Patents by Inventor Te-Yi Chang

Te-Yi Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11675266
    Abstract: A patterning method includes providing a photosensitive composition on a material layer. The photosensitive composition includes one part by weight of a photo sensitive compound, 1.5 to 8 parts by weight of a resin, and 10 to 40 parts by weight of a diluent. The photosensitive compound has a chemical structure of The patterning method further includes removing the diluent in the photosensitive composition to form a photoresist layer, exposing the photoresist layer, and removing an exposed part of the photoresist layer to expose a part of the material layer.
    Type: Grant
    Filed: September 22, 2021
    Date of Patent: June 13, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yao-Jheng Huang, Te-Yi Chang, Chin-Hua Chang, Ming-Tzung Wu, Yu-Ying Hsu
  • Publication number: 20230039398
    Abstract: An impregnation liquid is provided, which includes (A) phenolic resin, (B) diazonaphthoquinone-based compound or a derivative thereof, (C) ionic compound, and (D) organic solvent. The weight of (A) phenolic resin and the weight of (B) diazonaphthoquinone-based compound or a derivative thereof have a ratio of 0.2:0.8 to 0.9:0.1, and the weight of (C) ionic compound and the total weight of (A) phenolic resin and (B) diazonaphthoquinone-based compound or a derivative thereof have a ratio of 0.2:1 to 1.4:1. The impregnation liquid can be used to form an activated carbon layer to wrap and to be directly in contact with the surface of a mesh.
    Type: Application
    Filed: December 10, 2021
    Publication date: February 9, 2023
    Applicant: Industrial Technology Research Institute
    Inventors: Ching-Mao WU, Te-Yi CHANG, Szu-Yin LIN, Yao-Jheng HUANG
  • Publication number: 20220334480
    Abstract: A patterning method includes providing a photosensitive composition on a material layer. The photosensitive composition includes one part by weight of a photo sensitive compound, 1.5 to 8 parts by weight of a resin, and 10 to 40 parts by weight of a diluent. The photosensitive compound has a chemical structure of The patterning method further includes removing the diluent in the photosensitive composition to form a photoresist layer, exposing the photoresist layer, and removing an exposed part of the photoresist layer to expose a part of the material layer.
    Type: Application
    Filed: September 22, 2021
    Publication date: October 20, 2022
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yao-Jheng HUANG, Te-Yi CHANG, Chin-Hua CHANG, Ming-Tzung WU, Yu-Ying HSU
  • Patent number: 10533088
    Abstract: A copolymer is provided, which includes 1 part by mole of a repeating unit represented by Formula 1, 3 to 10 parts by mole of a repeating unit represented by Formula 2, and 5 to 15 parts by mole of a repeating unit represented by Formula 3. R1 is hydrogen or methyl; R2 is a single bond or C1-3 alkylene group; R3 is a polysiloxy group with vinyl and aromatic group; and each of R4 and R5 is independently hydrogen, C1-3 alkyl or a polysiloxy group with vinyl and aromatic group.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: January 14, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yao-Jheng Huang, Yun-Yu Lai, Ming-Tzung Wu, Te-Yi Chang
  • Publication number: 20190241730
    Abstract: A copolymer is provided, which includes 1 part by mole of a repeating unit represented by Formula 1, 3 to 10 parts by mole of a repeating unit represented by Formula 2, and 5 to 15 parts by mole of a repeating unit represented by Formula 3. R1 is hydrogen or methyl; R2 is a single bond or C1-3 alkylene group; R3 is a polysiloxy group with vinyl and aromatic group; and each of R4 and R5 is independently hydrogen, C1-3 alkyl or a polysiloxy group with vinyl and aromatic group.
    Type: Application
    Filed: August 14, 2018
    Publication date: August 8, 2019
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yao-Jheng HUANG, Yun-Yu LAI, Ming-Tzung WU, Te-Yi CHANG
  • Patent number: 10053572
    Abstract: The disclosure provides a masterbatch, a method for fabricating the same and a film formed from the masterbatch. The masterbatch includes a product prepared from a composition via polymerization and granulation. The composition includes: terephthalic acid; and a silicon dioxide dispersion, wherein the silicon dioxide dispersion includes surface-modified silicon dioxide particles disposed within ethylene glycol, and the surface-modified silicon dioxide particle has first functional groups and second functional groups bonded on the surface of the silicon dioxide particles, wherein the first functional groups have a structure represented by and the second functional groups include a C1-8 haloalkyl functional group, C1-8 alkoxy functional group, C1-8 aminoalkyl functional group, C2-8 alkenyl group, or epoxy group, R1 is hydrogen or a C1-3 alkyl functional group, and n is 1-4.
