Patents by Inventor Ted Liang

Ted Liang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200202754
    Abstract: An information display board with improved display performance by light-extending light sources is revealed. The information display board includes a display board and a plurality of light-extending light sources each of which consists of a light emitting diode (LED) and a reflective panel. The LED has a light emitting side and a backside while the reflective panel is disposed on the light emitting side of the LED for reflecting a part of light emitted from the light emitting side to the display board on the backside to form an expanded area. Thus illuminance and illuminated area of information shown on the display board are increased. By continuous lighting generated, messages/information shown on the information display board such as traffic sign can be read more clearly and comfortably.
    Type: Application
    Filed: March 4, 2020
    Publication date: June 25, 2020
    Inventors: Yi-Chun CHEN, Ted Liang-tai LEE, Ching-Cherng SUN, Tsung-Xian LEE
  • Publication number: 20200098959
    Abstract: A light-emitting diode lighting structure for improving back-illumination efficiency is revealed. The light-emitting diode lighting structure is disposed on a substrate and composed of a light emitting diode (LED) and a reflective panel. The LED provided with a packaging lens has a light emitting side and a backside. The reflective panel is arranged at the light emitting side of the LED and located adjacent to the packaging lens. A part of light emitted from the light emitting side is reflected to the substrate by the reflective panel. Thereby the illumination on the substrate at the backside can be increased. Moreover, continuous lighting is generated so that messages shown on signboards can be read more clearly and comfortably when a plurality of LEDs is disposed on and applied to the signboards.
    Type: Application
    Filed: November 16, 2018
    Publication date: March 26, 2020
    Inventors: Yi-Chun CHEN, Ted Liang-tai LEE, Ching-Cherng SUN, Tsung-Xian LEE
  • Publication number: 20080153305
    Abstract: A method to passivate a freshly etched metal structure comprises providing a metal surface on a substrate that has been etched by a first particle beam, exposing the metal surface to a passivation gas, and exposing the freshly etched metal structures to a second particle beam in the presence of the passivation gas. The second particle beam may comprise an ion beam or a laser beam. The passivation gas may comprise water vapor, oxygen gas, or hydrocarbon gas.
    Type: Application
    Filed: November 14, 2007
    Publication date: June 26, 2008
    Inventor: Ted Liang
  • Publication number: 20060147814
    Abstract: Methods to repair an APSM mask having undercut etch are described. An absorbing layer over a defect on the plate and a first portion of a defect on the plate are removed using a tip of an atomic force microscope. A second portion of the defect is removed using an e-beam induced etching, which includes introducing a first gas over a second portion of the defect to form a first chemistry to etch the defect, and dwelling the e-beam. The absorbing layer having an overhung structure is reconstructed on the plate using an e-beam induced deposition. A second gas is introduced over the plate to form a second chemistry to form an opaque material on the plate. The e-beam is dwelled for a predetermined time to induce forming the opaque material on the plate. For an embodiment, a profile of the defect is measured to control etching.
    Type: Application
    Filed: January 3, 2005
    Publication date: July 6, 2006
    Inventor: Ted Liang
  • Publication number: 20060134920
    Abstract: A method to passivate a freshly etched metal structure comprises providing a metal surface on a substrate that has been etched by a first particle beam, exposing the metal surface to a passivation gas, and exposing the freshly etched metal structures to a second particle beam in the presence of the passivation gas. The second particle beam may comprise an electron beam, an ion beam, or a laser beam. The passivation gas may comprise water vapor, oxygen gas, or hydrocarbon gas.
    Type: Application
    Filed: December 17, 2004
    Publication date: June 22, 2006
    Inventor: Ted Liang
  • Publication number: 20050109278
    Abstract: A method of forming thin films of materials on an extreme ultraviolet multilayer surface is described. Specifically, an electron beam and a precursor gas are used to locally deposit a capping filling in a pinhole of a multilayer surface. The growth rate, purity, and spatial resolution of the capping filling may be modulated.
    Type: Application
    Filed: November 26, 2003
    Publication date: May 26, 2005
    Inventors: Ted Liang, Alan Stivers
  • Patent number: 6897157
    Abstract: The present invention discloses a method of fabricating and repairing a mask without damage and an apparatus including a holder to mount a substrate; a stage to position the holder in a chamber; a pumping system to evacuate the chamber; an imaging system to locate an opaque defect in the substrate; a gas delivery system to dispense a reactant gas towards the defect; and an electron delivery system to direct electrons towards the opaque defect.
