Patents by Inventor Teng Luo
Teng Luo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11951618Abstract: A multi-procedure integrated automatic production line for hard alloy blades under robot control is provided. The production line includes a rail-guided robot. A cutter passivation device and a blade cleaning and drying device are arranged on one side of the rail-guided robot. A blade-coating transfer table, a blade coating device, a blade boxing transfer table, a blade-tooling dismounting device and a blade boxing device are sequentially arranged on another side of the rail-guided robot. The blade-tooling dismounting device is arranged on one side of the blade boxing transfer table. The production line further includes squirrel-cage toolings for carrying the blades. The squirrel-cage tooling that are loaded with the blades can run among the cutter passivation device, the blade cleaning and drying device, the blade-coating transfer table and the blade boxing transfer table. The blades after being treated through the blade-tooling dismounting device are sent to the blade boxing device.Type: GrantFiled: August 17, 2021Date of Patent: April 9, 2024Assignees: Qingdao University of Technology, Ningbo Sanhan Alloy Material Co., Ltd.Inventors: Changhe Li, Teng Gao, Liang Luo, Lizhi Tang, Yanbin Zhang, Weixi Ji, Binhui Wan, Shuo Yin, Huajun Cao, Bingheng Lu, Xin Cui, Mingzheng Liu, Jie Xu, Huiming Luo, Haizhou Xu, Min Yang, Huaping Hong, Yuying Yang, Haogang Li, Wuxing Ma, Shuai Chen
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Patent number: 10698248Abstract: The present disclosure provides a counter substrate, a display panel, a display device, and fabricating method, further simplifying the fabricating process of the display panel by reducing the number of masking times required during the making of a spacer pattern and a frame light shielding pattern while achieving the frame light shielding function of the counter substrate and getting the counter substrate conductive with an array substrate. The fabricating method of the counter substrate comprises: forming a transparent electrode layer on a first base substrate; forming a black spacer pattern and a frame light shielding pattern at the same time on the transparent electrode layer, wherein the frame light shielding pattern comprises a first via hole that exposes a portion of the transparent electrode layer; and forming a conductive light shielding layer pattern in the first via hole.Type: GrantFiled: November 13, 2017Date of Patent: June 30, 2020Assignee: BOE Technology Group Co., Ltd.Inventors: Shi Shu, Chuanxiang Xu, Teng Luo, Feng Gu
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Patent number: 10546885Abstract: A method for fabricating a thin film transistor includes providing a substrate (100); forming a semiconductor layer (105) over the substrate (100); forming a source-drain metal layer (106) over the semiconductor layer (105); applying one patterning process to the semiconductor layer (105) and the source-drain metal layer (106) to form an active layer (1), a source electrode (2), and a drain electrode (3); forming a gate insulating layer (101) and an interlayer insulating layer (102) that cover the active layer (1), the source electrode (2), and the drain electrode (3); applying a patterning process to the interlayer insulating layer (102) to form a first window (10) in the interlayer insulating layer (102) to expose a portion of the gate insulating layer (101); and forming a gate electrode (4) in the first window (10). An orthogonal projection of the gate electrode (4) on the substrate (100) is in an orthogonal projection of the active layer (1) on the substrate (100).Type: GrantFiled: October 30, 2017Date of Patent: January 28, 2020Assignee: BOE TECHNOLOGY GROUP CO., LTD.Inventors: Shi Shu, Chuanxiang Xu, Teng Luo, Feng Gu, Bin Zhang
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Patent number: 10504944Abstract: A method for fabricating a thin film transistor includes providing a substrate (100); forming a semiconductor layer (105) over the substrate (100); forming a source-drain metal layer (106) over the semiconductor layer (105); applying one patterning process to the semiconductor layer (105) and the source-drain metal layer (106) to form an active layer (1), a source electrode (2), and a drain electrode (3); forming a gate insulating layer (101) and an interlayer insulating layer (102) that cover the active layer (1), the source electrode (2), and the drain electrode (3); applying a patterning process to the interlayer insulating layer (102) to form a first window (10) in the interlayer insulating layer (102) to expose a portion of the gate insulating layer (101); and forming a gate electrode (4) in the first window (10). An orthogonal projection of the gate electrode (4) on the substrate (100) is in an orthogonal projection of the active layer (1) on the substrate (100).Type: GrantFiled: October 30, 2017Date of Patent: December 10, 2019Assignee: BOE TECHNOLOGY GROUP CO., LTD.Inventors: Shi Shu, Chuanxiang Xu, Teng Luo, Feng Gu, Bin Zhang
