Abstract: The invention concerns a pressure transducer comprising a deflecting membrane, said membrane comprising two piezoresistors (10, 11) of different types, said piezoresistors being arranged such that a same stress or a same strain is applied on said piezoresistors and said piezoresistors (10, 11) yield changes in resistance, wherein a piezoresistor of a first type (10) is positioned such that its current direction is perpendicular to the stress direction (trans verse) and a piezoresistor of a second type is parallel to the stress direction (longitudinal), allowing, when a tensile stress is applied to the transducer, said piezoresistor of the first type to increase its resistance and said piezoresistor of the second type to decrease the resistance; or when a compressive stress is applied to the transducer, said piezoresistor of the first type to decrease its resistance and said piezoresistor of the second type to increase the resistance; wherein said piezoresistor of the first type (10) has a specific width and a

Abstract: A double-side-coated surface stress sensor includes a sensing membrane structure portion where at least two ends opposite each other are fixed on a mounting portion; a receptor layer that coats both surfaces of the sensing membrane structure portion; and an element detecting a stress, which is provided in the vicinity of at least one of the fixed two ends, opposite each other, of the sensing membrane structure portion or at least one of the fixed two ends, opposite each other, of the mounting portion, in which in a detection output is obtained from the element based on the stress which is applied onto the receptor layer coating both of the surfaces of the sensing membrane structure portion. Accordingly, it is possible to provide a double-side-coated surface stress sensor which coats both surfaces of the sensing membrane structure portion by the receptor layer, thereby obtaining a sufficiently large detection output.

Abstract: Deflection of a free end of one plate-like member, that is caused by uniform stress, is transmitted to an other plate-like member by moving a free end of the other plate-like member. According to this configuration, the uniform stress applied to the one plate-like member is converted into stress induced by a point force in the other plate-like member, and then, the induced stress is concentrated on a fixed end side narrow portion in which a piezoresistor is provided. Thus, a novel structure for a piezoresistive surface stress sensor having high sensitivity to uniform stress applied to the surface of the sensor is provided.

Abstract: A double-side-coated surface stress sensor includes a sensing membrane structure portion where at least two ends opposite each other are fixed on a mounting portion; a receptor layer that coats both surfaces of the sensing membrane structure portion; and an element detecting a stress, which is provided in the vicinity of at least one of the fixed two ends, opposite each other, of the sensing membrane structure portion or at least one of the fixed two ends, opposite each other, of the mounting portion, in which in a detection output is obtained from the element based on the stress which is applied onto the receptor layer coating the both surfaces of the sensing membrane structure portion. Accordingly, it is possible to provide a double-side-coated surface stress sensor which coats both surfaces of the sensing membrane structure portion by the receptor layer, thereby obtaining a sufficiently large detection output.

Abstract: The invention concerns a pressure transducer comprising a deflecting membrane, said membrane comprising two piezoresistors (10, 11) of different types, said piezoresistors being arranged such that a same stress or a same strain is applied on said piezoresistors and said piezoresistors (10, 11) yield changes in resistance, wherein a piezoresistor of a first type (10) is positioned such that its current direction is perpendicular to the stress direction (trans verse) and a piezoresistor of a second type is parallel to the stress direction (longitudinal), allowing, when a tensile stress is applied to the transducer, said piezoresistor of the first type to increase its resistance and said piezoresistor of the second type to decrease the resistance; or when a compressive stress is applied to the transducer, said piezoresistor of the first type to decrease its resistance and said piezoresistor of the second type to increase the resistance; wherein said piezoresistor of the first type (10) has a specific width and a

Abstract: Deflection of a free end of one plate-like member, that is caused by uniform stress, is transmitted to the other plate-like member by moving a free end of the other plate-like member. According to this configuration, the uniform stress applied to the one plate-like member is converted into stress induced by a point force in the other plate-like member, and then, the induced stress is concentrated on a fixed end side narrow portion in which a piezoresistor is provided. Thus, a novel structure for a piezoresistive surface stress sensor having high sensitivity to uniform stress applied to the surface of the sensor is provided.

Abstract: An actuating and sensing device for scanning probe microscopes includes a tuning fork (21) containing two prongs, a connection device (23) such as a spring, and a probing tip (22). The tip (22) is connected to both prongs of the tuning fork (21) with the connection device (23). The tuning fork (21) is used as a mechanical resonator to vibrate. The movements of the prongs are transformed via the connection device (23) into movements of the tip (22), wherein the tip movements can be in different planes than the movement plane of the prongs.

Abstract: A micro device comprising a SU-8 photoresist layer adhered to a thin layer of, for example, silicon nitride, silicon oxide, metal, and diamond. The SU-8 layer is clamped on the thin layer by using an under-etching technique.

Abstract: A micro device comprising a SU-8 photoresist layer adhered to a thin layer of, for example, silicon nitride, silicon oxide, metal, and diamond. The SU-8 layer is clamped on the thin layer by using an under-etching technique.

Abstract: The invention relates to an actuating and sensing device for scanning probe microscopes. The actuating and sensing device includes a tuning fork (21) containing two prongs, connection means (23), e.g. a spring means, and a probing tip (22). The tip (22) is connected to both prongs of the tuning fork (21) with said connection means (23). The tuning fork (21) is used as a mechanical resonator to vibrate. The movements of the prongs are transformed via the connection means (23) into movements of the tip (22), wherein the tip movements can be in different planes than the movement plane of the prongs.

Abstract: The invention relates to so-called scanning tips of probes necessary for scanning a measured object, in particular in scanning force microscopes and other scanning microscopes, so-called scanning probe microscopes. The possible resolution of such microscopes depends primarily on the fineness of the tip, i.e. its curvature or radius being as small as possible. According to the invention, a photostructurable material, e.g. a photosensitive resists, serves as the material for the scanning tip which is exposed via a mask and is subsequently developed/hardened in a manner known per se. The unexposed parts of the photosensitive resist are removed as usual. By the shape of the exposure mask, the preferably directed exposure of the photosensitive resist, and the subsequent hardening, a tip is formed preferably laterally on or at a carrier, usually made from a different material, which is provided with a very small radius, thus very well suitable for scanning probe microscopy and similar applications.

Abstract: The invention relates to so-called scanning tips of probes necessary for scanning a measured object, in particular in scanning force microscopes and other scanning microscopes, so-called scanning probe microscopes. The possible resolution of such microscopes depends primarily on the fineness of the tip, i.e. its curvature or radius being as small as possible. According to the invention, a photostructurable material, e.g. a photosensitive resists, serves as the material for the scanning tip which is exposed via a mask and is subsequently developed/hardened in a manner known per se. The unexposed parts of the photosensitive resist are removed as usual. By the shape of the exposure mask, the preferably directed exposure of the photosensitive resist, and the subsequent hardening, a tip is formed preferably laterally on or at a carrier, usually made from a different material, which is provided with a very small radius, thus very well suitable for scanning probe microscopy and similar applications.