Abstract: Apparatus for exposing lithographic plates to light through a film, e.g. a negative, adapted for exposing a plurality of plates to light through the same film, having a conveyor with grippers for conveying a plate with a film thereon to an exposure station, where a window comes down on the film and plate, the grippers being opened to allow the window to vacuum-lift the film off the plate and retain it while another plate is conveyed to the exposure station for exposure through the retained film.

Abstract: Apparatus for processing lithographic plates after they have been exposed and developed having a system for feeding plates forward one after another in a predetermined path with the exposed and developed face of the plate facing up, a heating system for heating each plate as it travels along said path, a system for blowing air on each plate to cool it, a system for spraying water on and scrubbing the upper face of each plate for washing it, and a system for delivering preservative onto and rubbing it over the upper face of each plate.

Abstract: Apparatus for processing exposed lithographic plates in which an exposed plate is continuously fed forward with the exposed face of the plate facing up, developer is delivered onto the upper face of the plate by a nozzle which is traversed back and forth laterally with respect to the path of the plate above the plate to distribute the developer across the upper face of the plate, the developer is rubbed over the upper face of the plate, the plate is sprayed with water, preservative is delivered onto the upper face of the plate by a nozzle which is traversed back and forth along with the developer delivery nozzle to distribute the preservative across the upper face of the plate, and the preservative is rubbed over the upper face of the plate. The plate is fed forward by sets of plate feed rolls. Water is delivered onto certain of these rolls by nozzles which are traversed back and forth along with the developer and preservative delivery nozzles.