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Publication number: 20190067340Abstract: A method for fabricating a thin film transistor includes providing a substrate (100); forming a semiconductor layer (105) over the substrate (100); forming a source-drain metal layer (106) over the semiconductor layer (105); applying one patterning process to the semiconductor layer (105) and the source-drain metal layer (106) to form an active layer (1), a source electrode (2), and a drain electrode (3); forming a gate insulating layer (101) and an interlayer insulating layer (102) that cover the active layer (1), the source electrode (2), and the drain electrode (3); applying a patterning process to the interlayer insulating layer (102) to form a first window (10) in the interlayer insulating layer (102) to expose a portion of the gate insulating layer (101); and forming a gate electrode (4) in the first window (10). An orthogonal projection of the gate electrode (4) on the substrate (100) is in an orthogonal projection of the active layer (1) on the substrate (100).Type: ApplicationFiled: October 30, 2017Publication date: February 28, 2019Applicant: BOE TECHNOLOGY GROUP CO., LTD.Inventors: Shi Shu, Chuanxiang Xu, Teng Luo, Feng Gu, Bin Zhang
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Publication number: 20180314105Abstract: The present disclosure provides a counter substrate, a display panel, a display device, and fabricating method, further simplifying the fabricating process of the display panel by reducing the number of masking times required during the making of a spacer pattern and a frame light shielding pattern while achieving the frame light shielding function of the counter substrate and getting the counter substrate conductive with an array substrate. The fabricating method of the counter substrate comprises: forming a transparent electrode layer on a first base substrate; forming a black spacer pattern and a frame light shielding pattern at the same time on the transparent electrode layer, wherein the frame light shielding pattern comprises a first via hole that exposes a portion of the transparent electrode layer; and forming a conductive light shielding layer pattern in the first via hole.Type: ApplicationFiled: November 13, 2017Publication date: November 1, 2018Inventors: Shi SHU, Chuanxiang XU, Teng LUO, Feng GU
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Patent number: 9642839Abstract: Disclosed in the present disclosure are substances having tyrosine kinase inhibitory activity and a preparation method and use thereof, wherein the substances are the compounds having the structure of general formula (I) or the geometric isomers or pharmaceutical salts thereof. Through evaluation on tyrosine kinase inhibitory activity and related experiments, the present disclosure demonstrates that these compounds have a good tyrosine kinase inhibitory activity, and may inhibit a variety of tumor cells, and thus may be developed into drugs for preventing and treating tumor diseases, especially liver cancer, lung cancer and neuroblastoma.Type: GrantFiled: June 20, 2013Date of Patent: May 9, 2017Assignee: Institute of Radiation Medicine, China Academy of Military Medical Sciences PlaInventors: Xiaoming Yang, Lin Wang, Changyan Li, Yiqun Zhan, Jing Liu, Teng Luo, Haiyan Yan, Shouguo Zhang, Wei Li, Xiaoxue Wen, Tao Peng, Lu Li
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Publication number: 20160151334Abstract: Disclosed in the present disclosure are substances having tyrosine kinase inhibitory activity and a preparation method and use thereof, wherein the substances are the compounds having the structure of general formula (I) or the geometric isomers or pharmaceutical salts thereof. Through evaluation on tyrosine kinase inhibitory activity and related experiments, the present disclosure demonstrates that these compounds have a good tyrosine kinase inhibitory activity, and may inhibit a variety of tumor cells, and thus may be developed into drugs for preventing and treating tumor diseases, especially liver cancer, lung cancer and neuroblastoma.Type: ApplicationFiled: June 20, 2013Publication date: June 2, 2016Applicant: INSTITUTE OF RADIATION MEDICINE, CHINA ACADEMY OF MILITARY MEDICAL SCIENCES PLAInventors: Xiaoming Yang, Lin Wang, Changyan Li, Yiqun Zhan, Jing Liu, Teng Luo, Haiyan Yan, Shouguo Zhang, Wei Li, Xiaoxue Wen, Tao Peng, Lu Li