Abstract: An electrical storage device may allow producing an electrical storage device electrode excellent in adhesiveness and with satisfactory charge-discharge durability characteristics. Such compositions for an electrical storage device may include: polymer particles (A); a polymer (B); and a liquid medium (C), wherein the polymer particles (A) each contain, with respect to 100 parts by mass in total of repeating units in the polymer particle (A), 20 to 65 parts by mass of a repeating unit (a1) derived from a conjugated diene compound, and 1 to 40 parts by mass of a repeating unit (a2) derived from an ?,?-unsaturated nitrile compound, and wherein the polymer (B) contains, with respect to 100 parts by mass in total of repeating units contained in the polymer (B), 5 to 95 parts by mass of a repeating unit (b1) derived from an unsaturated carboxylic acid, and 5 to 95 parts by mass of a repeating unit (b2) derived from (meth)acrylamide.

Abstract: The object of the present invention is to provide a thermoplastic polymer composition which is excellent in the impact resistance, a fracture morphology and rigidity, as well as has a possibility of the effect for reducing environmental load. The thermoplastic resin composition comprises 15 to 85% by mass of aliphatic polyester-based resin (A) comprising the following (AI) and (AII) components, and 15 to 85% by mass of styrene-based resin (B) which is at least one selected from the group consisting of the following (BI) to (BIII). The above (AI) is an aliphatic polyester-based resin having units formed from an aliphatic diol and/or an alicyclic diol and an aliphatic dicarboxylic acid (including derivatives thereof) and/or an alicyclic dicarboxylic (including derivatives thereof) as repeating units, and the above (AII) is a polylactic acid-based aliphatic polyester resin having not less than 70 mol % of lactic acid unit content.

Abstract: A thermoplastic polymer composition capable of exhibiting excellent impact resistance, durability and destaticizing property containing (A) 50 to 95% by mass of an aliphatic polyester-based resin and (B) 5 to 50% by mass of a block copolymer of (B1) a hard segment block with at least one of a polyamide, polyester, polyolefin or polyurethane, and (B2) a soft segment block having an ether bond.

Abstract: A thermoplastic polymer composition capable of exhibiting excellent impact resistance, durability and destaticizing property containing (A) 50 to 95% by mass of an aliphatic polyester-based resin and (B) 5 to 50% by mass of a block copolymer of (B1) a hard segment block with at least one of a polyamide, polyester, polyolefin or polyurethane, and (B2) a soft segment block having an ether bond.

Abstract: The present invention provides a thermoplastic polymer composition capable of exhibiting excellent impact resistance, durability and destaticizing property. The present invention relates to a thermoplastic polymer composition comprising (A) 50 to 95% by mass of an aliphatic polyester-based resin and (B) 5 to 50% by mass of a block copolymer comprising (B1) a hard segment block comprising at least one polymer selected from the group consisting of a polyamide, a polyester, a polyolefin and a polyurethane, and (B2) a soft segment block having an ether bond, with the proviso that a total amount of the components (A) and (B) is 100% by mass.

Abstract: The object of the present invention is to provide a thermoplastic polymer composition which is excellent in the impact resistance, a fracture morphology and rigidity, as well as has a possibility of the effect for reducing environmental load. The thermoplastic resin composition comprises 15 to 85% by mass of aliphatic polyester-based resin (A) comprising the following (AI) and (AII) components, and 15 to 85% by mass of styrene-based resin (B) which is at least one selected from the group consisting of the following (BI) to (BIII). The above (AI) is an aliphatic polyester-based resin having units formed from an aliphatic diol and/or an alicyclic diol and an aliphatic dicarboxylic acid (including derivatives thereof) and/or an alicyclic dicarboxylic (including derivatives thereof) as repeating units, and the above (AII) is a polylactic acid-based aliphatic polyester resin having not less than 70 mol % of lactic acid unit content.

Abstract: The present invention provides a thermoplastic resin composition excellent in impact resistance, delamination resistance and surface appearance The present invention relates to a thermoplastic resin composition comprising: 5 to 95% by mass of an aliphatic polyester (A), 4 to 94% by mass of an olefin-based resin (B) and 1 to 40% by mass of an aromatic vinyl-based polymer (C) where the total amount of component (A), component (B) and component (C) is 100% by mass, the aromatic vinyl-based polymer (C) being at least one selected from: an aromatic vinyl-based polymer (C1) which is an elastomer comprising a block copolymer comprising a polymer block mainly comprising an aromatic vinyl compound and a polymer block mainly comprising a conjugated diene compound, an aromatic vinyl-based polymer (C2) which is an elastomer obtained by hydrogenation of the aromatic vinyl-based polymer (C1), and an aromatic vinyl-based polymer (C3) which is a graft copolymer obtained by polymerizing a vinyl-based monomer containing an

Abstract: The present invention provides a thermoplastic polymer composition capable of exhibiting excellent impact resistance, durability and destaticizing property. The present invention relates to a thermoplastic polymer composition comprising (A) 50 to 95% by mass of an aliphatic polyester-based resin and (B) 5 to 50% by mass of a block copolymer comprising (B) a hard segment block comprising at least one polymer selected from the group consisting of a polyamide, a polyester, a polyolefin and a polyurethane, and (B2) a soft segment block having an ether bond, with the proviso that a total amount of the components (A) and (B) is 100% by mass.

Abstract: A novel photoacid generator containing a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z1 and Z2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

Abstract: A sulfonyloxime compound is provided which is represented by a general formula (1): wherein, R1 represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R2 represents an alkyl group, an aryl group, or a heteroaryl group; X represents a halogen atom; Y represents —R3, a —CO—R3 group, —COO—R3 group, —CONR3R4 group, —S—R3 group, —SO—R3 group, —SO2—R3 group, a —CN group or a —NO2 group, and R3 and R4 within the Y group each represent a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group, although any two of R1, R2 and R3 may also be bonded together to form a cyclic structure, and furthermore dimers of a compound represented by the general formula (1) in which R1, R2 or Y groups from separate molecules are bonded together to form a single bivalent group, are also possible.

Abstract: A novel photoacid generator containing a structure of the following formula (I), 1

Abstract: A sulfonyloxime compound is provided which is represented by a general formula (1): 1