Abstract: A grounded electrode and a high-voltage applying electrode, each obtained by covering a metal electrode with a dielectric are housed at least within a reactor apparatus. A rare gas can be introduced in the apparatus by way of a gas delivery tube, and a monomer gas can be admitted in the apparatus by way of a gas delivery tube. An additional gas may also be introduced in the apparatus by way of a gas delivery tube. The employed gases may be discharged from within the reactor by way of a discharge tube. Powders are charged in the apparatus with a rare gas, monomer gas, or combination thereof and, optionally, additional gases may be included, the gas components being selected based upon what type of electrical power is to be treated. Powers ape supplied to the electrodes to induce atmospheric-pressure plasma reactions, thereby modifying or enhancing the characteristics of the powders.

Abstract: An objective of the present invention is to provide a cylindrical, continuous plasma-processing apparatus capable of modifying the surface of a longitudinal substrate by a plasma process without the use of a vacuum, which has been required in the prior art.The cylindrical, continuous plasma-processing apparatus is comprised of, as a major portion, a hollow cylinder formed of a porous outer periphery wall made of ceramics, rubbers, or glass, a porous network electrode, and a dielectric inner periphery wall. The interior of this cylinder portion contains a metallic pipe whose surface is covered by a dielectric wall such that when a gas is introduced therein, the gas can be diffused into the cylinder portion through perforations. In a space between the cylinder portion and the metallic pipe, there is an antenna, the surface of which is covered by a dielectric.

Abstract: A method is disclosed for the treatment of a powder by use of a plasma reactor under atmospheric pressure, comprising the steps of providing a reaction chamber having first and second electrodes covered with a dielectric, an upper gas exhaust means and a lower gas inlet means, feeding a fluidizing gas comprising a rare gas, a monomer gas or a mixture thereof through said gas inlet means into said chamber to agitate a powder to be treated in said chamber, concurrently removing said gas from said chamber through said gas exhaust means; and generating a glow plasma under atmospheric pressure in said chamber by applying a voltage to said first electrode and grounding said second electrode whereby said powder is provided with an anticorrosive surface treatment.