Abstract: An example operation may include one or more of querying data of a merchant read from a point of sale (POS) system of the merchant and converting the data into an encoding, executing a machine learning model on the input encoding to generate a vector that comprises vectorized values corresponding to latent features of the merchant embedded within slots of the vector, respectively, generating an entry comprising an identifier of the merchant, context of the merchant, and the generated vector, and storing the entry in the feature store.

Abstract: An example operation may include one or more of receiving a query parameter input via an interface of a software application, querying the feature store based on the query parameter, wherein the querying comprises identifying one or more vectors stored in the features store that match the query parameter via execution of a query on the feature store, executing a machine learning model on the one or more vectors identified in the feature store to generate a predicted output, and displaying the predicted output via the interface of the software application.

Abstract: The application proposes a bracket, a bracket assembly, a device arranged on vehicle roof and a vehicle, which are applied in the field of automobile technology. The bracket comprises: a first bracket body mounted to the top of the vehicle; and a connecting body comprising: a first connecting piece arranged on the left side of the first bracket body and mounted with a first image sensor, and a second connecting piece arranged on the right side of the first bracket body and mounted with a second image sensor, wherein the first connecting piece and the second connecting piece are arranged above A pillars of the vehicle.

Abstract: The application proposes a bracket, a bracket assembly, a device arranged on vehicle roof and a vehicle, which are applied in the field of automobile technology. The bracket comprises: a first bracket body mounted to the top of the vehicle; and a connecting body comprising: a first connecting piece arranged on the left side of the first bracket body and mounted with a first image sensor, and a second connecting piece arranged on the right side of the first bracket body and mounted with a second image sensor, wherein the first connecting piece and the second connecting piece are arranged above A pillars of the vehicle.

Abstract: Techniques for database versioning are described. In one embodiment, an apparatus may comprise a database change management component operative to compare a developer table to a reference table to determine a database change set, wherein both the developer table and the reference table are based on a target table; a database conflict management component operative to compare the database change set to the target table to determine a conflicting change set; and a user interface component operative to display the conflicting change set where the conflicting change set comprises one or more conflicting changes; and indicate a conflict-free change set where the conflicting change set is empty. Other embodiments are described and claimed.

Abstract: An improved connector assembly that provides stabilization of a compression member and the junction between two body parts of the connector by securing a compression member between the two body parts with multiple posts extending from each body part and providing a stopper at a union point of the body parts.

Abstract: Improved methods and apparatus for stripping photoresist and removing ion implant related residues from a work piece surface are provided. According to various embodiments, the workpiece is exposed to a passivation plasma, allowed to cool for a period of time, and then exposed to an oxygen-based or hydrogen-based plasma to remove the photoresist and ion implant related residues. Aspects of the invention include reducing silicon loss, leaving little or no residue while maintaining an acceptable strip rate. In certain embodiments, methods and apparatus remove photoresist material after high-dose ion implantation processes.

Abstract: Improved methods for stripping photoresist and removing etch-related residues from dielectric materials are provided. In one aspect of the invention, methods involve removing material from a dielectric layer using a hydrogen-based etch process employing a weak oxidizing agent and fluorine-containing compound. Substrate temperature is maintained at a level of about 160° C. or less, e.g., less than about 90° C.

Abstract: An improved connector assembly that provides stabilization of a compression member and the junction between two body parts by securing a compression member between the two body parts with multiple posts extending from each body part and providing a stopper at a union point of the body parts.

Abstract: Improved methods for stripping photoresist and removing etch-related residues from dielectric materials are provided. In one aspect of the invention, methods involve removing material from a dielectric layer using a hydrogen-based etch process employing a weak oxidizing agent and fluorine-containing compound. Substrate temperature is maintained at a level of about 160° C. or less, e.g., less than about 90° C.

Abstract: An improved connector assembly that provides stabilization of a compression member and the junction between two body parts by securing a compression member between the two body parts with multiple posts extending from each body part and providing a stopper at a union point of the body parts.

Abstract: Methods and systems for determining insertion loss for a mast clamp current probe (MCCP) coupled to a monopole antenna are disclosed. An exemplary method includes determining a first power radiated by the monopole antenna across a first range of frequencies while driving the monopole antenna using a base-feed arrangement to produce a first power-frequency measurement, determining a second power radiated by the monopole antenna across the first range of frequencies while driving the monopole antenna using an MCCP-feed arrangement to produce a second power-frequency measurement and to determine impedance mismatch (MM), and determining insertion loss using the first power-frequency measurement, the second power-frequency measurement and the impedance mismatch.

Abstract: Improved methods for stripping photoresist and removing ion implant related residues from a work piece surface are provided. According to various embodiments, plasma is generated using elemental hydrogen, a fluorine-containing gas and a protectant gas. The plasma-activated gases reacts with the high-dose implant resist, removing both the crust and bulk resist layers, while simultaneously protecting exposed portions of the work piece surface. The work piece surface is substantially residue free with low silicon loss.

Abstract: Improved methods and apparatus for stripping photoresist and removing ion implant related residues from a work piece surface are provided. According to various embodiments, the workpiece is exposed to a passivation plasma, allowed to cool for a period of time, and then exposed to an oxygen-based or hydrogen-based plasma to remove the photoresist and ion implant related residues. Aspects of the invention include reducing silicon loss, leaving little or no residue while maintaining an acceptable strip rate. In certain embodiments, methods and apparatus remove photoresist material after high-dose ion implantation processes.

Abstract: Improved methods for stripping photoresist and removing etch-related residues from dielectric materials are provided. In one aspect of the invention, methods involve removing material from a dielectric layer using a hydrogen-based etch process employing a weak oxidizing agent and fluorine-containing compound. Substrate temperature is maintained at a level of about 160° C. or less, e.g., less than about 90° C.