Patents by Inventor Terue Tsunoda

Terue Tsunoda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4001870
    Abstract: An insulating film provided on the surface of a semiconductor device having a protective film of silicon dioxide is composed of a double layer. The double layer consists of a thin film which is disposed on at least a part of the protective film of silicon dioxide and which is made of an organic compound containing either an amino group as well as an alkoxysilane group or an epoxy group as well as an alkoxysilane group, and a film which is disposed so as to cover the thin film of an organic compound and which is made of a heat-resisting polymer resin.The heat-resisting polymer is the reaction product of 4,4'-diamino-diphenylether, 4,4'-diamino-diphenyl ether-3-carbonyl amide, and pyromellitic acid dianhydride.
    Type: Grant
    Filed: November 30, 1973
    Date of Patent: January 4, 1977
    Assignee: Hitachi, Ltd.
    Inventors: Atsushi Saiki, Kikuji Sato, Seiki Harada, Terue Tsunoda, Yoichi Oba