Abstract: A method and system for manufacturing an MIM capacitor for utilization with a logic-based embedded DRAM device. At least one transistor, an interlayer dielectric, at least one contact and at least one metal one layer are generally formed on a substrate during a front end manufacturing operation of the capacitor on the substrate. An inter-metal dielectric layer is deposited upon the substrate, followed thereafter by a chemical mechanical polishing operation. Additionally, a lithographic operation is performed upon the substrate. Also, at least one dielectric deposition layer is generally on the substrate, followed thereafter by a chemical mechanical polishing operation and a stop on an oxide layer formed on the substrate. At least one metal two layer may then be formed on substrate and associated layers thereof, thereby resulting in the formation of a capacitor fully compatible with logic-based devices and processes thereof.

Abstract: A method and system for manufacturing an MIM capacitor for utilization with a logic-based embedded DRAM device. At least one transistor, an interlayer dielectric, at least one contact and at least one metal one layer are generally formed on a substrate during a front end manufacturing operation of the capacitor on the substrate. An inter-metal dielectric layer is deposited upon the substrate, followed thereafter by a chemical mechanical polishing operation. Additionally, a lithographic operation is performed upon the substrate. Also, at least one dielectric deposition layer is generally on the substrate, followed thereafter by a chemical mechanical polishing operation and a stop on an oxide layer formed on the substrate. At least one metal two layer may then be formed on substrate and associated layers thereof, thereby resulting in the formation of a capacitor fully compatible with logic-based devices and processes thereof.