Patents by Inventor Tetsu Oi
Tetsu Oi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 4390460Abstract: Disclosed is a lithium oxide based amorphous material having a composition included in a region defined by lines connecting points A, B, C and D in the composition diagram of the ternary system of Li.sub.2 O.SiO.sub.2.P.sub.2 O.sub.5 shown in FIG. 1 of the accompanying drawings. This amorphous material can be formed by performing sputtering by using as a target a mixture of a lithium silicate/lithium phosphate composition and LiO.sub.2. This amorphous material is excellent in the ionic conductivity.Type: GrantFiled: September 28, 1981Date of Patent: June 28, 1983Assignee: Hitachi, Ltd.Inventors: Katsuki Miyauchi, Tetsu Oi, Tsuneo Suganuma
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Patent number: 4367267Abstract: Disclosed is an amorphous substance represented by the following general formula:aLi.sub.x Na.sub.1-x F.bAlF.sub.3wherein a is a mol ratio which is a value in the range of from 0.45 to 0.7, b is a mol ratio which is a value in the range of from 0.3 to 0.55, and x is a value in the range of from 0.1 to 1.0 except the case where a is 0.5 and b is 0.5, or x is a value in the range of from 0 to 1.0 when a is 0.5 and b is 0.5.This amorphous substance is used as a solid electrolyte of an electrochromic display device or the like.Type: GrantFiled: April 24, 1981Date of Patent: January 4, 1983Assignee: Hitachi, Ltd.Inventor: Tetsu Oi
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Patent number: 4365155Abstract: A scintillator formed of a ZnWO.sub.4 single crystal having an absorption coefficient less than or equal to 1.8 cm.sup.-1 for the light having a wavelength of 520 nm is disclosed which has a luminescence wavelength of 480 nm and therefore can be combined with a photodiode, and which is high in radiation detection sensitivity, short in decay time, and specifically suitable for use in computed tomography.Type: GrantFiled: March 20, 1980Date of Patent: December 21, 1982Assignee: Hitachi, Ltd.Inventors: Tetsu Oi, Kazumasa Takagi, Tokuumi Fukazawa
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Patent number: 4323418Abstract: A susceptor made of a conductive material which has a melting point higher than that of a starting material and which does not react with the melt of the starting material is heated to a temperature not lower than the melting point of the starting material by the radio frequency induction heating. The starting material is fed onto the upper surface of the heated susceptor at a predetermined rate so as to melt the starting material, the resultant melt of the starting material is caused to flow from the upper surface of the susceptor via the susceptor to the lower surface thereof, the melt is crystallized in touch with a seed crystal arranged on the lower surface in advance, and the seed crystal is transferred downwards, whereby a single crystal is grown.Type: GrantFiled: November 9, 1979Date of Patent: April 6, 1982Assignee: Hitachi, Ltd.Inventors: Toshio Kobayashi, Tetsu Oi
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Patent number: 4305777Abstract: A method of producing ferrite single crystals which comprises steps of melting a ferrite starting material in oxygen atmosphere containing nitrogen, argon or the like of a partial pressure of at least 0.1 atm. and solidifying the melt. According to this method, the popping out of the gas contained in the melt is prevented and the ferrite single crystals of high qualities can be produced easily.Type: GrantFiled: March 28, 1980Date of Patent: December 15, 1981Assignee: Hitachi, Ltd.Inventors: Toshio Kobayashi, Tetsu Oi
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Patent number: 4279772Abstract: A crystal for a scintillator is a single crystal of Bi.sub.4 Ge.sub.3 O.sub.12 containing up to 0.5% by weight of Bi.sub.4 Si.sub.3 O.sub.12 and/or up to 50 ppm of Gd. The light output of this crystal as a scintillator can be increased by about 20% as compared with the light output of the conventional crystal of additive-free Bi.sub.4 Ge.sub.3 O.sub.12.Type: GrantFiled: January 15, 1980Date of Patent: July 21, 1981Assignee: Hitachi Chemical Company, Ltd.Inventors: Kazumasa Takagi, Tokuumi Fukazawa, Tetsu Oi
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Patent number: 4186481Abstract: A method for fabricating a rear core for the magnetic circuit of a Hall effect magnetic head is disclosed. The bottom size of the rear core protrusion is made substantially equal to the size of a Hall element. A gap is provided between the Hall element and the rear core. In order to minimize the gap, the rear core block is provided with supports for fabrication, whereby the gap between the Hall element and the bottom protrusion of the rear core is positioned accurately. The supports are removed at the end of fabrication. The bottom protrusion of the rear core prevented pressure from being applied to the Hall element, thus improving the sensitivity of the Hall effect magnetic head without increasing noises.Type: GrantFiled: September 5, 1978Date of Patent: February 5, 1980Assignee: Hitachi, Ltd.Inventors: Takaharu Noguchi, Takao Ketori, Kohji Tamura, Tetsu Oi, Yutaka Miyoshi
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Patent number: 4177372Abstract: A method for laser zone melting and apparatuses therefor wherein, in a zone melting method for a thin film due to the irradiation of laser beam, the laser beam is vibrated at the frequency of more than 1 Hz in the direction substantially perpendicular to the moving direction of a melting zone and the fluctuation of laser beam output is controlled to less than 1%. The zone-melted thin films manufactured by this method have good electrical properties resulting from less crystal imperfection, less non-stoichiometric excess atoms of the constituents, and less thickness corrugation of the film due to the suppression of temperature fluctuations and its spacial inhomogeneity at the time of zone melting.Type: GrantFiled: May 24, 1977Date of Patent: December 4, 1979Assignee: Hitachi, Ltd.Inventors: Nobuo Kotera, Tetsu Oi, Takashi Nishida
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Patent number: 4177298Abstract: A method for producing an InSb thin film element comprising the steps of forming an InSb polycrystalline thin film on a substrate, melting and recrystallizing the InSb polycrystalline thin film at a temperature above the melting point of InSb, and disposing a diffusion source which contains at least one element selected from the group consisting of Cu, Au, Ag, Zn, Na, K, Cd, B, Li, Ca, Fe, Mg, Ba, Al and Pb and then heating the InSb thin film so as to dope it with the desired element or elements in a range in which the total quantity does not exceed a concentration of 1.times.10.sup.18 cm.sup.-3. The InSb thin film element produced by this method has a very little current noise and a high signal-to-noise ratio. Further more, simultaneous doping of the said predetermined element or said elements and sb is more effective to reduce the current noise.Type: GrantFiled: March 20, 1978Date of Patent: December 4, 1979Assignee: Hitachi, Ltd.Inventors: Junji Shigeta, Tetsu Oi, Nobuo Kotera, Muneyasu Nakashima, Nobuo Miyamoto
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Patent number: 4080478Abstract: A method for producing a unique InSb thin film element which comprises the steps of forming a thin film of InSb polycrystal on a substrate of insulating material, forming an oxide film on the InSb thin film, zone-melting the InSb thin film by heating the thin film covered with the oxide film to a temperature above the melting point of InSb in a controlled gaseous heat-treating atmosphere comprising an inert gas containing from 1 ppm to 3 .times. 10.sup.4 ppm of oxygen, which is replaceable by an addition of a tenfold amount of aqueous vapor to the extent of 10.sup.2 ppm of oxygen, and cooling the resultant element. An InSb thin film element produced in this way is suitable as a material for a magnetosensitive element of good performance, especially a low noise level or a high S/N ratio.Type: GrantFiled: August 11, 1975Date of Patent: March 21, 1978Assignee: Hitachi, Ltd.Inventors: Naoki Yamamoto, Tetsu Oi, Kikuji Sato