Patents by Inventor Tatsuya Tanihira

Tatsuya Tanihira has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11638895
    Abstract: The filter of a gas sensor comprises an inorganic porous support supporting both an organic sulfonic acid compound including sulfo group (—SO3H) and a Lewis acid having at least a metal element of transitional metal elements, Al element, Ga element, In element, Ge element, and Sn element. The Lewis acid loaded in the inorganic porous support adsorbs low concentration siloxanes. The organic sulfonic acid compound including sulfo group polymerizes adsorbed siloxanes in the filter so as not to desorb from the filter.
    Type: Grant
    Filed: February 19, 2018
    Date of Patent: May 2, 2023
    Assignees: Figaro Engineering Inc., University Public Corporation Osaka
    Inventors: Masato Takeuchi, Junpei Furuno, Tatsuya Tanihira, Kenichi Yoshioka
  • Publication number: 20210310906
    Abstract: Siloxane compounds are removed from the atmospheres by silica supporting an organic sulfonic acid compound. The silica with the organic sulfonic acid compound has a specific surface area down to 500 m2/g and up to 750 m2/g and a pore volume down to 0.8 m3/g and up to 1.2 m3/g, both measured by nitrogen gas adsorption method and has a pore diameter down to 4 nm and up to 8 nm, at the peak of differential pore volume measured by nitrogen gas adsorption method. The durability of gas sensing element against siloxanes is improved.
    Type: Application
    Filed: May 1, 2020
    Publication date: October 7, 2021
    Inventors: Masato TAKEUCHI, Junpei FURUNO, Kenta FUKUI, Kenichi YOSHIOKA, Tatsuya TANIHIRA, Masakazu SAI, Takafumi TANIGUCHI, Hirokazu MITSUHASHI
  • Publication number: 20200001223
    Abstract: The filter of a gas sensor comprises an inorganic porous support supporting both an organic sulfonic acid compound including sulfo group (—SO3H) and a Lewis acid having at least a metal element of transitional metal elements, Al element, Ga element, In element, Ge element, and Sn element. The Lewis acid loaded in the inorganic porous support adsorbs low concentration siloxanes. The organic sulfonic acid compound including sulfo group polymerizes adsorbed siloxanes in the filter so as not to desorb from the filter.
    Type: Application
    Filed: February 19, 2018
    Publication date: January 2, 2020
    Inventors: Masato Takeuchi, Junpei Furuno, Tatsuya Tanihira, Kenichi Yoshioka