    Type: Grant
    Filed: May 1, 2013
    Date of Patent: August 21, 2018
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wen-Jiunn Chen, Ming-Tzung Wu, Te-Yi Chang, Chih-Hsiang Lin, Chung-Cheng Lin, Meng-Hsin Chen
  • Publication number: 20180190516
    Abstract: A coating method of a non-Newtonian fluid material and a coating system thereof are provided. The coating method includes the following steps. An equation of shear rate and shear viscosity of the non-Newtonian fluid material represented by equation (1) is obtained: ? = ? 0 ? ? . ( n - 1 ) , ( 1 ) wherein ? is shear viscosity, ?0 is zero shear viscosity, {dot over (?)} is shear rate, and n is power-law index. An initial gap between a coating apparatus and a substrate and a thickness of a film of the non-Newtonian fluid material to be formed are set. The non-Newtonian fluid material is coated on the substrate in a non-constant coating velocity manner using the coating apparatus. The shear viscosity of the non-Newtonian fluid material is obtained from equation (1) according to the coating velocity and thickness of the non-Newtonian fluid material. The gap between the coating apparatus and the substrate is adjusted according to the shear viscosity, coating velocity, and thickness.
    Type: Application
    Filed: October 17, 2017
    Publication date: July 5, 2018
    Inventors: Yuh-Shyang Chen, Te-Yi Chang
  • Patent number: 9698377
    Abstract: A copolymer according to the present disclosure is provided, which includes 30 to 80 mol % of a repeating unit represented by formula (I), 5 to 25 mol % of a repeating unit represented by formula (II), and 5 to 30 mol % of a repeating unit represented by formula (III): wherein R1 is C6-C13 aryl group, C7-C13 aralkyl group, C6-C8 halogenated aryl group or C7-C8 aryloxyalkyl group; R3 is C3-C16 alkyl group or C3-C6 alkoxy substituted alkyl group; R5 is a single bond or C1-C3 alkylene group, R6 and R7 are independently C1-C3 alkoxy group, R8 is polysiloxane with methyl and phenyl groups; and R2, R4 and R9 are independently hydrogen or methyl. In addition, a resin composition, a packaging film and a package structure including the same are provided.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: July 4, 2017
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tzung Wu, Te-Yi Chang, Yao-Jheng Huang, Yun-Yu Lai
  • Patent number: 9676919
    Abstract: A hybrid carbon black is provided, which includes a carbon black core and a polymer film wrapping an entire surface of the carbon black core. The polymer film includes a network of a plurality of polymer main chains crosslinked each other, and a plurality of dispersion-side chains bonded to the polymer main chains. The dispersion-side chains come from an acrylate monomer with a chemical structure of: wherein when n is 4 to 7, R1 is H or CH3, and when n is 8 to 14, R1 is CH3.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: June 13, 2017
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ching-Mao Wu, Szu-Yin Lin, Ming-Tzung Wu, Te-Yi Chang
  • Publication number: 20170088687
    Abstract: A hybrid carbon black is provided, which includes a carbon black core and a polymer film wrapping an entire surface of the carbon black core. The polymer film includes a network of a plurality of polymer main chains crosslinked each other, and a plurality of dispersion-side chains bonded to the polymer main chains. The dispersion-side chains come from an acrylate monomer with a chemical structure of: wherein when n is 4 to 7, R1 is H or CH3, and when n is 8 to 14, R1 is CH3.
    Type: Application
    Filed: March 9, 2016
    Publication date: March 30, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ching-Mao WU, Szu-Yin LIN, Ming-Tzung WU, Te-Yi CHANG
  • Patent number: 9556282
    Abstract: A modified cellulose is provided. The modified cellulose is represented by the chemical formula (1): wherein n is between 60 and 2500, at least one R is selected from one of the group consisting of R1 is C11 to C32 alkyl group or C11 to C32 alkenyl group, R2 is hydrogen, C3 to C29 alkyl group or C3 to C29 alkenyl group, R3 is C3 to C29 alkyl group or C3 to C29 alkenyl group, R4 is C4 to C8 cycloalkyl group or C4 to C8 cycloalkenyl group, n2 is between 15 and 33, n4 is between 20 and 40.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: January 31, 2017
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Ying Hsu, Te-Yi Chang, Ju-Feng Liao, Sheng-Ju Liao, Yao-Jheng Huang
  • Publication number: 20160185878
    Abstract: A modified cellulose is provided. The modified cellulose is represented by the chemical formula (1): wherein n is between 60 and 2500, at least one R is selected from one of the group consisting of R1 is C11 to C32 alkyl group or C11 to C32 alkenyl group, R2 is hydrogen, C3 to C29 alkyl group or C3 to C29 alkenyl group, R3 is C3 to C29 alkyl group or C3 to C29 alkenyl group, R4 is C4 to C8 cycloalkyl group or C4 to C8 cycloalkenyl group, n2 is between 15 and 33, n4 is between 20 and 40.
    Type: Application
    Filed: December 10, 2015
    Publication date: June 30, 2016
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Ying HSU, Te-Yi CHANG, Ju-Feng LIAO, Sheng-Ju LIAO, Yao-Jheng HUANG
  • Patent number: 9081275
    Abstract: A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition comprises a binder agent, a photomonomer and a photoinitiator. The binder agent has a chemical structure comprising following repeating unit: R1 is H or CH3, n is 2-40 of integer. The photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photo initiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent.
