Patents by Inventor Terry Alan Breeden

Terry Alan Breeden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma-enhanced chemical vapor deposition (CVD) method to fill a trench in a semiconductor substrate
    Patent number: 6362098
    Abstract: In a CVD chamber (120) having a chuck (122) to hold a semiconductor substrate (100) and having a plasma generator (121) to generate a plasma (125), a trench in the substrate is filled with dielectric material from ions (126) of the plasma. The ions are forced to move in a direction (127) that is substantially perpendicular to the surface of the substrate by a pulsed unidirectional voltage between the plasma generator and the substrate, by a circular magnetic field, or by a combination of both fields.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: March 26, 2002
    Assignees: Motorola, Inc., Semiconductor 300 GmbH & Co. KG, Infineon Technologies AG
    Inventors: Terry Alan Breeden, Iraj Eric Shahvandi, Michael Thomas Tucker, Olivier Gerard Marc Vatel, Karl Emerson Mautz, Ralf Zedlitz