Abstract: The present invention provides for a geometrically shaped pouch and container system for use in the storage, handling and dispensing of liquid chemicals. This system will result in far greater liquid chemical utilization efficiencies.

Abstract: An apparatus for indicating a fluid level in a reservoir includes a conduit for communication with a reservoir and including a sight glass. A buoyant primary float is provided within the conduit, and a stop is provided within the conduit for engaging the primary float to prevent travel of the primary float beyond an upper portion of the conduit. A buoyant secondary float in the conduit is moveable together with the primary float when the primary float is not engaged by the stop, and is moveable separately from the primary float when the primary float is engaged by the stop and a fluid level in the conduit exceeds the level of the stop such that a portion of the secondary float may travel separately within the upper portion of the conduit. The secondary float preferable includes an elongate portion that passes through an aperture in the primary float, and a buoyant upper portion that is located above the primary float and is larger than the aperture in the primary float.

Abstract: An apparatus for cleaning dried photoresist from a photoresist dispensing nozzle. The tip of the photoresist dispensing nozzle is inserted through an opening in a nozzle base. A catch pan is positioned beneath the nozzle base. A solvent dispensing needle is inserted through an opening in the catch pan to face the photoresist dispensing nozzle tip and sprays solvent onto the photoresist dispensing nozzle tip. The catch pan collects the solvent and dissolved photoresist particles. The catch pan includes a drain for draining the solvent and the dissolved photoresist particles.

Abstract: An apparatus for processing semiconductor wafers includes a single imaging stepper for exposing wafers processed on a first track and a second track. A method for processing semiconductor wafers includes selecting one of a first coater and a second coater for coating a first wafer with a photoresist. The coated wafer is exposed in a single stepper to form an exposed wafer. An operator selects one of a first developer and second developer to develop the exposed wafer.

Abstract: A dual tip nozzle replaces a single tip nozzle in a resist applicator station to double the number of photoresists that are available. The resist applicator station is of the type having a nozzle holder block, at least one single tip nozzle attached to the nozzle holder bock, and a first resist line extending through the nozzle holder block and into engagement with the nozzle. The dual tip nozzle includes two cavities having respective orifices. Each cavity receives a separate resist line for dispensing separate photoresists.

Abstract: An air bubble purging system for filters include a venturi valve in the drain line of the filter. The venturi valve is connected to a high pressure source line so that when a high rate of flow is produced in the high pressure source line, a venturi effect is created in the venturi valve to open the venturi valve and produce a vacuum in the drain line so that air bubbles are attracted into the drain line and purged.

Abstract: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Abstract: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Abstract: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Abstract: A storage apparatus for photoresist dispensing nozzles has solvent inlets positioned directly opposite the nozzles when the nozzles are in their home positions. Photoresist cleaning solvent is introduced through these inlets at periodic intervals and directly applied on the nozzles to keep them clean.