Patents by Inventor Te-Feng Wang

Te-Feng Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140060431
    Abstract: An atomic layer deposition system with multiple flows comprises: a square vacuum chamber, which internally has four pairs of intakes and vents to control the flowing in-and-out of precursors and improve the quality of coating and the coating uniformity of an asymmetrical testing member; plural gas detection sensors, which monitor the states of the exhausting of the precursors in the chamber and automatically controls and alarms for the amount of the induction of the precursors to prevent the obstruction of the vents; and a discrete pyramidal cover, which has a precursor intake in the top of the cover, the pipelines of the induction of the precursors and the pipelines of the four pairs of the intakes and the vents are integrated in order to cooperate with the cover while coating a three-dimensional element, a vertical flow field of the precursors is then produced from top to bottom in the cover.
    Type: Application
    Filed: July 9, 2013
    Publication date: March 6, 2014
    Inventors: Rwei-Ching Chang, Tsai-Cheng Li, Chen-Pei Yeh, Hsi-Ting Hou, Te-Feng Wang, Fa-Ta Tsai