    Type: Grant
    Filed: January 15, 2013
    Date of Patent: July 14, 2015
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsien-Kuang Lin, Jauder Jeng, Sue-May Chen, Te-Yi Chang, Tsung-Yi Chou
  • Publication number: 20140030502
    Abstract: The disclosure provides a masterbatch, a method for fabricating the same and a film formed from the masterbatch. The masterbatch includes a product prepared from a composition via polymerization and granulation. The composition includes: terephthalic acid; and a silicon dioxide dispersion, wherein the silicon dioxide dispersion includes surface-modified silicon dioxide particles disposed within ethylene glycol, and the surface-modified silicon dioxide particle has first functional groups and second functional groups bonded on the surface of the silicon dioxide particles, wherein the first functional groups have a structure represented by and the second functional groups include a C1-8 haloalkyl functional group, C1-8 alkoxy functional group, C1-8 aminoalkyl functional group, C2-8 alkenyl group, or epoxy group, R1 is hydrogen or a C1-3 alkyl functional group, and n is 1-4.
    Type: Application
    Filed: May 1, 2013
    Publication date: January 30, 2014
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wen-Jiunn CHEN, Ming-Tzung WU, Te-Yi CHANG, Chih-Hsiang LIN, Chung-Cheng LIN, Meng-Hsin CHEN
  • Patent number: 8593713
    Abstract: Disclosed is an ink composition used in an electrowetting display device and an electrowetting display device employing the same. The ink composition used in the electrowetting display device includes a non-polar solvent and a modified hydrophobic pigment, wherein the modified hydrophobic pigment has a structure represented by Formula (I), of P-Gn wherein P is a pigment moiety, n is 1-4 and G is wherein R1 is a straight chain or a branched C4-20 alkyl group, or C5-20 cycloalkyl group.
    Type: Grant
    Filed: July 23, 2012
    Date of Patent: November 26, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Ming-Tzung Wu, Te-Yi Chang, Chin-Hua Chang, Wen-Jiunn Chen, Yu-Chin Lin, Ching-Mao Wu
  • Publication number: 20130155486
    Abstract: Disclosed is an ink composition used in an electrowetting display device and an electrowetting display device employing the same. The ink composition used in the electrowetting display device includes a non-polar solvent and a modified hydrophobic pigment, wherein the modified hydrophobic pigment has a structure represented by Formula (I), of P-Gn wherein P is a pigment moiety, n is 1-4 and G is wherein R1 is a straight chain or a branched C4-20 alkyl group, or C5-20 cycloalkyl group.
    Type: Application
    Filed: July 23, 2012
    Publication date: June 20, 2013
    Inventors: Ming-Tzung WU, Te-Yi Chang, Chin-Hua Chang, Wen-Jiunn Chen, Yu-Chin Lin, Ching-Mao Wu
  • Patent number: 8455093
    Abstract: A reactive silicon dioxide compound, wherein the formula of the reactive silicon dioxide compound is shown as Formula (I): where each R is a reactive group shown as Formula (II) or Formula (III), independently: and where R1, R2 and R3 include H or CH3, independently, n1 is an integer of about 1-6 and n2 is an integer of about 0-4. An optical protective film containing the reactive silicon dioxide compound is also provided.
    Type: Grant
    Filed: May 11, 2010
    Date of Patent: June 4, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Te-Yi Chang, Ming-Tzung Wu, Chiunn-Wen Chen, Jia-Ming Liu, Kuo-Tung Huang
  • Publication number: 20120141937
    Abstract: A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition comprises a binder agent, a photomonomer and a photoinitiator. The binder agent is formed by polymerizing a binder composition. The binder composition comprises a lactic oligomer. The photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photo initiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent.
    Type: Application
    Filed: June 9, 2011
    Publication date: June 7, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsien-Kuang Lin, Jau-Der Jeng, Sue-May Chen, Te-Yi Chang, Tsung-Yi Chou
  • Publication number: 20110111333
    Abstract: The invention provides a heat-resistant flexible color filter, including: a flexible transparent substrate, wherein the forming material thereof includes nano silica and polyimide, and the nano silica is present in an amount of about 20-70 wt %, based on 100 wt % of the forming material; and a heat-stable color photoresist material coated on the flexible transparent substrate, wherein the heat stable color photoresist material includes: a base soluble resin system about 30-90 wt %; a photosensitive system about 5-60 wt %; and a pigment coated with an inorganic alkoxide about 10-50 wt %.
    Type: Application
    Filed: August 11, 2010
    Publication date: May 12, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: I-Jein Cheng, Chin-Cheng Weng, Kuo-Tung Huang, Chyi-Ming Leu, Te-Yi Chang, Ming-Tzung Wu
  • Publication number: 20110088592
    Abstract: A reactive silicon dioxide compound, wherein the formula of the reactive silicon dioxide compound is shown as Formula (I): where each R is a reactive group shown as Formula (II) or Formula (III), independently: and where R1, R2 and R3 include H or CH3, independently, n1 is an integer of about 1-6 and n2 is an integer of about 0-4. An optical protective film containing the reactive silicon dioxide compound is also provided.
    Type: Application
    Filed: May 11, 2010
    Publication date: April 21, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Te-Yi Chang, Ming-Tzung Wu, Chiunn-Wen Chen, Jia-Ming Liu, Kuo-Tung Huang