Patents by Inventor Termsupt Seemuntchaiboworn

Termsupt Seemuntchaiboworn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Endpointing for focused ion beam processing
    Patent number: 10529538
    Abstract: To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a predetermined criterion is met.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: January 7, 2020
    Assignee: FEI Company
    Inventors: Scott Edward Fuller, Jason Donald, Termsupt Seemuntchaiboworn
  • ENDPOINTING FOR FOCUSED ION BEAM PROCESSING
    Publication number: 20190172680
    Abstract: To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a predetermined criterion is met.
    Type: Application
    Filed: January 29, 2019
    Publication date: June 6, 2019
    Inventors: Scott Edward FULLER, Jason DONALD, Termsupt SEEMUNTCHAIBOWORN
  • Endpointing for focused ion beam processing
    Patent number: 10204762
    Abstract: To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a pre-determined criterion is met.
    Type: Grant
    Filed: July 16, 2012
    Date of Patent: February 12, 2019
    Assignee: FEI Company
    Inventors: Scott Edward Fuller, Jason Donald, Termsupt Seemuntchaiboworn
  • ENDPOINTING FOR FOCUSED ION BEAM PROCESSING
    Publication number: 20160126060
    Abstract: To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a pre-determined criterion is met.
    Type: Application
    Filed: July 16, 2012
    Publication date: May 5, 2016
    Inventors: Scott Edward Fuller, Jason Donald, Termsupt Seemuntchaiboworn