Patents by Inventor Teruhiko Yamazaki

Teruhiko Yamazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Negative type photoresist developing apparatus
    Patent number: 4688918
    Abstract: A developer is drawn up from a developer tank (1) by a developer pump (5) and after the flow rate of the developer has been regulated by a developer flow rate control valve (12), the developer passes through a developer flow meter (14) and reaches a pipe (16). A rinse solution is drawn up from a rinse solution tank (2) by a rinse solution pump (6) and after the flow rate of the rinse solution has been regulated by a rinse flow rate control valve (13), the rinse solution attains the pipe (16) through a rinse solution flow meter (15). The developer and the rinse solution are mixed in the pipe (16) so that the mixture is sprayed from a nozzle (17) to a negative type photoresist (11) placed on a specimen table (10).
    Type: Grant
    Filed: March 20, 1986
    Date of Patent: August 25, 1987
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yoshiki Suzuki, Teruhiko Yamazaki