Patents by Inventor Testu Aoyama

Testu Aoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Separation-material composition for photo-resist and manufacturing method of semiconductor device
    Publication number: 20080076260
    Abstract: One example of a separation-material composition for a photo-resist according to the present invention comprises 5.0 weight % of sulfamic acid, 34.7 weight % of H2O, 0.3 weight % of ammonium 1-hydrogen difluoride, 30 weight % of N,N-dimethylacetamide and 30 weight % of diethylene glycol mono-n-buthyl ether. Another example of a separation-material composition for a photo-resist according to the present invention comprises 1-hydroxyethylidene-1, 3.0 weight % of 1-diphosphonic acid, 0.12 weight % of ammonium fluoride, 48.38 weight % of H2O and 48.5 weight % of diethylene glycol mono-n-buthyl ether. The separation-material composition for the photo-resist is mainly used for a medicinal liquid washing liquid/scientific liquid in order to remove the photo-resist residuals and the by-product polymer after an ashing process of a photo-resist mask.
    Type: Application
    Filed: November 6, 2007
    Publication date: March 27, 2008
    Applicants: Sony Corporation, EKC Technology K.K.
    Inventors: Masafumi Muramatsu, Hayato Iwamoto, Kazumi Asada, Tomoko Suzuki, Toshitaka Hiraga, Testu Aoyama