Patents by Inventor Terry Hulseweh

Terry Hulseweh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EPI defect reduction using rapid thermal annealing
    Patent number: 4784964
    Abstract: Formation of defects in epi-layers above buried layers, particularly above arsenic buried layers, is substantially reduced by providing a brief high temperature Rapid Thermal Annealing (RTA) step after buried layer implantation, annealing-activation, and junction drive-in and before epi-layer growth. Among other things, the RTA step reduces the formation of arsenic precipitates which is frequently a consequence of slow cools commonly associated with conventional furnace activation-annealing, junction drive-in, and delineation oxidation prior to epi-layer growth.
    Type: Grant
    Filed: October 19, 1987
    Date of Patent: November 15, 1988
    Assignee: Motorola Inc.
    Inventors: Terry Hulseweh, Mel Miller