Patents by Inventor Terushige Asakawa

Terushige Asakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process management system
    Patent number: 6757621
    Abstract: A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.
    Type: Grant
    Filed: January 16, 2003
    Date of Patent: June 29, 2004
    Assignees: Hitachi, Ltd., Hitachi Engineering Co., Ltd.
    Inventors: Fumio Mizuno, Seiji Isogai, Kenji Watanabe, Yasuhiro Yoshitake, Terushige Asakawa, Yuichi Ohyama, Hidekuni Sugimoto, Seiji Ishikawa, Masataka Shiba, Jun Nakazato, Makoto Ariga, Tetsuji Yokouchi, Toshimitsu Hamada, Ikuo Suzuki, Masami Ikota, Mari Nozoe, Isao Miyazaki, Yoshiharu Shigyo
  • Process management system
    Publication number: 20030130806
    Abstract: A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.
    Type: Application
    Filed: January 16, 2003
    Publication date: July 10, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Fumio Mizuno, Seiji Isogai, Kenji Watanabe, Yasuhiro Yoshitake, Terushige Asakawa, Yuichi Ohyama, Hidekuni Sugimoto, Seiji Ishikawa, Masataka Shiba, Jun Nakazato, Makoto Ariga, Tetsuji Yokouchi, Toshimitsu Hamada, Ikuo Suzuki, Masami Ikota, Mari Nozoe, Isao Miyazaki, Yoshiharu Shigyo
  • Process control system
    Patent number: 6542830
    Abstract: A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.
    Type: Grant
    Filed: September 10, 1998
    Date of Patent: April 1, 2003
    Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.
    Inventors: Fumio Mizuno, Seiji Isogai, Kenji Watanabe, Yasuhiro Yoshitake, Terushige Asakawa, Yuichi Ohyama, Hidekuni Sugimoto, Seiji Ishikawa, Masataka Shiba, Jun Nakazato, Makoto Ariga, Tetsuji Yokouchi, Toshimitsu Hamada, Ikuo Suzuki, Masami Ikota, Mari Nozoe, Isao Miyazaki, Yoshiharu Shigyo
  • Projection aligner method utilizing monitoring of light quantity
    Patent number: 4780606
    Abstract: A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.
    Type: Grant
    Filed: September 23, 1987
    Date of Patent: October 25, 1988
    Assignees: Hitachi, Ltd, Hitachi Ome Electronic Co., Inc.
    Inventors: Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa
  • Projection aligner with a sensor for monitoring light quantity
    Patent number: 4701608
    Abstract: A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.
    Type: Grant
    Filed: January 29, 1986
    Date of Patent: October 20, 1987
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa
  • Projection aligner
    Patent number: 4598197
    Abstract: A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.
    Type: Grant
    Filed: August 2, 1983
    Date of Patent: July 1, 1986
    Assignees: Hitachi, Ltd., Hitachi Ome Electronic Co., Ltd.
    Inventors: Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa