Patents by Inventor Terry C. Tompkins

Terry C. Tompkins has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution
    Patent number: 4601969
    Abstract: A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
    Type: Grant
    Filed: March 28, 1985
    Date of Patent: July 22, 1986
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Barbara D. Grant, Robert D. Miller, Terry C. Tompkins, Carlton G. Willson
  • Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
    Patent number: 4522911
    Abstract: A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
    Type: Grant
    Filed: June 28, 1983
    Date of Patent: June 11, 1985
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Dennis R. McKean, Robert D. Miller, Terry C. Tompkins, Carlton G. Willson
  • Positive resist compositions
    Patent number: 4397937
    Abstract: Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.
    Type: Grant
    Filed: February 10, 1982
    Date of Patent: August 9, 1983
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Dennis R. McKean, Robert D. Miller, Terry C. Tompkins, Robert J. Twieg, Carlton G. Willson