Patents by Inventor Tetsuji Ueda

Tetsuji Ueda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10668619
    Abstract: A machine learning device of a controller observes, as state variables expressing a current state of an environment, teaching position compensation amount data indicating a compensation amount of a teaching position in control of a robot according to the teaching position and data indicating a disturbance value of each of the motors of the robot in the control of the robot, and acquires determination data indicating an appropriateness determination result of the disturbance value of each of the motors of the robot in the control of the robot. Then, the machine learning device learns the compensation amount of the teaching position of the robot in association with the motor disturbance value data by using the observed state variables and the determination data.
    Type: Grant
    Filed: June 1, 2018
    Date of Patent: June 2, 2020
    Assignee: Fanuc Corporation
    Inventor: Tetsuji Ueda
  • Patent number: 10576628
    Abstract: A machine learning device of a controller observes data on a movement speed of each motor of a robot and an adjustment amount of the movement speed, a target speed of a tip end of the robot, and a movement path proximate to the tip end of the robot, as state variables expressing a current state of an environment, and acquires determination data indicating an appropriateness determination result of the movement speed of the tip end of the robot. Then, the machine learning device learns the target speed data, the movement speed data, and the movement path data in association with the adjustment amount of the movement speed of each of the motors of the robot by using the observed state variables and the acquired determination data.
    Type: Grant
    Filed: June 1, 2018
    Date of Patent: March 3, 2020
    Assignee: Fanuc Corporation
    Inventor: Tetsuji Ueda
  • Patent number: 10493627
    Abstract: A workpiece picking system is provided, including: a conveyor that transfers multiple workpieces in one transfer direction; a position detection unit that detects transfer positions of the workpieces transferred by the conveyor; a distributing robot that sorts the workpieces transferred by the conveyor in a single row into two rows by a predetermined rule following the movement of the conveyor by performing line tracking based on the detected transfer positions; and a pair of picking robots that pick-up the workpieces, following the movement of the conveyor by performing line tracking based on the transfer positions detected by the position detection unit, and disposing only the workpieces in one of the rows sorted by the distributing robot, in an operating range of the picking robots. The pair of picking robots are arranged in a direction orthogonal to the transfer direction of the conveyor.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: December 3, 2019
    Assignee: Fanuc Corporation
    Inventors: Yoshiaki Katou, Tetsuji Ueda
  • Publication number: 20180354126
    Abstract: A machine learning device of a controller observes data on a movement speed of each motor of a robot and an adjustment amount of the movement speed, a target speed of a tip end of the robot, and a movement path proximate to the tip end of the robot, as state variables expressing a current state of an environment, and acquires determination data indicating an appropriateness determination result of the movement speed of the tip end of the robot. Then, the machine learning device learns the target speed data, the movement speed data, and the movement path data in association with the adjustment amount of the movement speed of each of the motors of the robot by using the observed state variables and the acquired determination data.
    Type: Application
    Filed: June 1, 2018
    Publication date: December 13, 2018
    Applicant: FANUC CORPORATION
    Inventor: Tetsuji Ueda
  • Publication number: 20180354125
    Abstract: A machine learning device of a controller observes, as state variables expressing a current state of an environment, teaching position compensation amount data indicating a compensation amount of a teaching position in control of a robot according to the teaching position and data indicating a disturbance value of each of the motors of the robot in the control of the robot, and acquires determination data indicating an appropriateness determination result of the disturbance value of each of the motors of the robot in the control of the robot. Then, the machine learning device learns the compensation amount of the teaching position of the robot in association with the motor disturbance value data by using the observed state variables and the determination data.
    Type: Application
    Filed: June 1, 2018
    Publication date: December 13, 2018
    Applicant: FANUC CORPORATION
    Inventor: Tetsuji Ueda
  • Patent number: 10150200
    Abstract: The occurrence of grinding unevenness is prevented even when the movement speed of a robot is changed. Provided is a grinding robot system including: a motor-driven grinder that performs grinding; a robot that grinds a grinding target by means of the grinder in a state in which one of the grinder or the grinding target is attached to a distal end thereof and is moved, and the other is set at a fixed position; and a control unit that controls the robot and the grinder, wherein the control unit calculates a rotational-speed command value for the grinder that changes according to the movement speed of the distal end of the robot and controls the rotational speed of the grinder on the basis of the calculated rotational-speed command value.
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: December 11, 2018
    Assignee: FANUC CORPORATION
    Inventor: Tetsuji Ueda
  • Patent number: 10114280
    Abstract: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (?) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.
    Type: Grant
    Filed: February 11, 2016
    Date of Patent: October 30, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
  • Patent number: 10040224
    Abstract: An optical shaping method according to the present invention is an optical shaping method for shaping a three-dimensional structure by repeating a process for forming a cured resin layer 53 by irradiating an optically curing resin liquid 51 with light so that cured resin layers 53 are laminated. The process for forming the cured resin layer 53 includes, while applying a sheet light Ls to the optically curing resin liquid 51, applying a first light beam L1 intersecting the sheet light Ls to this optically curing resin liquid, and thereby forming the cured resin layer 53 in an area where the sheet light Ls intersects the first light beam L1. The irradiation place of the sheet light Ls is moved and the process for forming the cured resin layer 53 is repeated.
