Patents by Inventor Teruo Honiden
Teruo Honiden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7553459Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: GrantFiled: July 26, 2006Date of Patent: June 30, 2009Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 7368092Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: GrantFiled: December 1, 2003Date of Patent: May 6, 2008Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Publication number: 20070231225Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: June 8, 2007Publication date: October 4, 2007Applicants: FUJIKIN INCORPORATED, Tadahiro OHMIInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 7258845Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: GrantFiled: February 2, 2001Date of Patent: August 21, 2007Assignee: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Publication number: 20060292047Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: July 26, 2006Publication date: December 28, 2006Applicant: FUJIKIN INCORPORATEDInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 7008598Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell.Type: GrantFiled: July 7, 2004Date of Patent: March 7, 2006Assignees: Fujikin Incorporated, Tadahiro OHMIInventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Kenji Tubota, Teruo Honiden, Touru Hirai, Katunori Komehana, Keiji Hirao
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Patent number: 6919056Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, and the peeling off of the platinum coat catalyst layer inside are all prevented more completely to further increase the safety of the reactor for generating moisture, and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell. The reactor has a reactor shell A with an interior space; a reflector on an inlet side facing a gas feed port in the interior space of the reactor; a reflector on an outlet side facing a moisture gas take-out port in the interior space; and a platinum coat catalyst layer 8 formed on an inside wall of a reactor structural component on the outlet side. Hydrogen and oxygen fed into the interior space of the reactor react without combustion.Type: GrantFiled: July 12, 2001Date of Patent: July 19, 2005Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Kenji Tubota, Teruo Honiden, Touru Hirai, Katunori Komehana, Keiji Hirao
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Publication number: 20040247502Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell.Type: ApplicationFiled: July 7, 2004Publication date: December 9, 2004Applicant: Fujikin IncorporatedInventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Kenji Tubota, Teruo Honiden, Touru Hirai, Katunori Komehana, Keiji Hirao
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Publication number: 20040137744Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: December 1, 2003Publication date: July 15, 2004Applicants: Fujikin Incorporated, Tadahiro OHMIInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 6672942Abstract: A grinding machine for welding electrodes comprises a housing 1, grinder motor 2, grinding disk 3, swing plate 4, holder guide 6, electrode holder 7, electrode turning motor 8 and swing plate moving mechanism 9. The axis &phgr;a of electrode A extends along a line perpendicular to the axis &phgr; of motor drive shaft 2a and first grinding part 3a of the grinding disk is formed to conform to the finishing contour of electrode A. The grinding disk is turned by the grinder motor and at the same time electrode A is turned by the electrode turning motor. The grinding machine, using one grinding disk, grinds the end portion of an electrode to final form and finishes the tip end of the electrode to a mirror surface.Type: GrantFiled: October 13, 2001Date of Patent: January 6, 2004Assignees: Fujikin Incorporated, Japan Science and Technology CorporationInventors: Nobukazu Ikeda, Akihiro Morimoto, Katunori Komehana, Teruo Honiden
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Patent number: 6622543Abstract: A gas detection sensor permits precise measurement of the concentration of flammable gas in a detection or subject gas and the concentration of oxygen in a detection gas containing flammable gases. In the sensor, the heating of the sensor by contact catalytic reaction of flammable gas gives off a detection signal of the flammable gas. The gas detection sensor has a first detection sensor including a diaphragm having a platinum coat on a side which the flowing detection gas comes in contact with, and a thermocouple having respective ends of two different metals placed close to each other and fixed on the side of the diaphragm not coming in contact with the flowing detection gas and which is heated by the contact catalytic reaction of flammable gas. A second detection sensor similar to the first detection sensor detects the temperature of the flowing detection gas.Type: GrantFiled: November 15, 2001Date of Patent: September 23, 2003Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Katunori Komehana, Teruo Honiden
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Publication number: 20020134135Abstract: An unreacted gas detector including a reactor unit for producing a target gas by way of reacting material gases in its reaction chamber, a sensor body connected to the reactor unit, a measurement space provided in the sensor body for allowing the target gas to flow, an unreacted gas sensor having a temperature measurement section covered by a catalyst layer and disposed inside the measurement space, and a target gas sensor with its temperature measurement section disposed in the sensor body. Any unreacted gas remaining in the target gas is reacted by the catalyst layer so that a resulted temperature change is detected by the unreacted gas sensor, and a target gas temperature is measured by target gas temperature sensor, thus finding a unreacted gas concentration from a temperature difference between the temperatures obtained by the unreacted gas sensor and the target gas temperature sensor.Type: ApplicationFiled: March 13, 2002Publication date: September 26, 2002Applicant: FUJIKIN INCORPORATEDInventors: Katsunori Komehana, Yukio Minami, Akihiro Morimoto, Koji Kawada, Teruo Honiden, Osamu Nakamura, Toru Hirai, Nobukazu Ikeda
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Publication number: 20020136676Abstract: A reactor (2) for generating moisture in which the starting material gases are caused to undergo turbulence so as to increase the efficiency of the moisture-generating reaction.Type: ApplicationFiled: March 12, 2002Publication date: September 26, 2002Applicant: Fujikin IncorporatedInventors: Katsunori Komehana, Yukio Minami, Koji Kawada, Akihiro Morimoto, Nobukazu Ikeda, Osamu Nakamura, Teruo Honiden, Toru Hirai
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Publication number: 20020122758Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: February 2, 2001Publication date: September 5, 2002Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 6387158Abstract: A method of removing moisture efficiently in the gas supply system by evacuation at normal temperature without using the baking method. The method involves flowing a gas to remove moisture in the gas supply system with the flow pressure of the gas to remove moisture set at not lower than a minimum pressure at which the gas flow becomes viscous and not higher than a water saturated vapor pressure at a flow temperature of the gas to remove moisture. The gas to remove moisture achieves a viscous flow when a mean free path of gas molecules is smaller than a diameter of piping of the gas supply system. If the gas for removing moisture is evacuated at normal temperature under such conditions, the adsorbed moisture on an inside surface of the piping and in the valves and filters can be removed effectively.Type: GrantFiled: May 4, 2001Date of Patent: May 14, 2002Assignee: Fujikin IncorporatedInventors: Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Teruo Honiden, Kouji Kawada, Katunori Komehana, Touru Hirai, Michio Yamaji
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Publication number: 20020000161Abstract: A method of removing moisture efficiently in the gas supply system by evacuation at normal temperature without using the baking method. The method involves flowing a gas to remove moisture in the gas supply system with the flow pressure of the gas to remove moisture set at not lower than a minimum pressure at which the gas flow becomes viscous and not higher than a water saturated vapor pressure at a flow temperature of the gas to remove moisture. The gas to remove moisture achieves a viscous flow when a mean free path of gas molecules is smaller than a diameter of piping of the gas supply system. If the gas for removing moisture is evacuated at normal temperature under such conditions, the adsorbed moisture on an inside surface of the piping and in the valves and filters can be removed effectively.Type: ApplicationFiled: May 4, 2001Publication date: January 3, 2002Inventors: Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Teruo Honiden, Kouji Kawada, Katunori Komehana, Touru Hirai, Michio Yamaji
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Publication number: 20010048907Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell.Type: ApplicationFiled: July 12, 2001Publication date: December 6, 2001Applicant: Fujikin IncorporatedInventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Kenji Tubota, Teruo Honiden, Touru Hirai, Katunori Komehana, Keiji Hirao