    Type: Grant
    Filed: September 10, 2003
    Date of Patent: May 24, 2005
    Assignee: Intel Corporation
    Inventors: Ted Liang, Alan Stivers
  • Patent number: 6774990
    Abstract: Inspecting a patterned surface using photoemission of electrons includes selecting materials of the patterned surface, selecting a light source to produce a difference in yield of photoelectrons from the materials, applying the light from the light source to the patterned surface, detecting the emission of photoelectrons from the patterned surface, and inspecting the patterned surface based on the detected photoelectron emissions.
    Type: Grant
    Filed: August 23, 2002
    Date of Patent: August 10, 2004
    Assignee: Intel Corporation
    Inventors: Ted Liang, Alan R. Stivers, Edita Tejnil
  • Patent number: 6720118
    Abstract: The present invention discloses a method of increasing the contrast of an EUV mask at inspection by forming a multilayer mirror over a substrate; forming an absorber layer over the multilayer mirror; forming a top layer over the absorber layer; patterning the mask into a first region and a second region; and removing the top layer and the absorber layer in the first region.
    Type: Grant
    Filed: April 25, 2003
    Date of Patent: April 13, 2004
    Assignee: Intel Corporation
    Inventors: Pei-Yang Yan, Ted Liang, Guojing Zhang
  • Publication number: 20040048398
    Abstract: The present invention discloses a method of fabricating and repairing a mask without damage and an apparatus including a holder to mount a substrate; a stage to position the holder in a chamber; a pumping system to evacuate the chamber; an imaging system to locate an opaque defect in the substrate; a gas delivery system to dispense a reactant gas towards the defect; and an electron delivery system to direct electrons towards the opaque defect.
    Type: Application
    Filed: September 10, 2003
    Publication date: March 11, 2004
    Inventors: Ted Liang, Alan Stivers
  • Publication number: 20040036862
    Abstract: Inspecting a patterned surface using photoemission of electrons includes selecting materials of the patterned surface, selecting a light source to produce a difference in yield of photoelectrons from the materials, applying the light from the light source to the patterned surface, detecting the emission of photoelectrons from the patterned surface, and inspecting the patterned surface based on the detected photoelectron emissions.
    Type: Application
    Filed: August 23, 2002
    Publication date: February 26, 2004
    Inventors: Ted Liang, Alan R. Stivers, Edita Tejnil
  • Publication number: 20030203289
    Abstract: The present invention discloses a method of increasing the contrast of an EUV mask at inspection by forming a multilayer mirror over a substrate; forming an absorber layer over the multilayer mirror; forming a top layer over the absorber layer; patterning the mask into a first region and a second region; and removing the top layer and the absorber layer in the first region.
    Type: Application
    Filed: April 25, 2003
    Publication date: October 30, 2003
    Inventors: Pei-Yang Yan, Ted Liang, Guojing Zhang
  • Patent number: 6583068
    Abstract: The present invention discloses a method of increasing the contrast of an EUV mask at inspection by forming a multilayer mirror over a substrate; forming an absorber layer over the multilayer mirror; forming a top layer over the absorber layer; patterning the mask into a first region and a second region; and removing the top layer and the absorber layer in the first region.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: June 24, 2003
    Assignee: Intel Corporation
    Inventors: Pei-Yang Yan, Ted Liang, Guojing Zhang
  • Publication number: 20030000921
    Abstract: The present invention discloses a method of fabricating and repairing a mask without damage and an apparatus including a holder to mount a substrate; a stage to position the holder in a chamber; a pumping system to evacuate the chamber; an imaging system to locate an opaque defect in the substrate; a gas delivery system to dispense a reactant gas towards the defect; and an electron delivery system to direct electrons towards the opaque defect.
    Type: Application
    Filed: June 29, 2001
    Publication date: January 2, 2003
    Inventors: Ted Liang, Alan Stivers
  • Publication number: 20020142620
    Abstract: The present invention discloses a method of increasing the contrast of an EUV mask at inspection by forming a multilayer mirror over a substrate; forming an absorber layer over the multilayer mirror; forming a top layer over the absorber layer; patterning the mask into a first region and a second region; and removing the top layer and the absorber layer in the first region.
    Type: Application
    Filed: March 30, 2001
    Publication date: October 3, 2002
    Inventors: Pei-Yang Yan, Ted Liang, Guojing Zhang