Patents by Inventor Teruhisa Matsumaru

Teruhisa Matsumaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11421079
    Abstract: A method for controlling a polyimide backbone structure, including: in preparation of a polyimide through reaction of a diamine component and (1S,2R,4S,5R)-cyclohexanetetracarboxylic dianhydride in an organic solvent containing an aprotic amide solvent and a lactone solvent, adjusting one or more of reaction conditions of a mass ratio of the aprotic amide solvent and the lactone solvent, a reaction temperature, a reaction time, and an amount of the aprotic amide solvent, so as to convert a cis-structure derived from the (1S,2R,4S,5R)-cyclohexanetetracarboxylic dianhydride in the formed polyimide to a trans-structure derived from (1R,2S,4S,5R)-cyclohexanetetracarboxylic dianhydride corresponding to the reaction conditions, thereby controlling a proportion of the trans-structure.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: August 23, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Teruhisa Matsumaru, Yohei Abiko, Shuya Suenaga
  • Patent number: 10968316
    Abstract: Disclosed are a polyimide resin containing a structural unit represented by the following formula (1-1), and a polyimide film containing a structural unit represented by the following formula (1-2) and having a thickness of 10 to 50 ?m. R1 and R2 in the formula (1-1) each independently represent any group of the following formulae (i) to (iv), R1 and R2 in the formula (1-2) each independently represent a group of the following formula (i) or formula (ii), and in these formulae, * bonds to the carbon with * in the formula (1-1) and the formula (1-2) and ** bonds to the carbon with ** in the formula (1-1) and the formula (1-2). A polyimide resin capable of forming a polyimide film excellent in transparency and having a low coefficient of linear thermal expansion, and a polyimide film having a lower coefficient of linear thermal expansion are provided.
    Type: Grant
    Filed: September 16, 2016
    Date of Patent: April 6, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Teruhisa Matsumaru, Shuya Suenaga, Yohei Abiko
  • Patent number: 10557003
    Abstract: Provided is a polyimide resin composition capable of forming a polyimide film which is excellent in transparency and heat resistance and has a low thermal linear expansion coefficient. The polyimide resin composition contains a polyimide resin produced by reacting (A) a tetracarboxylic dianhydride with (B) a diamine containing a phenolic hydroxyl group-containing diamine in an amount of from 5 to 100 mol % of the total diamine; and silica microparticles, in a ratio by mass of from 25/75 to 60/40.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: February 11, 2020
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shuya Suenaga, Teruhisa Matsumaru
  • Publication number: 20190100622
    Abstract: A method for controlling a polyimide backbone structure, including: in preparation of a polyimide through reaction of a diamine component and (1S,2R,4S,5R)-cyclohexanetetracarboxylic dianhydride in an organic solvent containing an aprotic amide solvent and a lactone solvent, adjusting one or more of reaction conditions of a mass ratio of the aprotic amide solvent and the lactone solvent, a reaction temperature, a reaction time, and an amount of the aprotic amide solvent, so as to convert a cis-structure derived from the (1S,2R,4S,5R)-cyclohexanetetracarboxylic dianhydride in the formed polyimide to a trans-structure derived from (1R,2S,4S,5R)-cyclohexanetetracarboxylic dianhydride corresponding to the reaction conditions, thereby controlling a proportion of the trans-structure.
    Type: Application
    Filed: February 24, 2017
    Publication date: April 4, 2019
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Teruhisa MATSUMARU, Yohei ABIKO, Shuya SUENAGA
  • Patent number: 10066058
    Abstract: A polyimide resin contains repeating structural units represented by formulas (1) and (2), wherein the content of the repeating structural unit represented by formula (2) relative to the total of the repeating structural unit represented by formula (1) and the repeating structural unit represented by formula (2) falls within a specific range and the content of the divalent group represented by the following structural formula (B1) falls within a specific range: X1 represents a tetravalent group containing an alicyclic hydrocarbon structure and having a carbon number of from 4 to 22. X2 represents a tetravalent group containing an aromatic ring and having a carbon number of from 6 to 22.
    Type: Grant
    Filed: July 3, 2014
    Date of Patent: September 4, 2018
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shuya Suenaga, Teruhisa Matsumaru
  • Publication number: 20180244847
    Abstract: Disclosed are a polyimide resin containing a structural unit represented by the following formula (1-1), and a polyimide film containing a structural unit represented by the following formula (1-2) and having a thickness of 10 to 50 ?m. R1 and R2 in the formula (1-1) each independently represent any group of the following formulae (i) to (iv), R1 and R2 in the formula (1-2) each independently represent a group of the following formula (i) or formula (ii), and in these formulae, * bonds to the carbon with * in the formula (1-1) and the formula (1-2) and ** bonds to the carbon with ** in the formula (1-1) and the formula (1-2). A polyimide resin capable of forming a polyimide film excellent in transparency and having a low coefficient of linear thermal expansion, and a polyimide film having a lower coefficient of linear thermal expansion are provided.
    Type: Application
    Filed: September 16, 2016
    Publication date: August 30, 2018
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Teruhisa MATSUMARU, Shuya SUENAGA, Yohei ABIKO
  • Publication number: 20170306093
    Abstract: The present invention provides a polyimide resin composition capable of forming a film having heat resistance and transparency and, in addition thereto, mechanical strength, surface hardness and flex resistance, a polyimide resin, a polyimide film and a laminate. The present invention includes: a polyimide resin composition containing a polyimide resin that has structural units represented by specific structures in a specific ratio, containing silica fine particles; the polyimide resin; a polyimide film; and a laminate.
    Type: Application
    Filed: October 15, 2015
    Publication date: October 26, 2017
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Teruhisa MATSUMARU, Yuuki SATO, Shuya SUENAGA, Masayuki DAITO, Kazuaki MUKASA
  • Publication number: 20160137789
    Abstract: A polyimide resin contains repeating structural units represented by formulas (1) and (2), wherein the content of the repeating structural unit represented by formula (2) relative to the total of the repeating structural unit represented by formula (1) and the repeating structural unit represented by formula (2) falls within a specific range and the content of the divalent group represented by the following structural formula (B1) falls within a specific range: X1 represents a tetravalent group containing an alicyclic hydrocarbon structure and having a carbon number of from 4 to 22. X2 represents a tetravalent group containing an aromatic ring and having a carbon number of from 6 to 22.
    Type: Application
    Filed: July 3, 2014
    Publication date: May 19, 2016
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shuya SUENAGA, Teruhisa MATSUMARU
  • Publication number: 20150225523
    Abstract: Provided is a polyimide resin composition capable of forming a polyimide film which is excellent in transparency and heat resistance and has a low thermal linear expansion coefficient. The polyimide resin composition contains a polyimide resin produced by reacting (A) a tetracarboxylic dianhydride with (B) a diamine containing a phenolic hydroxyl group-containing diamine in an amount of from 5 to 100 mol % of the total diamine; and silica microparticles, in a ratio by mass of from 25/75 to 60/40.
    Type: Application
    Filed: September 27, 2013
    Publication date: August 13, 2015
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shuya Suenaga, Teruhisa Matsumaru