Patents by Inventor Teruyoshi Yao

Teruyoshi Yao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Manufacture of semiconductor device using a-c anti-reflection coating
    Patent number: 5750316
    Abstract: A method of manufacturing a semiconductor device including the steps of: forming a transparent oxide film on a light reflecting surface; forming an anti-reflective a-c film on the surface of the transparent film; and coating a photoresist film on the surface of the anti-reflective film and patterning the photoresist film, wherein the thicknesses of the anti-reflective film and the transparent film are selected so as to set a standing wave intensity I.sub.sw =I.delta./I.sub.ave to 0.2 or smaller, where I.sub.ave is an average value of light intensity in the photoresist film, and I.delta. is an amplitude of a light intensity change. A fine pattern can be formed on a highly reflective substrate with a small size variation and at a high precision.
    Type: Grant
    Filed: March 15, 1995
    Date of Patent: May 12, 1998
    Assignee: Fujitsu Limited
    Inventors: Eiichi Kawamura, Teruyoshi Yao, Nobuhisa Naori, Koichi Hashimoto, Masaharu Kobayashi, Tadasi Oshima