Patents by Inventor Tetsuaki Matsubara

Tetsuaki Matsubara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8578852
    Abstract: Disclosed is a block copolymer composition for flexographic printing plates, which is capable of providing a flexographic printing plate that has much more excellent wear resistance than conventional flexographic printing plates, while maintaining sufficient rubber elasticity. The block copolymer composition for flexographic printing plates comprises a block copolymer A and a block copolymer B, each of which is an aromatic vinyl-conjugated diene-aromatic vinyl block copolymer having a specific structure, wherein a content of the aromatic vinyl monomer unit in the block copolymer A is 41% or more.
    Type: Grant
    Filed: February 24, 2010
    Date of Patent: November 12, 2013
    Assignee: Zeon Corporation
    Inventors: Tetsuaki Matsubara, Ryouji Oda
  • Publication number: 20110308412
    Abstract: Disclosed is a block copolymer composition for flexographic printing plates, which is capable of providing a flexographic printing plate that has much more excellent wear resistance than conventional flexographic printing plates, while maintaining sufficient rubber elasticity. The block copolymer composition for flexographic printing plates comprises a block copolymer A and a block copolymer B, each of which is an aromatic vinyl-conjugated diene-aromatic vinyl block copolymer having a specific structure, wherein a content of the aromatic vinyl monomer unit in the block copolymer A is 41% or more.
    Type: Application
    Filed: February 24, 2010
    Publication date: December 22, 2011
    Inventors: Tetsuaki Matsubara, Ryouji Oda
  • Patent number: 6534593
    Abstract: The present invention provides a composition which comprises a radial poly(aromatic vinyl)/polyisoprene block copolymer as a major component and which can be used as a more excellent pressure-sensitive ingredient. This composition is obtained by reacting a diblock polymer with a coupling agent having a functionality of 4 or higher in the presence of a coupling accelerator, and it contains (a) 1 to 34% by weight of a diblock polymer, (b) 34 to 99% by weight of a four-branch polymer, and (c) 0 to 50% by weight of a two-branch polymer and/or a three-branch polymer. The poly(aromatic vinyl)/polyisoprene block copolymer contained in the composition has a weight-average molecular weight (Mw) of 260,000 to 500,000, and the poly(aromatic vinyl)/polyisoprene block copolymer has a poly(aromatic vinyl) block content of 5 to 24% by weight.
    Type: Grant
    Filed: February 1, 2001
    Date of Patent: March 18, 2003
    Assignee: Zeon Corporation
    Inventors: Shigeru Komatsuzaki, Tetsuaki Matsubara, Jun Ishihara
  • Patent number: 6291583
    Abstract: An aromatic vinyl compound-isoprene block copolymer composition comprising (i) 5-50 wt. % a branched copolymer of the formula: (A-B)nX wherein A is a polymer block of an aromatic vinyl monomer, B is a polymer block of isoprene, and X is a residue of a polyfunctional coupling agent, and (ii) 50-95 wt. % of a diblock copolymer of the formula: A-B wherein A and B are as defined above. This copolymer composition is produced by allowing an aromatic vinyl monomer to contact with an organic lithium initiator to prepare a polymer block A; incorporating isoprene thereto to prepare a diblock copolymer A-B; and then, adding a polyfunctional coupling agent to convert a part of the diblock copolymer A-B to the branched copolymer (A-B)nX. This block copolymer composition is useful for an adhesive or pressure sensitive adhesive composition.
    Type: Grant
    Filed: April 30, 1999
    Date of Patent: September 18, 2001
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Shigeru Komatsuzaki, Hidemi Tsubaki, Tetsuaki Matsubara