Patents by Inventor Tetsuhiko MIYADERA

Tetsuhiko MIYADERA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for laser deposition of organic material film or organic-inorganic composite material film, and laser deposition apparatus
    Patent number: 10329659
    Abstract: A method of laser-depositing at least one type of organic material, characterized in that a duty ratio of a laser that evaporates the organic material is adjusted, which addresses the problem of providing an organic material deposition method and deposition apparatus that solve the issues in the conventional art, such as the organic material vaporizing and contaminating the other raw materials to be deposited, and the film formation rate running out of control, and whereby the film formation rate and the evaporation rate can be stably adjusted and controlled. Additionally, the invention is characterized in that the duty ratio is adjusted based on the evaporation rate of the organic substance or the vapor pressure inside the vacuum chamber used for deposition.
    Type: Grant
    Filed: August 21, 2015
    Date of Patent: June 25, 2019
    Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Tetsuhiko Miyadera, Takeshi Sugita, Takurou Murakami, Masayuki Chikamatsu, Koji Matsubara
  • METHOD FOR LASER DEPOSITION OF ORGANIC MATERIAL FILM OR ORGANIC-INORGANIC COMPOSITE MATERIAL FILM AND LASER DEPOSITION APPARATUS
    Publication number: 20170268094
    Abstract: A method of laser-depositing at least one type of organic material, characterized in that a duty ratio of a laser that evaporates the organic material is adjusted, which addresses the problem of providing an organic material deposition method and deposition apparatus that solve the issues in the conventional art, such as the organic material vaporizing and contaminating the other raw materials to be deposited, and the film formation rate running out of control, and whereby the film formation rate and the evaporation rate can be stably adjusted and controlled. Additionally, the invention is characterized in that the duty ratio is adjusted based on the evaporation rate of the organic substance or the vapor pressure inside the vacuum chamber used for deposition.
    Type: Application
    Filed: August 21, 2015
    Publication date: September 21, 2017
    Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Tetsuhiko MIYADERA, Takeshi SUGITA, Takurou MURAKAMI, Masayuki CHIKAMATSU, Koji MATSUBARA