Abstract: In a cooling station having lifter pins positioned within respective sockets, the lifter pins being positioned for translational movement within platform openings, the improvement comprising forming the lifter pins of aluminum or polymer. A cooling station comprising a cooling station body, a series of sockets affixed to the cooling station body a respective series of lifter pins comprised of aluminum or polymer affixed to the series of sockets, and an platform positioned on the cooling station body. The platform having respective openings positioned above the series of sockets and lifter pins for translational movement of the lifter pins into the platform openings.

Abstract: Provided are a device and method for a programmable hand-held device for use in a semiconductor manufacturing environment. In one example, the device includes an interface, a processor, an input device, and a memory. The interface may establish a connection between the device and at least one of the process tools. The processor may process executable instructions. The input device may receive input instructions for programming a specific type of tool. The memory contains the executable instructions, which may be divided into multiple subsets of instructions, where each subset is adapted for communication with a specific type of tool. The instructions may include identifying the specific type of tool referenced by the input instructions, selecting the subset of instructions adapted for communication with the selected specific type of tool, and programming the selected specific type of tool via the interface using the subset of instructions and the input instructions.

Abstract: A novel landing uniformity ring for an etch chamber is disclosed. The landing uniformity ring includes an annular ring body defining a ring opening and an increased-diameter inner flange extending inwardly from the ring body, into the ring opening. When mounted in a landing uniformity ring assembly, the inner flange is disposed at a horizontal gap distance with respect to the edge of the wafer which improves the flow efficiency of exhaust gases in the etch chamber. This prevents the accumulation of polymer residues on the assembly and reduces the incidence of particle-related defects in devices being fabricated on a wafer.

Abstract: In a cooling station having lifter pins positioned within respective sockets, the lifter pins being positioned for translational movement within platform openings, the improvement comprising forming the lifter pins of aluminum or polymer. A cooling station comprising a cooling station body, a series of sockets affixed to the cooling station body a respective series of lifter pins comprised of aluminum or polymer affixed to the series of sockets, and an platform positioned on the cooling station body. The platform having respective openings positioned above the series of sockets and lifter pins for translational movement of the lifter pins into the platform openings.

Abstract: Provided are a device and method for a programmable hand-held device for use in a semiconductor manufacturing environment. In one example, the device includes an interface, a processor, an input device, and a memory. The interface may establish a connection between the device and at least one of the process tools. The processor may process executable instructions. The input device may receive input instructions for programming a specific type of tool. The memory contains the executable instructions, which may be divided into multiple subsets of instructions, where each subset is adapted for communication with a specific type of tool. The instructions may include identifying the specific type of tool referenced by the input instructions, selecting the subset of instructions adapted for communication with the selected specific type of tool, and programming the selected specific type of tool via the interface using the subset of instructions and the input instructions.

Abstract: A parallel ruler comprises a frame, and a plurality of gauges disposed in a flat portion of the frame. The gauges have compressible parts protruding downward beyond a lower surface of the frame for measuring a distance to a plane.

Abstract: An apparatus and method for preventing damage to a chamber wall by a baffle plate in a semiconductor fabrication system during a semiconductor fabrication operation is disclosed herein. An electrostatic chuck is associated with the semiconductor fabrication system. A gauge for measuring a gap between said baffle plate and the chamber wall can be utilized to prevent damage to the chamber wall by the baffle plate during a movement of the electrostatic chunk during the semiconductor fabrication operation. Such a semiconductor fabrication operation can comprise, for example, a wet cleaning semiconductor operation.

Abstract: An apparatus and method for preventing damage to a chamber wall by a baffle plate in a semiconductor fabrication system during a semiconductor fabrication operation is disclosed herein. An electrostatic chuck is associated with the semiconductor fabrication system. A gauge for measuring a gap between said baffle plate and the chamber wall can be utilized to prevent damage to the chamber wall by the baffle plate during a movement of the electrostatic chunk during the semiconductor fabrication operation. Such a semiconductor fabrication operation can comprise, for example, a wet cleaning semiconductor operation.