Abstract: A protective film forming agent for plasma dicing which can favorably form an opening (processed groove) of a desired shape by irradiation of a laser beam, at a desired position of the protective film, upon producing semiconductor chips by cutting a semiconductor substrate by plasma dicing, and a method for producing a semiconductor chip using this protective film forming agent. The protective film forming agent comprises a water-soluble resin, a light absorber, and a solvent, and a weight loss rate when the temperature is raised to 500° C. in thermogravimetry of the water-soluble resin is at least 80 weight %.

Abstract: A polymerizable composition and a manufacturing method for an element-mounted substrate using the polymerizable composition. The polymerizable composition includes a water-soluble polymer, a nitrogen-containing monofunctional (meth)acrylic monomer, and a polymerization initiator. The composition is used to restrict a region where a sealing agent can flow in a sealing step in which at least a portion of an element provided on a substrate is sealed by using the sealing agent, and to form a sealing agent restricting material that is removed from the substrate after the sealing step.

Abstract: A protective film forming agent for plasma dicing which can favorably form an opening (processed groove) of a desired shape by irradiation of a laser beam, at a desired position of the protective film, upon producing semiconductor chips by cutting a semiconductor substrate by plasma dicing, and a method for producing a semiconductor chip using this protective film forming agent. The protective film forming agent comprises a water-soluble resin, a light absorber, and a solvent, and a weight loss rate when the temperature is raised to 500° C. in thermogravimetry of the water-soluble resin is at least 80 weight %.

Abstract: A dispersion liquid including a fiber material which is capable of forming a porous film having high porosity; a porous film formed using the dispersion liquid; a power storage element including the porous film; and a method for producing a porous film using the dispersion liquid. In the dispersion liquid including the fiber material and an organic solvent, which is used for forming a porous film by applying and drying, the fiber material contains a predetermined amount of a modified cellulose fiber including a carboxy group or a metal salt thereof, and the amount of water in the dispersion liquid is 5% by mass or less.

Abstract: A method of producing a polyimide resin that produces a polyimide resin having excellent heat resistance and mechanical properties, and having a low dielectric constant even when heat-treated at a lower temperature. The method includes heating at 120° C. to 350° C. a polyamic acid resulting from the reaction of a tetracarboxylic acid dianhydride component and a diamine component in a solvent including at least a compound represented by the general formula (1), in which R1 represents a hydrogen atom or a hydroxyl group, R2 and R3 independently represent a hydrogen atom or a C1 to C3 alkyl group, and R4 and R5 independently represent a C1 to C3 alkyl group.

Abstract: A dispersion liquid including a fiber material which is capable of forming a porous film having high porosity; a porous film formed using the dispersion liquid; a power storage element including the porous film; and a method for producing a porous film using the dispersion liquid. In the dispersion liquid including the fiber material and an organic solvent, which is used for forming a porous film by applying and drying, the fiber material contains a predetermined amount of a modified cellulose fiber including a carboxy group or a metal salt thereof, and the amount of water in the dispersion liquid is 5% by mass or less.

Abstract: A photosensitive resin composition for dry etching including a water-soluble resin, a photopolymerizable monomer, and a photopolymerization initiator, and a method for producing a resist pattern for dry etching. The method includes forming a resin layer with the photosensitive resin composition on a substrate; exposing the resin layer with positional selectivity; and developing the exposed resin layer with water at a temperature less than 50° C., so as to form a resist pattern.

Abstract: A photosensitive resin composition for dry etching including a water-soluble resin, a photopolymerizable monomer, and a photopolymerization initiator, and a method for producing a resist pattern for dry etching. The method includes forming a resin layer with the photosensitive resin composition on a substrate; exposing the resin layer with positional selectivity; and developing the exposed resin layer with water at a temperature less than 50° C., so as to form a resist pattern.

Abstract: A method of producing a polyimide resin that produces a polyimide resin having excellent heat resistance and mechanical properties, and having a low dielectric constant even when heat-treated at a lower temperature. The method includes heating at 120° C. to 350° C. a polyamic acid resulting from the reaction of a tetracarboxylic acid dianhydride component and a diamine component in a solvent including at least a compound represented by the general formula (1), in which R1 represents a hydrogen atom or a hydroxyl group, R2 and R3 independently represent a hydrogen atom or a C1 to C3 alkyl group, and R4 and R5 independently represent a C1 to C3 alkyl group.

Abstract: Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.

Abstract: Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.

Abstract: A photosensitive resin composition and a photosensitive dry film which are excellent in both sensitivity and stability and are well-balanced in tent strength, resolution and plating non-staining are provided. The photosensitive resin composition comprises an alkali-soluble resin (A), a photopolymerizable compound (B) and a photopolymerization initiator (C), and the polymerization initiator (C) comprises a hexaarylbisimidazole based compound (C1) and a multifunctional thiol compound (C2) as essential components. The photosensitive dry film has at least a photosensitive resin layer formed from the photosensitive resin composition on a support film.

Abstract: A photosensitive resin composition and a photosensitive dry film which are excellent in both sensitivity and stability and are well-balanced in tent strength, resolution and plating non-staining are provided. The photosensitive resin composition comprises an alkali-soluble resin (A), a photopolymerizable compound (B) and a photopolymerization initiator (C), and the polymerization initiator (C) comprises a hexaarylbisimidazole based compound (C1) and a multifunctional thiol compound (C2) as essential components. The photosensitive dry film has at least a photosensitive resin layer formed from the photosensitive resin composition on a support film.

Abstract: A photosensitive resin composition for h-ray exposure which has high sensitivity for h-ray and is excellent in resolution of a resist pattern, and a photosensitive dry film by the use thereof are provided. The photosensitive resin composition is composed of an alkali-soluble resin (A) having an alicyclic epoxy group-containing unsaturated compound in a part of a carboxyl group of a carboxyl group-containing acryl copolymer as well as having a weight-average molecular weight of 1,000 to 100,000, an ethylenically unsaturated compound (B) and a photopolymerization initiator (C) including at least a photopolymerization initiator (C1) whose absorption coefficient for light with a wavelength of 405 nm is 1 or more as an essential component.