Patents by Inventor Teruo Masubuchi

Teruo Masubuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer substrates for radiation-induced graft polymerization and filter stock
    Patent number: 6818038
    Abstract: A radiation graft treated material in the form of a woven or non-woven fabric material that is composed of polymer monofilament fiber of which only the surface has undergone a radiation-induced graft polymerization but of which the center remains unaffected by grafting.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: November 16, 2004
    Assignee: Ebara Corporation
    Inventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori
  • Polymer substrates for radiation-induced graft polymerization and filter stock
    Patent number: 6773654
    Abstract: A method for performing radiation-inducted graft polymerization on substrates in the form of webs of woven or non-woven fabric, which includes the steps of exposing a substrate woven or non-woven fabric composed of polymer fiber to electron beams in a nitrogen atmosphere, contacting the irradiated substrate with a specified amount of monomer in a nitrogen atmosphere, and subjecting the monomer and the substrate in mutual contact to graft polymerization in a nitrogen atmosphere, characterized in that the first through third steps are performed in succession.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: August 10, 2004
    Assignee: Ebara Coporation
    Inventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori
  • Apparatus for radiation-induced graft polymerization treatment of fabric webs
    Patent number: 6659751
    Abstract: A polymer substrate for radiation-induced graft polymerization in the form of a woven or non-woven fabric that comprises a woven or non-woven fabric composed of polymer fiber and a reinforcement polymer having a greater strength and a slower rate of radiation-induced graft polymerization than said polymer fiber. Also, radiation graft treated stock prepared from said polymer substrate. In another aspect, a radiation graft treated material in the form of a woven or non-woven fabric material that is composed of polymer monofilament fiber of which only the surface has undergone a radiation-induced graft polymerization but of which the center remains unaffected by grafting.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: December 9, 2003
    Assignee: Ebara Corporation
    Inventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori
  • Polymer substrates for radiation-induced graft polymerization and filter stock
    Publication number: 20030153225
    Abstract: A radiation graft treated material in the form of a woven or non-woven fabric material that is composed of polymer monofilament fiber of which only the surface has undergone a radiation-induced graft polymerization but of which the center remains unaffected by grafting.
    Type: Application
    Filed: December 4, 2002
    Publication date: August 14, 2003
    Applicant: EBARA CORPORATION
    Inventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori
  • Polymer substrates for radiation-induced graft polymerization and filter stock
    Publication number: 20030134551
    Abstract: A method for performing radiation-inducted graft polymerization on substrates in the form of webs of woven or non-woven fabric, which includes the steps of exposing a substrate woven or non-woven fabric composed of polymer fiber to electron beams in a nitrogen atmosphere, contacting the irradiated substrate with a specified amount of monomer in a nitrogen atmosphere, and subjecting the monomer and the substrate in mutual contact to graft polymerization in a nitrogen atmosphere, characterized in that the first through third steps are performed in succession.
    Type: Application
    Filed: December 4, 2002
    Publication date: July 17, 2003
    Applicant: EBARA CORPORATION
    Inventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori