Patents by Inventor Tetsuhiro Hatogai

Tetsuhiro Hatogai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11763025
    Abstract: An analysis execution part 11 that, in response to a request for an analysis on a predetermined subject utilizing pieces of personal information 35, generates a first analysis result based on a plurality of pieces of personal information 35 associated with an item necessary for performing the analysis, and anonymizes the plurality of pieces of personal information 35 and generates a second analysis result for the request for the analysis based on the anonymized pieces of information, and an analysis result evaluation part 12 that generates information on a difference between the generated first analysis result and the generated second analysis result are provided.
    Type: Grant
    Filed: June 18, 2019
    Date of Patent: September 19, 2023
    Assignee: HITACHI, LTD.
    Inventors: Takayuki Suzuki, Masayuki Yoshino, Tetsuhiro Hatogai, Masaaki Tanizaki
  • Publication number: 20220138339
    Abstract: A computer system including a plurality of systems, in which the plurality of systems include a plurality of provision systems that provide data and a platform system that controls access to the data, the platform system receives, from a user, an acquisition request including a data acquisition condition, a quality condition, and a provider condition related to providers of data provided by the provision systems, and in a case where data satisfying the data acquisition condition satisfies the quality condition and a provider of the data satisfying the data acquisition condition satisfies the provider condition, the platform system performs control such that the user is allowed to access the data satisfying the data acquisition condition.
    Type: Application
    Filed: August 22, 2019
    Publication date: May 5, 2022
    Applicant: HITACHI, LTD.
    Inventors: Shunji KAWAMURA, Masaaki TANIZAKI, Tetsuhiro HATOGAI
  • Publication number: 20210279368
    Abstract: An analysis execution part 11 that, in response to a request for an analysis on a predetermined subject utilizing pieces of personal information 35, generates a first analysis result based on a plurality of pieces of personal information associated with an item necessary for performing the analysis, and anonymizes the plurality of pieces of personal information 35 and generates a second analysis result for the request for the analysis based on the anonymized pieces of information, and an analysis result evaluation part 12 that generates information on a difference between the generated first analysis result and the generated second analysis result are provided.
    Type: Application
    Filed: June 18, 2019
    Publication date: September 9, 2021
    Inventors: Takayuki SUZUKI, Masayuki YOSHINO, Tetsuhiro HATOGAI, Masaaki TANIZAKI
  • Publication number: 20210192025
    Abstract: A service support system comprises a data user request obtaining part 41 that obtains a predetermined data provision request from a predetermined terminal, a personal information obtaining part 42 that obtains personal information on a requester of the data provision request, a providable data obtaining part 43 that obtains predetermined providable data from a predetermined terminal, a processed data generating part 44 that generates processed data which is data of a response to the data provision request by processing the obtained providable data based on the obtained personal information on the requester, and a communication restricting part 49 that restricts transmission of the obtained data provision request, the obtained personal information on the requester, and the generated processed data to outside of the processed data generating part 44.
    Type: Application
    Filed: June 18, 2019
    Publication date: June 24, 2021
    Applicant: HITACHI, LTD.
    Inventors: Takayuki SUZUKI, Masayuki YOSHINO, Tetsuhiro HATOGAI, Masaaki TANIZAKI
  • Publication number: 20130224322
    Abstract: A method for removing foreign matters attaching on a surface of a fine pattern of a mold, having the fine pattern being convexo-concave, at least on one surface thereof, thereby cleaning the fine pattern surface of the mold, and an imprinting device applying that method therein, without removing, comprises the following steps of: applying a photo-curable resin on a surface of a body to be transcribed, onto which the mold is suppressed, and thereby forming a photo-curable resin layer; suppressing the mold on the photo-curable resin, which is applied on the surface of the body to be transcribed; separating the photo-curable resin cured from the mold, after curing the photo-curable resin, and whereby taking the foreign matters attaching on the surface of the fine pattern into the photo-curable resin cured to remove them, wherein the photo-curable resin to be formed on the surface of the body to be transcribed is formed with such thickness that it can remove the foreign matters attaching on the fine pattern, and
    Type: Application
    Filed: November 11, 2011
    Publication date: August 29, 2013
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Noritake Shizawa, Naoaki Yamashita, Masashi Aoki, Tetsuhiro Hatogai
  • Publication number: 20130082029
    Abstract: The object of the present invention is to provide a stamper or an imprint device which can reduce a variation of a base film thickness, a product processed and having a precise fine pattern, and a device for manufacturing a product processed or a method for manufacturing a product processed which can form a precise fine pattern. According to the present invention, in a stamper, an imprint device performing an imprint using the stamper, a device for manufacturing a product processed by the imprint device, a method for manufacturing a product processed by the imprint, and a product processed and manufactured, the stamper has a dummy pattern which is unnecessary for fulfilling a function of the product processed which is formed of a substrate for the product.
