Patents by Inventor Tengfang Wang

Tengfang Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11347149
    Abstract: This invention relates to a photoresist stripper composition. The photoresist stripper composition according to the present invention comprises at least one choline compound; at least one polar aprotic solvent; and water; the weight percentage of the choline compound is from 2.5 to 50%, preferably from 5 to 50%, more preferably from 7 to 30%, and most preferably from 9 to 18% by weight based on the total weight of the composition. The photoresist stripper composition according to the present invention exhibits excellent photoresist cleaning performance and low etching to the substrate.
    Type: Grant
    Filed: June 8, 2020
    Date of Patent: May 31, 2022
    Assignee: Henkel AG & Co. KGaA
    Inventors: Tengfang Wang, Yongjun Wang
  • Publication number: 20200301284
    Abstract: This invention relates to a photoresist stripper composition. The photoresist stripper composition according to the present invention comprises at least one choline compound; at least one polar aprotic solvent; and water; the weight percentage of the choline compound is from 2.5 to 50%, preferably from 5 to 50%, more preferably from 7 to 30%, and most preferably from 9 to 18% by weight based on the total weight of the composition. The photoresist stripper composition according to the present invention exhibits excellent photoresist cleaning performance and low etching to the substrate.
    Type: Application
    Filed: June 8, 2020
    Publication date: September 24, 2020
    Inventors: Tengfang Wang, Yongjun Wang
  • Publication number: 20190155077
    Abstract: The present invention relates to an improved one-drop-filling process of producing a liquid crystal display having a liquid crystal layer between a first substrate and a second substrate, comprising steps of applying a thermally curable resin composition on a sealing region at a periphery of a surface of the first substrate; conducting a first thermal curing of the thermally curable resin composition at a temperature of 40° C. to 75° C., and obtaining a partially cured product; dropping liquid crystal on a central area encircled by the sealing region of the surface of the first substrate or the corresponding area of the second substrate, and forming the liquid crystal layer; overlaying the second substrate on the first substrate; and conducting a second thermal curing of the partially cured product.
    Type: Application
    Filed: January 8, 2019
    Publication date: May 23, 2019
    Inventors: Baoshan Gao, Tengfang Wang, Minghai Wang, Kangcheng Lou, Dawei Chen
  • Publication number: 20160355734
    Abstract: The present invention relates to a curable resin composition for sealing liquid crystal. The curable resin composition comprises a maleimide resin, an epoxy resin, a thermal free radical initiator, and a latent epoxy curing agent. More specifically, the resin composition can be cured with a combination of ultraviolet (UV) radiation and heat, resulting in a cured product with good curability in light-shielded area, excellent adhesion strength and high reliability.
    Type: Application
    Filed: August 19, 2016
    Publication date: December 8, 2016
    Inventors: Jing Zhou, Tengfang Wang, Qin Li, Dawei Chen