with high precision.

Abstract: A polymer comprising units derived from an exo-form ester and units derived from an ester having two hexafluoroisopropanol groups is used as a base resin to formulate a positive resist composition which, when exposed and developed by photolithography, is minimized in line edge roughness by swelling during development and residue after development, and improved in adhesion.

Abstract: Photoacid generators have formula (1) wherein R1 and R2 are alkyl, or R1 and R2, taken together, may form a C4–C6 ring structure with sulfur, R is hydrogen or alkyl, R? is hydrogen, alkyl, alkoxyl or nitro, n is 1 to 6, and Y? is alkylsulfonate, arylsulfonate, bisalkylsulfonylimide or trisalkylsulfonylmethide.

Abstract: A polymer comprising units derived from an exo-form ester and units derived from an ester having two hexafluoroisopropanol groups is used as a base resin to formulate a positive resist composition which, when exposed and developed by photolithography, is minimized in line edge roughness by swelling during development and residue after development, and improved in adhesion.

Abstract: A polymer which is obtained from a combination of (meth)acrylate having a bridged ring lactone group and (meth)acrylate having an acid leaving group with a hexafluoroalcohol group is used as a base resin to formulate a positive resist composition which when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and a minimal line edge roughness due to controlled swell during development. The composition also has excellent dry etching resistance.

Abstract: Photoacid generators have formula (1) wherein R1 and R2 are alkyl, or R1 and R2, taken together, may form a C4-C6 ring structure with sulfur, R is hydrogen or alkyl, R′ is hydrogen, alkyl, alkoxyl or nitro, n is 1 to 6, and Y− is alkylsulfonate, arylsulfonate, bisalkylsulfonylimide or trisalkylsulfonylmethide. Chemically amplified resist compositions comprising the same have improved resolution, thermal stability, storage stability and minimized line edge roughness.

Abstract: A chemically amplified positive resist composition comprising a base resin and a compound containing two to six functional groups, specifically alkenyloxy, acetal and ortho-ester groups in the molecule is suitable for forming a contact hole pattern by the thermal flow process.

Abstract: There are disclosed a photoresist composition containing at least an &agr;,&bgr;-unsaturated ketone compound, and a patterning method comprising a step of application of a photoresist composition containing at least an &agr;,&bgr;-unsaturated ketone compound to a substrate, a step of, after a heat treatment, exposure with a high energy ray having a wavelength of 500 nm or less, X-ray or electron ray through a photomask, and a step of development with a developer. According to the present invention, there are provided a photoresist composition exhibiting excellent stability as for sensitivity against long term storage and environmental temperature variation, and a patterning method utilizing the photoresist composition.

Abstract: A silacyclohexane compound of the formulas (I) ##STR1## wherein R represents an organic residue, ##STR2## represents an unsubstituted or substituted silicon-containing cyclohexylene group or a 1,4-cyclohexylene group, ##STR3## represents an unsubstituted or substituted phenylene, an unsubstituted or substituted silicon-containing cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, or a 1,4-cyclohexylene group provided that at least one of these residues represents a silicon-containing cyclohexylene group, j, k and l are, respectively, 0 or 1, L.sub.1 and L.sub.2, respectively, represent H or F, m and n are, respectively, 0, 1 or 2 provided that m+n=2, 3 or 4, and X represents H, F or Cl. A liquid crystal composition comprising the silacyclohexane compound of the above formula is also described, along with a liquid crystal device comprising the composition.

Abstract: The invention presents an excellent liquid crystal display composition possessing a negative dielectric anisotropy, comprising one or more compounds selected from the group consisting of formulas I, II, III, IV and V, ##STR1## where R.sup.1 is alkyl, alkoxyalkyl, mono- or difluoroalkyl, or alkenyl, with each group having 2 to 7 carbon atoms; h, i, j, and k denote 0 or 1 with proviso that i+j=1; m is 0, 1 or 2; a six-membered ring expressed by A, B, or C respectively represents any one of trans-1-sila-1,4-cyclohexylene, trans-4-sila-1,4-cyclohexylene, or trans-1,4-cyclohexylene group; L represents F; and L.sup.1 and L.sup.2 represent H or F; n is 0, 1 or 2; and R.sup.2 is H, R.sup.1 or OR.sup.1, in which at least one compound thereof contains trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group.

Abstract: A liquid crystal composition having a liquid crystal component with a chemical structure of two saturated rings connected directly to one another, and an additional structural isomer thereof having a silane atom in a different position from the first component and having the structure set forth in formula (1) hereinbelow. ##STR1## This composition provides an improved effect with respect to enhancement in both response speed and T.sub.NI (nematic-isotropic transition temperature) as a high voltage hold ratio as required for TFT driving in addition to also lowering the voltage.

Abstract: A silacyclohexane compound represented by the following general formula (I). ##STR1## In this formula, R denotes a linear-chain alkyl group with 1-10 carbon atoms, a branched-chain alkyl group with 3-8 carbon atoms, a mono- or di-fluoroalkyl group with 1-10 carbon atoms, an alkoxyalkyl group with 2-7 carbon atoms, or an alkenyl group with 2-8 carbon atoms. ##STR2## is trans-1-silacyclohexylene or trans-4-silacyclohexylene group whose silicon at position 1 or position 4 has a substitutional group(s) of H, F, Cl or CH.sub.3. X denotes a R, OR, CN, F, Cl, CF.sub.3, CF.sub.2 Cl, CHFCl, OCF.sub.3, OCHF.sub.2, OCF.sub.2 Cl, OCHFCl, --(O).sub.m --CY.sub.1 .dbd.CX.sub.1 X.sub.2 (m denotes 0 or 1, Y.sub.1 and X.sub.1 respectively denote H, F or Cl, and X.sub.2 denotes F or Cl) or --O--C.sub.r F.sub.s H.sub.2r+1-s is (r denotes an integral of 2 to 4 and s denotes an integral of 1 to 7) group. Y denotes H or F. Z denotes H or F.

Abstract: Liquid crystal compositions which can improve the low .DELTA.n (refractive index anisotropy) of conventional liquid crystal compositions containing a silacyclohexane compound and which retain a low viscosity and hence show no decrease in response speed. Liquid crystal compositions having a high .DELTA.n of 0.13 to 0.25, a low viscosity of 30 cp or less, a low threshold voltage and a high voltage holding ratio can be obtained by adding thereto, as a required component, a compound having both a silacyclohexane ring and a tolan structure, or a miture of a compound having a silacyclohexane ring and a compound having a tolan structure.

Abstract: This invention provides twisted nematic liquid crystal compositions obtained by adding a cyclohexane ring-containing optically active compound of the following general formula (1) to a mixture of nematic liquid crystal compounds including at least one silacyclohexane compound, as well as guest-host liquid crystal compositions and liquid crystal display devices utilizing the same.