Abstract: A measuring head includes a light source unit, a first image pickup element, a second image pickup element, an objective optical system, an optical path splitting element, a common optical path, a first optical path, and a second optical path. The common optical path is located on one side of the optical path splitting element, and the first optical path and a second optical path are located on the other side. The optical path splitting element is disposed at a position where the first optical path and the second optical path intersect. The light source unit and the first image pickup element are disposed at predetermined positions. The second image pickup element is disposed at a position different from the predetermined positions. Each of the predetermined positions is a focal position of the objective optical system or a position conjugate to the focal position of the objective optical system.

Abstract: A measuring head includes a light source unit, a first image pickup element, a second image pickup element, an objective optical system, an optical path splitting element, a common optical path, a first optical path, and a second optical path. The common optical path is located on one side of the optical path splitting element, and the first optical path and a second optical path are located on the other side. The optical path splitting element is disposed at a position where the first optical path and the second optical path intersect. The light source unit and the first image pickup element are disposed at predetermined positions. The second image pickup element is disposed at a position different from the predetermined positions. Each of the predetermined positions is a focal position of the objective optical system or a position conjugate to the focal position of the objective optical system.

Abstract: A microscope apparatus including a light source device, a storage table, and a setting controller is provided. The light source device includes a light intensity adjuster which changes light intensity of an illumination light of plural different wavelength regions selectively extracted from light emitted from a light source, and thereby emitting the illumination light including light of the plural different wavelength regions in such a manner that a light intensity ratio of light of one wavelength region to light of another wavelength region is variable. The storage table stores therein set values of the light intensity adjuster for each of combination patterns of the wavelength regions of the illumination light emitted from the light source device.

Abstract: A wavelength selection unit includes a light source which emits light of at least a predetermined wavelength region, a collector lens which collects the light emitted from the light source and emits a parallel flux which is inclined relative to a light axis of an optical system of itself, a selective reflection optical system which reflects light of a predetermined wavelength region from the parallel flux selectively, and a returning optical system which returns each reflected flux reflected by the selective reflection optical system symmetrically about a reflected light axis of the selective reflection optical system. The collector lens collects a back flux which is returned by the returning optical system and which is re-reflected by the selective reflection optical system, and forms a light source image of the light source.

Abstract: This lens evaluation device comprises a plurality of point light sources arranged on the plane, an imaging unit for picking up an object and obtaining its image, a movement unit for changing the relative distance between the point light source or the imaging unit and the optical system to be evaluated, a storage medium for recording stack images obtained by the imaging unit picking up the images of the plurality of point light sources via the optical system every time the movement unit changes the relative distance, an image position calculation unit for calculating a plurality of image positions from the plurality of pieces of point light source image in the stack image recorded on the storage medium and an aberration acquisition unit for fitting an aberration model function to the plurality of image positions calculated and obtaining an aberration measurement value.

Abstract: A microscope apparatus including a light source device, a storage table, and a setting controller is provided. The light source device includes a light intensity adjuster which changes light intensity of an illumination light of plural different wavelength regions selectively extracted from light emitted from a light source, and thereby emitting the illumination light including light of the plural different wavelength regions in such a manner that a light intensity ratio of light of one wavelength region to light of another wavelength region is variable. The storage table stores therein set values of the light intensity adjuster for each of combination patterns of the wavelength regions of the illumination light emitted from the light source device.

Abstract: A wavelength selection unit includes a light source which emits light of at least a predetermined wavelength region, a collector lens which collects the light emitted from the light source and emits a parallel flux which is inclined relative to a light axis of an optical system of itself, a selective reflection optical system which reflects light of a predetermined wavelength region from the parallel flux selectively, and a returning optical system which returns each reflected flux reflected by the selective reflection optical system symmetrically about a reflected light axis of the selective reflection optical system. The collector lens collects a back flux which is returned by the returning optical system and which is re-reflected by the selective reflection optical system, and forms a light source image of the light source.

Abstract: This lens evaluation device comprises a plurality of point light sources arranged on the plane, an imaging unit for picking up an object and obtaining its image, a movement unit for changing the relative distance between the point light source or the imaging unit and the optical system to be evaluated, a storage medium for recording stack images obtained by the imaging unit picking up the images of the plurality of point light sources via the optical system every time the movement unit changes the relative distance, an image position calculation unit for calculating a plurality of image positions from the plurality of pieces of point light source image in the stack image recorded on the storage medium and an aberration acquisition unit for fitting an aberration model function to the plurality of image positions calculated and obtaining an aberration measurement value.

Abstract: A laser machining apparatus, provided with a stage on which a workpiece is placed, an emission device for emitting laser light toward a surface of the workpiece, an optical system for splitting the laser light into a plurality of beams, and for focusing the beams as a plurality of spots on the surface of or within the workpiece, and a movement device for moving the plurality of spots in a horizontal direction relative to the workpiece.

Abstract: An apparatus for inspecting a substrate includes a substrate holding member for holding a substrate to be inspected, a driving mechanism for raising the substrate holding member to a predetermined angle or less, a position coordinate detecting section provided at side edge of the substrate in at least two directions for detecting coordinates of a defect present in the substrate, an observation system supporting section provided for supporting a micro observation system and moving on the surface of the substrate, and a controlling section for controlling of the movement of the micro observation system of the observation system supporting section to correspond to a defect present in the substrate, on the basis of the position coordinates of the defect detected by the position coordinate detecting section.

