Patents by Inventor Teng Hooi Goh

Teng Hooi Goh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • REDUCING ROUGHNESS OF EXTREME ULTRAVIOLET LITHOGRAPHY RESISTS
    Publication number: 20220157617
    Abstract: Provided herein are methods and systems for reducing roughness of EUV resists and improving etched features. The methods may involve depositing a thin film on a patterned EUV resist having a stress level that is less compressive than a stress level of the patterned EUV resist. The resulting composite stress may reduce buckling and/or bulging of the patterned EUV resist.
    Type: Application
    Filed: March 17, 2020
    Publication date: May 19, 2022
    Applicant: Lam Research Corporation
    Inventors: Xiang Zhou, Teng Hooi Goh, Yoshie Kimura