Abstract: A slot antenna plate is placed on a second dielectric for radiating microwave into a chamber interior, the slot antenna plate being provided on a side of the second dielectric that faces the chamber interior. The slot antenna plate is made of conductor and includes slots for passing the microwave therethrough to the chamber interior. In this way, a plasma processing apparatus is provided generating plasma by microwave, the plasma processing apparatus capable of easily adjusting ion irradiation energy for a material to be processed to achieve uniform plasma processing for the material within the plane of the material.

Abstract: It is an object of the invention to provide a backing plate used for the sputtering apparatus and a sputtering method which can improve film deposition rate and film quality without increasing the size of the target with respect to the substrate. High sputtering power is applied to a target portion opposite to a location where a thin film is formed on a surface of a substrate, thereby a thin film having even film thickness and film quality can be formed without increasing the size of the target. Further, a cooling medium flow passage can eliminate temperature unevenness caused by different sputtering powers to be applied to a target surface. The problem caused by the temperature rise can be solved and the film deposition speed can be enhanced by increasing the sputtering power which can be applied to the target. Consequently, it is possible to improve productivity of the substrate.

Abstract: According to a plasma processing method, a process gas supplied into a process chamber is used to generate plasma from the process gas and process a substrate placed in the process chamber by means of the plasma. The substrate includes stacked films of at least two types to be etched by the plasma, and, according to any of the films that is to be etched, a change is made in the process gas in the plasma generation period. Accordingly, the time required for any process except for the main plasma process can be shortened so that the total time for the entire plasma process can be shortened to improve the processing speed.

Abstract: On one side of a microwave entrance window that is exposed to the atmosphere, a slot plate having slots and a resonant unit are provided. The slot plate and the resonant unit are integrally placed to be slidable by linear guides with respect to a process chamber. In this way, a plasma processing apparatus can be provided that performs a highly uniform plasma process and is excellent in terms of plasma generation property.

Abstract: A plasma process apparatus capable of preventing generation of plasma in an unwanted location and performing uniform plasma processing with stability is obtained. The plasma process apparatus includes a processing chamber having an internal wall surface; a microwave radiating member having one wall surface and the other wall surface that faces the internal wall surface of the processing chamber, and being disposed such that a space is formed between the other wall surface and a portion of the internal wall surface, and propagating and radiating microwaves within the processing chamber; and a reactive gas supply member, including a reactive gas supply passage having a space formed between the other wall surface of the microwave radiating member and the internal wall surface; and a microwave transmission preventing member disposed on a region, which faces the reactive gas supply passage, of the other wall surface of the microwave radiating member.

Abstract: A plasma process device capable of forming homogeneous plasma and coping with a large size substrate less costly can be obtained. The plasma process device includes a processing chamber, microwave guiding means, a shower plate and a reaction gas supply passage. The microwave guiding means guides a microwave into the processing chamber. The shower plate has a gas inlet hole to supply to the processing chamber a reaction gas attaining a plasma state by the microwave, and a lower surface facing the processing chamber and an upper surface positioned on the opposite side of the lower surface. The reaction gas supply passage is positioned on the upper surface of the shower plate and supplies the reaction gas to the gas inlet hole. A wall surface of the reaction gas supply passage includes an upper surface of the shower plate and a conductor wall surface opposing the upper surface.

Abstract: A plurality of microwave introduction windows are placed at the top wall of the reaction chamber. Microwaves of the same power are introduced into, e.g., two microwave introduction windows that are equivalent in location relationship with respect to the sidewall of the reaction chamber, while microwaves of different power are introduced into, e.g., two microwave introduction windows that are non-equivalent in location relationship with respect to the sidewall. Thus, a cost-effective plasma process apparatus is obtained which can realize uniform plasma processing even if the plasma being generated within the reaction chamber has varied load impedance.

Abstract: A plasma process device capable of forming homogeneous plasma and coping with a large size substrate less costly can be obtained. The plasma process device includes a processing chamber, microwave guiding device, a shower plate and a reaction gas supply passage. The microwave guiding device guides a microwave into the processing chamber. The shower plate has a gas inlet hole to supply to the processing chamber a reaction gas attaining a plasma state by the microwave, and a lower surface facing the processing chamber and an upper surface positioned on the opposite side of the lower surface. The reaction gas supply passage is a positioned on the upper surface of the shower plate and supplies the reaction gas to the gas inlet hole. A wall surface of the reaction gas supply passage includes an upper surface of the shower plate and a conductor wall surface opposing the upper surface.

Abstract: A plasma process apparatus includes a dielectric plate to emit plasma to a chamber interior, and dielectric plate support members to support a dielectric plate. A plurality of gas introduction holes to supply reaction gas to the chamber interior are provided at the dielectric plate support members. The outlet of the gas introduction hole is open at the side facing the surface of substrate 8, and arranged at a peripheral region outer than dielectric plate 5. Ground potential is applied to a chamber lid and the dielectric plate support members, and bias voltage is applied to the substrate. Accordingly, a low-cost plasma process apparatus that can process uniformly a substrate of a large area using uniform plasma can be obtained.

Abstract: A method of adjusting position of a member including an adjustable portion made of material having shape memory effect, comprising the steps of: (a) heat-treating for shape memory the member in a first shape such that the first shape is memorized in the adjustable portion; (b) plastically deforming the adjustable portion to a second shape after cooling the adjustable portion to less than a shape recovery temperature; and (c) locally heating the adjustable portion to more than the shape recovery temperature so as to subject the adjustable portion to local shape recovery.

