Patents by Inventor Tatsuya UTAMURA
Tatsuya UTAMURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240391859Abstract: Provided is an aldehyde composition including an aldehyde represented by General Formula (1) below and an aldehyde represented by General Formula (2) below, and a mass ratio between the aldehyde represented by Formula (1) and the aldehyde represented by Formula (2), [(1)/(2)], is from 96/4 to 99.9/0.1: where R represents a methyl group or a hydrogen atom.Type: ApplicationFiled: September 6, 2022Publication date: November 28, 2024Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Tatsuya UTAMURA, Junya NISHIUCHI
-
Patent number: 12145903Abstract: An object of the present invention is to provide a method for producing 2,4-dialkylbenzaldehyde with excellent conversion rate and yield, and excellent regioselectivity for formylation, by allowing carbon monoxide to react on a starting material containing a specific m-dialkylbenzene in the presence of hydrogen fluoride and boron trifluoride. The method for producing 2,4-dialkylbenzaldehyde according to the present invention comprises a step of allowing carbon monoxide to react on a starting material containing m-dialkylbenzene represented by formula (1) in the presence of hydrogen fluoride and boron trifluoride for formylation at least at a position (a), wherein the starting material is a dialkylbenzene containing more than 90 mol % of m-dialkylbenzene represented by formula (1), and the number of moles of boron trifluoride relative to 1 mole of m-dialkylbenzene represented by formula (1) is 0.7 mol or more and 3.Type: GrantFiled: October 16, 2020Date of Patent: November 19, 2024Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toru Shishimi, Tatsuya Utamura, Yutaka Matsuura, Shinichi Nagao
-
Patent number: 12024487Abstract: An object of the present invention is to provide a method for producing m-dialkylbenzaldehyde by using a reaction starting material containing 1,4-dialkylbenzene. The method for producing m-dialkylbenzaldehyde represented by formula (3), comprising a step of allowing carbon monoxide to react on a reaction starting material containing 1,4-dialkylbenzene represented by formula (1) in the presence of a Bronsted acid and a Lewis acid, wherein the reaction starting material is 1,4-dialkylbenzene represented by formula (1), or a mixture of 1,4-dialkylbenzene represented by formula (1) and 1,3-dialkylbenzene represented by formula (2), containing 10 mol % or more of the 1,4-dialkylbenzene represented by formula (1), wherein in formulae (1) to (3), R1 represents a methyl group or an ethyl group, and R2 represents a chain or cyclic alkyl group having 3 or more and 6 or less carbon atoms that has a tertiary carbon at the benzyl position.Type: GrantFiled: July 27, 2020Date of Patent: July 2, 2024Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toru Shishimi, Tatsuya Utamura, Yutaka Matsuura, Tatsuyuki Kumano
-
Patent number: 11987545Abstract: An object of the present invention is to provide a method for producing m-dialkylbenzaldehyde by using a reaction starting material containing 1,4-dialkylbenzene. The method for producing m-dialkylbenzaldehyde represented by formula (3), comprising a step of allowing carbon monoxide to react on a reaction starting material containing 1,4-dialkylbenzene represented by formula (1) in the presence of a Bronsted acid and a Lewis acid, wherein the reaction starting material is 1,4-dialkylbenzene represented by formula (1), or a mixture of 1,4-dialkylbenzene represented by formula (1) and 1,3-dialkylbenzene represented by formula (2), containing 10 mol % or more of the 1,4-dialkylbenzene represented by formula (1), wherein in formulae (1) to (3), R1 represents a methyl group or an ethyl group, and R2 represents a chain or cyclic alkyl group having 3 or more and 6 or less carbon atoms that has a tertiary carbon at the benzyl position.Type: GrantFiled: July 27, 2020Date of Patent: May 21, 2024Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toru Shishimi, Tatsuya Utamura, Yutaka Matsuura, Tatsuyuki Kumano
-
Publication number: 20240132434Abstract: An object of the present invention is to provide a method for producing 2,4-dialkylbenzaldehyde with excellent conversion rate and yield, and excellent regioselectivity for formylation, by allowing carbon monoxide to react on a starting material containing a specific m-dialkylbenzene in the presence of hydrogen fluoride and boron trifluoride. The method for producing 2,4-dialkylbenzaldehyde according to the present invention comprises a step of allowing carbon monoxide to react on a starting material containing m-dialkylbenzene represented by formula (1) in the presence of hydrogen fluoride and boron trifluoride for formylation at least at a position (a), wherein the starting material is a dialkylbenzene containing more than 90 mol % of m-dialkylbenzene represented by formula (1), and the number of moles of boron trifluoride relative to 1 mole of m-dialkylbenzene represented by formula (1) is 0.7 mol or more and 3.Type: ApplicationFiled: October 16, 2020Publication date: April 25, 2024Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toru SHISHIMI, Tatsuya UTAMURA, Yutaka MATSUURA, Shinichi NAGAO
