Patents by Inventor Te-Yi Chang

Te-Yi Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9081275
    Abstract: A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition comprises a binder agent, a photomonomer and a photoinitiator. The binder agent has a chemical structure comprising following repeating unit: R1 is H or CH3, n is 2-40 of integer. The photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photo initiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent.
    Type: Grant
    Filed: January 15, 2013
    Date of Patent: July 14, 2015
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsien-Kuang Lin, Jauder Jeng, Sue-May Chen, Te-Yi Chang, Tsung-Yi Chou
  • Publication number: 20140030502
    Abstract: The disclosure provides a masterbatch, a method for fabricating the same and a film formed from the masterbatch. The masterbatch includes a product prepared from a composition via polymerization and granulation. The composition includes: terephthalic acid; and a silicon dioxide dispersion, wherein the silicon dioxide dispersion includes surface-modified silicon dioxide particles disposed within ethylene glycol, and the surface-modified silicon dioxide particle has first functional groups and second functional groups bonded on the surface of the silicon dioxide particles, wherein the first functional groups have a structure represented by and the second functional groups include a C1-8 haloalkyl functional group, C1-8 alkoxy functional group, C1-8 aminoalkyl functional group, C2-8 alkenyl group, or epoxy group, R1 is hydrogen or a C1-3 alkyl functional group, and n is 1-4.
    Type: Application
    Filed: May 1, 2013
    Publication date: January 30, 2014
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wen-Jiunn CHEN, Ming-Tzung WU, Te-Yi CHANG, Chih-Hsiang LIN, Chung-Cheng LIN, Meng-Hsin CHEN
  • Patent number: 8593713
    Abstract: Disclosed is an ink composition used in an electrowetting display device and an electrowetting display device employing the same. The ink composition used in the electrowetting display device includes a non-polar solvent and a modified hydrophobic pigment, wherein the modified hydrophobic pigment has a structure represented by Formula (I), of P-Gn wherein P is a pigment moiety, n is 1-4 and G is wherein R1 is a straight chain or a branched C4-20 alkyl group, or C5-20 cycloalkyl group.
    Type: Grant
    Filed: July 23, 2012
    Date of Patent: November 26, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Ming-Tzung Wu, Te-Yi Chang, Chin-Hua Chang, Wen-Jiunn Chen, Yu-Chin Lin, Ching-Mao Wu
  • Publication number: 20130155486
    Abstract: Disclosed is an ink composition used in an electrowetting display device and an electrowetting display device employing the same. The ink composition used in the electrowetting display device includes a non-polar solvent and a modified hydrophobic pigment, wherein the modified hydrophobic pigment has a structure represented by Formula (I), of P-Gn wherein P is a pigment moiety, n is 1-4 and G is wherein R1 is a straight chain or a branched C4-20 alkyl group, or C5-20 cycloalkyl group.
    Type: Application
    Filed: July 23, 2012
    Publication date: June 20, 2013
    Inventors: Ming-Tzung WU, Te-Yi Chang, Chin-Hua Chang, Wen-Jiunn Chen, Yu-Chin Lin, Ching-Mao Wu
  • Patent number: 8455093
    Abstract: A reactive silicon dioxide compound, wherein the formula of the reactive silicon dioxide compound is shown as Formula (I): where each R is a reactive group shown as Formula (II) or Formula (III), independently: and where R1, R2 and R3 include H or CH3, independently, n1 is an integer of about 1-6 and n2 is an integer of about 0-4. An optical protective film containing the reactive silicon dioxide compound is also provided.
    Type: Grant
    Filed: May 11, 2010
    Date of Patent: June 4, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Te-Yi Chang, Ming-Tzung Wu, Chiunn-Wen Chen, Jia-Ming Liu, Kuo-Tung Huang
  • Publication number: 20120141937
    Abstract: A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition comprises a binder agent, a photomonomer and a photoinitiator. The binder agent is formed by polymerizing a binder composition. The binder composition comprises a lactic oligomer. The photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photo initiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent.
