Abstract: A dye-sensitized solar cell of the present invention including: an electrode having, on one surface, a semiconductor layer with a sensitizing dye supported thereon, a counter electrode positioned opposing the semiconductor layer, and a charge transport layer disposed between the electrode and the counter electrode, wherein at least one of the electrode and the counter electrode is a transparent conductive film prepared by laminating an ITO film and an FTO film, and part or all of the crystal structure of the surface of the FTO film is orthorhombic.

Abstract: A transparent conductive film for lamination on a substrate and comprising an ITO film and an FTO film, wherein a part or all of the crystal structure of a surface of the FTO film is orthorhombic, and a transparent conductive film for lamination on a substrate and comprising an ITO film and an FTO film, wherein the thickness of the FTO film is within a range from 5 nm to 20 nm and the FTO film is a continuous film. A method of producing the transparent conductive films includes depositing the ITO film on a substrate using a pyrosol process, and subsequently depositing the FTO film continuously on top of the ITO film.

Abstract: A dye-sensitized solar cell of the present invention including: an electrode having, on one surface, a semiconductor layer with a sensitizing dye supported thereon, a counter electrode positioned opposing the semiconductor layer, and a charge transport layer disposed between the electrode and the counter electrode, wherein at least one of the electrode and the counter electrode is a transparent conductive film prepared by laminating an ITO film and an FTO film, and part or all of the crystal structure of the surface of the FTO film is orthorhombic.

Abstract: A transparent conductive film for lamination on a substrate and comprising an ITO film and an FTO film, wherein a part or all of the crystal structure of a surface of the FTO film is orthorhombic, and a transparent conductive film for lamination on a substrate and comprising an ITO film and an FTO film, wherein the thickness of the FTO film is within a range from 5 nm to 20 nm and the FTO film is a continuous film. A method of producing the transparent conductive films includes depositing the ITO film on a substrate using a pyrosol process, and subsequently depositing the FTO film continuously on top of the ITO film.

Abstract: A sufficiently high-transparent light transmitting substrate with a transparent conductive film, which is a light transmitting substrate with a transparent conductive film, includes a light transmitting substrate and a continuous transparent conductive film having a thickness of 12 to 2 nm formed on the light transmitting substrate. The transparent conductive film is made of an aggregate of columnar single crystals and has a maximum surface roughness within a range from 1 to 20 nm. It also has an average surface roughness within a range from 0.1 to 10 nm and is a thin film made of a tin-doped indium oxide. Tin atoms are uniformly distributed in the thin film made of the tin-doped indium oxide.