-
Publication number: 20230399284Abstract: An aldehyde composition containing an aldehyde represented by Formula (1) and an aldehyde represented by Formula (2) is provided. A mass ratio [(1)/(2)] of the aldehyde represented by Formula (1) to the aldehyde represented by Formula (2) is from 96/4 to 99.97/0.03.Type: ApplicationFiled: November 2, 2021Publication date: December 14, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Tatsuya UTAMURA, Junya NISHIUCHI
-
Patent number: 11725161Abstract: The present invention has an object of providing a carboxylate compound that is useful as a raw material for fragrance compositions and has a fruity aroma, a method for producing the same, and a fragrance composition containing the carboxylate compound. The carboxylate compound of the present invention is represented by Formula (1). where, R is an alkyl group having from 2 to 6 carbons.Type: GrantFiled: November 7, 2019Date of Patent: August 15, 2023Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Yutaka Matsuura, Tatsuya Utamura, Tomohiko Hakamata
-
Publication number: 20220363622Abstract: An object of the present invention is to provide a method for producing m-dialkylbenzaldehyde by using a reaction starting material containing 1,4-dialkylbenzene. The method for producing m-dialkylbenzaldehyde represented by formula (3), comprising a step of allowing carbon monoxide to react on a reaction starting material containing 1,4-dialkylbenzene represented by formula (1) in the presence of a Bronsted acid and a Lewis acid, wherein the reaction starting material is 1,4-dialkylbenzene represented by formula (1), or a mixture of 1,4-dialkylbenzene represented by formula (1) and 1,3-dialkylbenzene represented by formula (2), containing 10 mol % or more of the 1,4-dialkylbenzene represented by formula (1), wherein in formulae (1) to (3), R1 represents a methyl group or an ethyl group, and R2 represents a chain or cyclic alkyl group having 3 or more and 6 or less carbon atoms that has a tertiary carbon at the benzyl position.Type: ApplicationFiled: July 27, 2020Publication date: November 17, 2022Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toru SHISHIMI, Tatsuya UTAMURA, Yutaka MATSUURA, Tatsuyuki KUMANO
-
Publication number: 20220252979Abstract: A photosensitive resin composition including a polyimide resin (A) having a specific structure and a weight average molecular weight of 70000 or less is provided.Type: ApplicationFiled: May 27, 2020Publication date: August 11, 2022Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Yumi SATO, Tatsuyuki KUMANO, Tatsuya UTAMURA, Daichi MIYAHARA
-
Publication number: 20220041955Abstract: The present invention has an object of providing a carboxylate compound that is useful as a raw material for fragrance compositions and has a fruity aroma, a method for producing the same, and a fragrance composition containing the carboxylate compound. The carboxylate compound of the present invention is represented by Formula (1). where, R is an alkyl group having from 2 to 6 carbons.Type: ApplicationFiled: November 7, 2019Publication date: February 10, 2022Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Yutaka MATSUURA, Tatsuya UTAMURA, Tomohiko HAKAMATA
-
Patent number: 10737993Abstract: The present invention provides a method for producing indancarbaldehyde, including a step of reacting indan with carbon monoxide in the presence of hydrogen fluoride and boron trifluoride to obtain a reaction liquid including indancarbaldehyde, wherein the indan includes an amine, and a content of the amine is less than 1000 ppm by mass.Type: GrantFiled: March 9, 2018Date of Patent: August 11, 2020Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventor: Tatsuya Utamura
-
Publication number: 20200140360Abstract: The present invention provides a method for producing indancarbaldehyde, including a step of reacting indan with carbon monoxide in the presence of hydrogen fluoride and boron trifluoride to obtain a reaction liquid including indancarbaldehyde, wherein the indan includes an amine, and a content of the amine is less than 1000 ppm by mass.Type: ApplicationFiled: March 9, 2018Publication date: May 7, 2020Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventor: Tatsuya UTAMURA