    Type: Application
    Filed: June 9, 2011
    Publication date: June 7, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsien-Kuang Lin, Jau-Der Jeng, Sue-May Chen, Te-Yi Chang, Tsung-Yi Chou
  • Publication number: 20110111333
    Abstract: The invention provides a heat-resistant flexible color filter, including: a flexible transparent substrate, wherein the forming material thereof includes nano silica and polyimide, and the nano silica is present in an amount of about 20-70 wt %, based on 100 wt % of the forming material; and a heat-stable color photoresist material coated on the flexible transparent substrate, wherein the heat stable color photoresist material includes: a base soluble resin system about 30-90 wt %; a photosensitive system about 5-60 wt %; and a pigment coated with an inorganic alkoxide about 10-50 wt %.
    Type: Application
    Filed: August 11, 2010
    Publication date: May 12, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: I-Jein Cheng, Chin-Cheng Weng, Kuo-Tung Huang, Chyi-Ming Leu, Te-Yi Chang, Ming-Tzung Wu
  • Publication number: 20110088592
    Abstract: A reactive silicon dioxide compound, wherein the formula of the reactive silicon dioxide compound is shown as Formula (I): where each R is a reactive group shown as Formula (II) or Formula (III), independently: and where R1, R2 and R3 include H or CH3, independently, n1 is an integer of about 1-6 and n2 is an integer of about 0-4. An optical protective film containing the reactive silicon dioxide compound is also provided.
    Type: Application
    Filed: May 11, 2010
    Publication date: April 21, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Te-Yi Chang, Ming-Tzung Wu, Chiunn-Wen Chen, Jia-Ming Liu, Kuo-Tung Huang
  • Patent number: 7285371
    Abstract: A photosensitive composition and a color paste for making the photosensitive composition. The photosensitive resin composition comprises a photosensitive resin system; a pigment; a photo-reactive amphipathic molecule; and a solvent. The color paste for making the photosensitive composition comprises the pigment and the photo-reactive amphipathic molecule.
    Type: Grant
    Filed: November 30, 2004
    Date of Patent: October 23, 2007
    Assignee: Industrial Technology Research Institute
    Inventors: Kuo-Tung Huang, Shi-Deh Chao, I-Jein Cheng, Te-Yi Chang, Ming-Tzung Wu, Mon-Haw Chang, Yu-Cheng Chen
  • Publication number: 20060115765
    Abstract: A photosensitive composition and a color paste for making the photosensitive composition. The photosensitive resin composition comprises a photosensitive resin system; a pigment; a photo-reactive amphipathic molecule; and a solvent. The color paste for making the photosensitive composition comprises the pigment and the photo-reactive amphipathic molecule.
    Type: Application
    Filed: November 30, 2004
    Publication date: June 1, 2006
    Inventors: Kuo-Tung Huang, Shi-Deh Chao, I-Jein Cheng, Te-Yi Chang, Ming-Tzung Wu, Mon-Haw Chang, Yu-Cheng Chen
  • Publication number: 20060083132
    Abstract: This invention relates to a method of improving the writing quality of an optical disk writer, and the writing method comprises the steps of: writing data into a plurality of blocks divided from the inner loop to the outer loop of the recording optical disk and each block corresponding to a weighted power; adding a constant writing power used at the current writing position of the optical disk writer to a weighted power corresponding to the block of the current writing position to obtain an actual writing power for writing data into the current writing position of the writer.
    Type: Application
    Filed: October 18, 2004
    Publication date: April 20, 2006
    Inventor: Te-Yi Chang
  • Publication number: 20060083149
    Abstract: This invention relates to a protect circuit of an optical disk drive, which comprises a discharge circuit being at least connected to a first DC voltage and a ground terminal, wherein the first DC voltage and ground terminal are electrically connected to a power socket of the optical disk drive, and the discharge circuit is used to supply the electric power for the operation of the optical disk drive. If the first DC voltage and ground terminal are unplugged abnormally from the power socket, the first DC voltage and the ground terminal are connected immediately to discharge the remaining electricity of the first DC voltage in the optical disk drive.
    Type: Application
    Filed: October 18, 2004
    Publication date: April 20, 2006
    Inventor: Te-Yi Chang