Abstract: The apparatus for inspecting a substrate of the present invention comprises substrate holding member for holding a substrate to be inspected, a driving mechanism for raising the substrate holding member to a predetermined angle or less, a position coordinate detecting section provided at side edge of the substrate in at least two directions, for detecting coordinates of a defect present in the substrate, an observation system supporting section provided for supporting a micro observation system and moving on the surface of the substrate, and a controlling section for controlling of the movement of the micro observation system of the observation system supporting section to correspond to a defect present in the substrate, on the basis of the position coordinates of the defect detected by the position coordinate detecting section.

Abstract: A confocal microscope is provided which uses a confocal disk. The confocal microscope includes a light source, a high-NA and low-magnification objective lens which forms an image of the confocal disk obtained by irradiation with a light from the light source on a sample, and a first image formation lens system disposed between the confocal disk and the objective lens. A first image formation lens driving mechanism is provided for moving the first image formation lens system in a light axis direction and adjusting a focal point position of the objective lens with respect to the sample, and a second image formation lens system is provided which forms a sectioning image formed on the confocal disk into an image by photoelectric conversion.

Abstract: A confocal microscope which uses a confocal disk, comprising a light source, a high-NA and low-magnification objective lens which forms an image of said confocal disk obtained by irradiation with a light from the light source on a sample, a first image formation lens system disposed between said confocal disk and said objective lens, first image formation lens driving means for moving said first image formation lens system in a light axis direction and adjusting a focal point position of said objective lens with respect to said sample, and a second image formation lens system which forms a sectioning image formed on said confocal disk into an image in photoelectric conversion means.

Abstract: The apparatus for inspecting a substrate of the present invention comprises substrate holding member for holding a substrate to be inspected, a driving mechanism for raising the substrate holding member to a predetermined angle or less, a position coordinate detecting section provided at side edge of the substrate in at least two directions, for detecting coordinates of a defect present in the substrate, an observation system supporting section provided for supporting a micro observation system and moving on the surface of the substrate, and a controlling section for controlling of the movement of the micro observation system of the observation system supporting section to correspond to a defect present in the substrate, on the basis of the position coordinates of the defect detected by the position coordinate detecting section.

Abstract: An apparatus for inspecting a substrate includes a substrate holding member for holding a substrate to be inspected, a driving mechanism for raising the substrate holding member to a predetermined angle or less, a position coordinate detecting section provided at side edge of the substrate in at least two directions, for detecting coordinates of a defect present in the substrate, an observation system supporting section provided for supporting a micro observation system and moving on the surface of the substrate, and a controlling section for controlling of the movement of the micro observation system of the observation system supporting section to correspond to a defect present in the substrate, on the basis of the position coordinates of the defect detected by the position coordinate detecting section.

Abstract: The apparatus for inspecting a substrate of the present invention comprises substrate holding member for holding a substrate to be inspected, a driving mechanism for raising the substrate holding member to a predetermined angle or less, a position coordinate detecting section provided at side edge of the substrate in at least two directions, for detecting coordinates of a defect present in the substrate, an observation system supporting section provided for supporting a micro observation system and moving on the surface of the substrate, and a controlling section for controlling of the movement of the micro observation system of the observation system supporting section to correspond to a defect present in the substrate, on the basis of the position coordinates of the defect detected by the position coordinate detecting section.

Abstract: A fine surface profile meter includes an X-Y stage, supported by a leaf spring, for supporting a sample thereon, a piezoelectric actuator for two-dimensionally scanning the X-Y stage, a positioning table, disposed below the X-Y stage, for positioning the X-Y stage at an arbitrary position, an objective lens disposed above the X-Y stage, an observation optical system for allowing an operator to observe an enlarged sample image, a measurement optical system, an optical axis of which is aligned with an optical path of the objective lens through a beam splitter, the measurement optical system for emitting a laser beam onto the sample through the objective lens and to receive the laser beam reflected by the sample, a calculator circuit for calculating height information of the sample using an output from the measurement optical system and for obtaining a two-dimensional distribution of the height information, a cover for shielding the X-Y stage, the positioning means, the objective lens, the beam splitter, the obs

Abstract: In order to substantially reduce the time required for examination and to enable the structure of the microscope apparatus for examining a wafer to be made in a compact size, the apparatus comprises a wafer examination unit provided midway on the transportation course of the wafer transporting means for being able to move the wafer under examination independently of the direction of its transporation, and an objective disposed above the wafer examination unit for being able to move along the upper face of the wafer which is held at the position of examination and in a direction different from the direction of the transportation.

Abstract: A microscope wherein, in order that the observing position may be variable over a wide range of a sample to be observed without requiring a large objective, the objective optical system is so formed as to be movable in parallel with the sample surface and the light path length between the objective optical system and eyepiece optical system is made variable by moving the objective optical system.

Abstract: An optical surface profile measuring device adapted to be able to simultaneously or substantially simultaneously measure a same part on the surface of an object to be measured with two different measuring ranges by combining a surface profile measuring device of a high resolving power using the critical angle method with a surface profile measuring device having a wide measuring range using the astigmatism method, in order to facilitate the setting of a detecting head within a measuring range while maintaining a high resolving power and to enable to measure automatically regardless of the state of the measured surface.