Patents by Inventor Teruhiko Hayano

Teruhiko Hayano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inspection device and inspection method for pattern profile, exposure system
    Patent number: 7310141
    Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.
    Type: Grant
    Filed: November 28, 2002
    Date of Patent: December 18, 2007
    Assignee: International Business Machines Corporation
    Inventors: Mitsuru Uda, Kazunari Terakawa, Akira Suzuki, Chiaki Oishi, Yasuharu Yamada, Teruhiko Hayano
  • Inspection device and inspection method for pattern profile, exposure system
    Publication number: 20050116187
    Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.
    Type: Application
    Filed: November 28, 2002
    Publication date: June 2, 2005
    Inventors: Mitsuru Uda, Kazunari Terakawa, Akira Suzuki, Chiaki Oishi, Yasuharu Yamada, Teruhiko Hayano