    Type: Application
    Filed: August 2, 2012
    Publication date: April 4, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Tetsuhiro HATOGAI, Kyoichi MORI, Makoto MARUYAMA, Akihiro MIYAUCHI, Masahiko OGINO
  • Patent number: 8096802
    Abstract: A nanoimprint stamper can simultaneously conform to two types of anomaly in the shape of a transfer substrate, for example warpage and surface protrusions (including foreign objects) that differ greatly in the wavelength of variation. The nanoimprint stamper is capable of performing transfer with a smaller number of defects and in a uniform way. The nanoimprint stamper includes a light-transmitting rigid substrate, a light-transmitting resilient plate, a light-trarsmitting and flexible rigid stamper base, a light-transmitting stamper buffer layer, and a light-transmitting patterned stamp layer. The stamper buffer layer has a lower Young's modulus than the patterned stamp layer.
    Type: Grant
    Filed: August 3, 2009
    Date of Patent: January 17, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kyoichi Mori, Noritake Shizawa, Susumu Komoriya, Akihiro Miyauchi, Takashi Ando, Tetsuhiro Hatogai
  • Patent number: 8016585
    Abstract: A resin stamper is provided that is intended for use in an optical transfer-based nanostructure transfer apparatus and which is capable of automatic transport and alignment. The resin stamper includes a support member made of a light transmitting material and having mechanical strength, an intermediate layer also made of a light transmitting material, and a patterned resin layer which is also made of a light transmitting material. The support member is larger in size than the intermediate layer and the patterned resin layer. The intermediate layer is more flexible than the patterned resin layer. Also, the patterned resin layer has a pattern of high and low areas formed in a surface thereof that is the obverse of the pattern of high and low areas in a mold.
    Type: Grant
    Filed: November 13, 2008
    Date of Patent: September 13, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Susumu Komoriya, Kyoichi Mori, Noritake Shizawa, Takanori Yamasaki, Tetsuhiro Hatogai, Koji Tsushima
  • Publication number: 20100034911
    Abstract: A nanoimprint stamper with a novel structure is provided that can simultaneously conform to two types of anomaly in the shape of a transfer substrate, i.e., a warpage and surface protrusions (including foreign objects) that differ greatly in the wavelength of variation, and which is capable of performing transfer with a smaller number of defects and in a uniform way. The nanoimprint stamper comprises a light-transmitting rigid substrate, a light-transmitting resilient plate, a light-transmitting and flexible rigid stamper base, a light-transmitting stamper buffer layer, and a light-transmitting patterned stamp layer, the stamper buffer layer having a lower Young's modulus than the patterned stamp layer.
    Type: Application
    Filed: August 3, 2009
    Publication date: February 11, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kyoichi MORI, Noritake SHIZAWA, Susumu KOMORIYA, Akihiro MIYAUCHI, Takashi ANDO, Tetsuhiro HATOGAI
  • Publication number: 20090123590
    Abstract: A resin stamper is provided that is intended for use in an optical transfer-based nanostructure transfer apparatus and which is capable of automatic transport and alignment. The resin stamper comprises a support member made of a light transmitting material and having mechanical strength, an intermediate layer also made of a light transmitting material, and a patterned resin layer which is also made of a light transmitting material, the support member being larger in size than the intermediate layer and the patterned resin layer, the intermediate layer being more flexible than the patterned resin layer, and the patterned resin layer having a pattern of high and low areas formed in a surface thereof that is the obverse of the pattern of high and low areas in a mold.
    Type: Application
    Filed: November 13, 2008
    Publication date: May 14, 2009
    Inventors: Susumu Komoriya, Kyoichi Mori, Noritake Shizawa, Takanori Yamasaki, Tetsuhiro Hatogai, Koji Tsushima