Abstract: A pressure-sensitive adhesive composition curable with actinic energy rays which comprises a copolymer comprising 0.1 to 30 wt. %, preferably 0.1 to 3 wt. %, structural units derived from an imide (meth)acrylate represented by general formula (1) and 70 to 99.9 wt. %, preferably 97 to 99.9 wt. %, structural units derived from an ethylenic monomer such as an alkyl (meth)acrylate having a C4-12 alkyl group. In formula (1), R1 and R2 each independently is hydrogen or C1-4 alkyl, one of R1 and R2 is hydrogen and the other is C1-4 alkyl, or R1 and R2 are bonded to each other to form a carbon ring; R3 is C1-6 alkylene; R4 is hydrogen or methyl; and n is an integer of 1 to 6. The pressure-sensitive adhesive composition is usable as one-pack type, has excellent storage stability, and does not necessitate any step such as heating or aging when used.

Abstract: New imido(meth) acrylates of general formula (1), wherein R1, R2 and R3 may be the same or different and each represents H or CH3; R4 to R7 may be the same or different and each represents H or CmH2m+1 (in which m is 1 to 6); and n represents 1 to 4, and radiation-curable compositions prepared from them, easily cured by the irradiation with radiations, particularly ultraviolet rays, to form cured compositions excellent in weather resistance, abrasion resistance and adhesion to a base, and free from the problem of odor.

Abstract: The present invention provides a curable composition for back-protecting material used in making shadow masks which gives a cured film excellent in all of etching resistance, alkali solubility or peelability, and pattern formability even when a second etching is carried out at high temperatures. That is, the present invention provides a curable composition for back-protecting material used at a second etching step in making shadow masks which comprises the following components (a), (b) and (c) and which gives a cured film having alkali solubility or alkali peelability:(a) a compound having one carboxyl group and one (meth)acryloyl group,(b) a tri(meth)acrylate of an alkylene oxide adduct of isocyanuric acid, and(c) (c1) a (meth)acrylate compound having two or more (meth)acryloyl groups, (c2) a chain transfer agent, or a combination of (c1) and (c2).

Abstract: A curable composition comprising the following components (a), (b), (c) and (d) and/or (e):(a) a compound having one carboxyl group and one (meth)acryloyl group in the molecule,(b) a compound having two or more (meth)acryloyl groups in the molecule,(c) a levelling agent, and(d) a chain transfer agent and/or(e) a tertiary amine type photoinitiator; and a process for producing a shadow mask, comprising two etching steps, wherein the above curable composition is used as a secondary etching resist material.

Abstract: An optical recording medium comprising at least one recording layer on a substrate and a protective layer overlying the recording layer, the protective layer comprising a UV cured resin composition containing a urethane acrylate, N-vinylpyrolidone, a trifunctional or higher functional acrylate, and a photoinitiator.