Abstract: A magnetic head has a magnetic core structured so that soft magnetic thin films and insulating thin films are stacked alternately. In each layer of the soft magnetic thin films, the thickness of the vicinity of a gap portion is made smaller than that of the other portions. According to this structure, it is possible to decrease a magnetic reluctance of the magnetic core. Such magnetic core is formed by repeating, to a substrate having a plurality of grooves formed thereon, the step of forming a thin film by using self-shadowing effects of a peak portion of the groove and the step of applying an anisotropic etching process.

Abstract: A magnetic recording/reproducing apparatus compares speed information obtained by speed detecting means for a magnetic tape with a set travelling speed of the magnetic tape in a control circuit, and controls the rotational frequency of a driving motor for a take-up reel, thereby controlling constant-speed travelling of the magnetic tape, with employment of no capstan. According to this system, the overall apparatus can be simplified and miniaturized with reduction in weight and cost. Further, it is possible to improve constant-speed travelling performance of the magnetic tape by adjusting resonance and antiresonance appearing due to total equivalent inertia moment related to the magnetic tape and reels in the transfer characteristic of the control system.

Abstract: A magnetic recording/reproducing apparatus compares speed information obtained by speed detecting means for a magnetic tape with a set travelling speed of the magnetic tape in a control circuit, and controls the rotational frequency of a driving motor for a take-up reel, thereby controlling constant-speed travelling of the magnetic tape, with employment of no capstan. According to this system, the overall apparatus can be simplified and miniaturized with reduction in weight and cost. Further, it is possible to improve constant-speed travelling performance of the magnetic tape by adjusting resonance and antiresonance appearing due to total equivalent inertia moment related to the magnetic tape and reels in the transfer characteristic of the control system.

Abstract: A magneto-optical recording/reproducing device which records information by irradiating a light beam of constant intensity on a magneto-optical recording medium while simultaneously applying a magnetic field thereon through a recording magnetic head; and which reproduces the recorded information through a reproducing magnetic head. The magneto-optical recording medium has a magnetic film formed on a translucent substrate and the magnetic field applied through the recording magnetic head reverses in response to the information to be recorded. The recording magnetic head and the reproducing magnetic head are integrally provided on a single magnetic core in order set their positions easily with respect to each other. By making a magnetic core end-face of the reproducing magnetic head smaller than a light beam spot, information recorded on areas smaller than the light beam spot can be reproduced.

Abstract: A magnetic head includes two substrates which are provided with magnetic cores of magnetic film on their surface and are bonded on a plane so that a magnetic gap is defined between the magnetic cores, an edge part of the magnetic cores with the magnetic gap facing to a track of a recording medium being thinned from opposite sides thereof, and the magnetic cores in any other part being thicker than the edge part. In a gap facing plane where a pair of the magnetic cores join together, the magnetic cores are registered with each other so that they can be opposed to each other in a larger width in the back gap than in the front gap. As a result, even if a tolerance of a process in manufacturing is considerably loosened, a magnetic head with high core efficiency can be obtained with a high yield.

Abstract: A magneto-optical recording/reproducing device which records information by irradiating a light beam of constant intensity on a magneto-optical recording medium while simultaneously applying a magnetic field thereon through a recording magnetic head; and which reproduces the recorded information through a reproducing magnetic head. The magneto-optical recording medium has a magnetic film formed on a translucent substrate and the magnetic field applied through the recording magnetic head reverses in response to the information to be recorded. The recording magnetic head and the reproducing magnetic head are integrally provided on a single magnetic core in order to set their positions easily with respect to each other. By making a magnetic core end-face of the reproducing magnetic head smaller than a light beam spot, information recorded on areas smaller than the light beam spot can be reproduced.

Abstract: A method of manufacturing a magnetic head including the steps of forming a plurality of almost V-shaped parallel grooves in a surface of a substrate; forming a soft magnetic thin film larger in thickness than that required for a track width in one well of each of the grooves; processing the soft magnetic thin film at the top portion of the groove walls to a thickness required for the track width by ion milling utilizing a self-shadowing effect of the top portion of the groove walls; filling the grooves with nonmagnetic substance; and performing a finishing process required for completing a magnetic head including the steps of cutting, shaping, polishing, bonding, etc.

Abstract: A method of manufacturing a magnetic head includes a first step of forming rectilinear V grooves on the top surface of a substrate, a second step of forming magnetic films on slant faces of the V grooves, a third step of leveling the top surface of the substrate after filing the V grooves with glass, a forth step of dividing the substrate into first and second substrates, a fifth step of forming grooves for coil winding on the top and bottom surfaces of each substrate, a sixth step of melting the glass of each V groove and bonding the first and second substrates, and a seventh step of slicing the bonded body, the first step including a step of forming the V grooves by means of a first grinding wheel and a step of finishing one of slant faces of the V grooves by means of a second grinding wheel, of which end is V-shaped, so that the slant has smaller surface roughness, the second grinding wheel being shaped such that one of the grinding wheel surfaces comes into contact with one of the slant faces of the V gro

Abstract: Disclosed is a magnetic head core material having very high corrosion resistance even under severe conditions and a method for preparing the same. The material consists of 3 to 6 wt % of aluminum, 7 to 12 wt % of silicon, not more than 3 wt % of chromium and the substantial balance being iron.

Abstract: A production method for producing a high permeability alloy film which includes evaporating an alloy material composed of 1-6 wt % Al, 20-35 wt % Si, and the remainder of iron by irradiating the alloy with an electron beam, and then depositing the vapor from the alloy material onto a substrate for a predetermined time to produce an alloy film composition having a high permeability. The vapor deposition onto the substrate is preferably intercepted with the shutter until the concentration of aluminum of the vapor to be deposited has been decreased to a value between 20 and about 4 wt %.