Patents by Inventor Te Ching Chang

Te Ching Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240166807
    Abstract: A polyethylene terephthalate (PET) copolyester and a manufacturing method thereof are provided. The manufacturing method includes the following steps. A dispersion slurry including a talcum powder is formulated, wherein the talcum powder has an average particle size of 1 ?m to 50 ?m and an average specific surface area of 7 m2/g to 20 m2/g. Next, a terephthalic acid and an ethylene glycol are mixed, and the dispersion slurry and a crystallization accelerator are introduced, so as to carry out a transesterification reaction and therefore form a bis-2-hydroxylethyl terephthalate (BHET). Afterwards, a prepolymerization reaction and a polycondensation reaction are carried out to form a polyethylene terephthalate (PET) copolyester.
    Type: Application
    Filed: December 30, 2022
    Publication date: May 23, 2024
    Applicant: NAN YA PLASTICS CORPORATION
    Inventors: Te-Chao Liao, Han-Ching Hsu, Chen-Wei Chang
  • Publication number: 20240124643
    Abstract: A method for producing a polyester polyol is provided, which includes: feeding a first antioxidant and a raw material reactant that includes a polyacid and a polyol into a reactor; subjecting the polyacid and the polyol to an esterification reaction to form an oligomer; and performing a prepolymerization reaction on the oligomer to obtain a prepolymerization reactant. During the prepolymerization reaction, the method includes sampling and monitoring an acid value of the prepolymerization reactant. When the acid value of the prepolymerization reactant reaches a first acid value, an esterification reaction catalyst is added to the prepolymerization reactant for carrying out a polycondensation reaction and generating a polycondensation reactant that contains the polyester polyol. During the polycondensation reaction, the method includes sampling and monitoring an acid value of the polycondensation reactant.
    Type: Application
    Filed: November 30, 2022
    Publication date: April 18, 2024
    Inventors: TE-CHAO LIAO, HAN-CHING HSU, CHEN-WEI CHANG
  • Patent number: 8734901
    Abstract: A film deposition method of depositing a thin film by alternately supplying at least a first source gas and a second source gas to a substrate is disclosed. The film deposition method includes steps of evacuating a process chamber where the substrate is accommodated, without supplying any gas to the process chamber; supplying an inert gas to the process chamber until a pressure within the process chamber becomes a predetermined pressure; supplying the first source gas to the process chamber filled with the inert gas at the predetermined pressure without evacuating the process chamber; stopping supplying the first source gas to the process chamber and evacuating the process chamber; supplying the second source gas to the process chamber; and stopping supplying the second source gas to the process chamber and evacuating the process chamber.
    Type: Grant
    Filed: February 22, 2012
    Date of Patent: May 27, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Keisuke Suzuki, Pao-Hwa Chou, Te ching Chang
  • Publication number: 20120269969
    Abstract: A film deposition method of depositing a thin film by alternately supplying at least a first source gas and a second source gas to a substrate is disclosed. The film deposition method includes steps of evacuating a process chamber where the substrate is accommodated, without supplying any gas to the process chamber; supplying an inert gas to the process chamber until a pressure within the process chamber becomes a predetermined pressure; supplying the first source gas to the process chamber filled with the inert gas at the predetermined pressure without evacuating the process chamber; stopping supplying the first source gas to the process chamber and evacuating the process chamber; supplying the second source gas to the process chamber; and stopping supplying the second source gas to the process chamber and evacuating the process chamber.
    Type: Application
    Filed: February 22, 2012
    Publication date: October 25, 2012
    Applicant: Tokyo Electron Limited
    Inventors: Keisuke SUZUKI, Pao-Hwa Chou, Te Ching Chang