Patents by Inventor Tatsuya Yamahira

Tatsuya Yamahira has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20240302740
    Abstract: A sulfonium salt consisting of a carboxylate anion having a hydroxy group and fluorine or trifluoromethyl at ?- or ?-position and a phenyldibenzothiophenium cation having a hydrocarbylcarbonyl or hydrocarbyloxycarbonyl group has a high decomposition efficiency and a high acid diffusion controlling ability upon exposure. A resist composition comprising the sulfonium salt offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: January 30, 2024
    Publication date: September 12, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tatsuya Yamahira, Jun Hatakeyama, Takayuki Fujiwara, Yuki Suda
  • RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20240210830
    Abstract: A resist composition is provided comprising (A) a polymer comprising repeat units having an acid labile group, (B) an organic solvent, and (C) an onium salt having formula: Zq+Xq? wherein Zq+ is a sulfonium, iodonium or ammonium cation, and Xq? is an anion. When processed by high-energy radiation lithography, the resist composition exhibits satisfactory sensitivity. LWR and maximum resolution and is resistant to pattern collapse.
    Type: Application
    Filed: November 10, 2023
    Publication date: June 27, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Kazuhiro Katayama, Tatsuya Yamahira, Yutaro Otomo, Kousuke Ohyama
  • SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20240176238
    Abstract: A sulfonium salt of specific structure has a high decomposition efficiency and a high acid diffusion controlling ability upon exposure. A resist composition comprising the sulfonium salt offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: October 20, 2023
    Publication date: May 30, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Jun Hatakeyama, Tatsuya Yamahira, Yuki Suda
  • RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20240176235
    Abstract: A resist composition comprising a quencher containing a sulfonium salt composed of a C5-C20 aromatic carboxylic acid anion substituted with a halogen atom or a halogen atom-containing group and a sulfonium cation having the following formula (1).
    Type: Application
    Filed: September 21, 2023
    Publication date: May 30, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tatsuya Yamahira, Takayuki Fujiwara, Yuki Suda
  • RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20240168382
    Abstract: A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having formula (1).
    Type: Application
    Filed: September 20, 2023
    Publication date: May 23, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tatsuya Yamahira, Yuki Suda
  • RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20240160101
    Abstract: A resist composition comprising a sulfonium salt composed of a sulfonate anion having a carbon atom to which an iodine atom is bonded and a sulfonium cation having the formula (1) exhibits a high sensitivity and reduced LWR or improved CDU.
    Type: Application
    Filed: September 20, 2023
    Publication date: May 16, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tatsuya Yamahira, Yuki Suda