    Type: Grant
    Filed: December 9, 2014
    Date of Patent: August 7, 2018
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Ken Saruhashi, Isamu Furukawa, Kunihiro Iwamoto, Konosuke Arata, Mitsutoshi Asano, Kentaro Tsuboi, Tetsuji Ueda, Junichi Ikeda
  • Publication number: 20180056514
    Abstract: A workpiece picking system is provided, including: a conveyor that transfers multiple workpieces in one transfer direction; a position detection unit that detects transfer positions of the workpieces transferred by the conveyor; a distributing robot that sorts the workpieces transferred by the conveyor in a single row into two rows by a predetermined rule following the movement of the conveyor by performing line tracking based on the detected transfer positions; and a pair of picking robots that pick-up the workpieces, following the movement of the conveyor by performing line tracking based on the transfer positions detected by the position detection unit, and disposing only the workpieces in one of the rows sorted by the distributing robot, in an operating range of the picking robots. The pair of picking robots are arranged in a direction orthogonal to the transfer direction of the conveyor.
    Type: Application
    Filed: August 25, 2017
    Publication date: March 1, 2018
    Applicant: Fanuc Corporation
    Inventors: Yoshiaki KATOU, Tetsuji Ueda
  • Publication number: 20170341200
    Abstract: The occurrence of grinding unevenness is prevented even when the movement speed of a robot is changed. Provided is a grinding robot system including: a motor-driven grinder that performs grinding; a robot that grinds a grinding target by means of the grinder in a state in which one of the grinder or the grinding target is attached to a distal end thereof and is moved, and the other is set at a fixed position; and a control unit that controls the robot and the grinder, wherein the control unit calculates a rotational-speed command value for the grinder that changes according to the movement speed of the distal end of the robot and controls the rotational speed of the grinder on the basis of the calculated rotational-speed command value.
    Type: Application
    Filed: April 10, 2017
    Publication date: November 30, 2017
    Applicant: FANUC CORPORATION
    Inventor: Tetsuji UEDA
  • Patent number: 9746773
    Abstract: Methods for selecting titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours as suitable material for the EUV lithography member.
    Type: Grant
    Filed: June 18, 2013
    Date of Patent: August 29, 2017
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
  • Publication number: 20170038672
    Abstract: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (?) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.
    Type: Application
    Filed: February 11, 2016
    Publication date: February 9, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
  • Patent number: 9296636
    Abstract: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (?) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.
    Type: Grant
    Filed: April 9, 2012
    Date of Patent: March 29, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
  • Patent number: 9278881
    Abstract: A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography.
    Type: Grant
    Filed: January 2, 2014
    Date of Patent: March 8, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
  • Publication number: 20160008980
    Abstract: An inspection system includes a force sensor for detecting force acting between an inspection gauge and an object formed with a machined portion. The inspection system determines the quality of the machined portion, based on a positional relationship between the object and the inspection gauge when the inspection gauge and the machined portion are fitted to each other. The fitting operation between the inspection gauge and the machined portion is carried out by a robot which is operated in accordance with force control using a detection value of the force sensor.
    Type: Application
    Filed: July 1, 2015
    Publication date: January 14, 2016
    Applicant: FANUC CORPORATION
    Inventors: Tetsuji Ueda, Masaru Oda
  • Publication number: 20150202805
    Abstract: An optical shaping method according to the present invention is an optical shaping method for shaping a three-dimensional structure by repeating a process for forming a cured resin layer 53 by irradiating an optically curing resin liquid 51 with light so that cured resin layers 53 are laminated. The process for forming the cured resin layer 53 includes, while applying a sheet light Ls to the optically curing resin liquid 51, applying a first light beam L1 intersecting the sheet light Ls to this optically curing resin liquid, and thereby forming the cured resin layer 53 in an area where the sheet light Ls intersects the first light beam L1. The irradiation place of the sheet light Ls is moved and the process for forming the cured resin layer 53 is repeated.
    Type: Application
    Filed: December 9, 2014
    Publication date: July 23, 2015
    Inventors: Ken SARUHASHI, Isamu FURUKAWA, Kunihiro IWAMOTO, Konosuke ARATA, Mitsutoshi ASANO, Kentaro TSUBOI, Tetsuji UEDA, Junichi IKEDA
  • Publication number: 20140206524
    Abstract: A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography.
    Type: Application
    Filed: January 2, 2014
    Publication date: July 24, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
  • Patent number: 8635886
    Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
    Type: Grant
    Filed: July 26, 2012
    Date of Patent: January 28, 2014
    Assignees: Shin-Etsu Quartz Products Co., Ltd., Opto-Electronics Laboratory, Inc.
    Inventors: Tetsuji Ueda, Michinari Ohuchi, Hiroyuki Nishimura, Akira Fujinoki, Masahiro Nakatsuka, Hidetsugu Yoshida
  • Publication number: 20130283858
    Abstract: Methods for selecting titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours as suitable material for the EUV lithography member.
    Type: Application
    Filed: June 18, 2013
    Publication date: October 31, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
  • Publication number: 20120291488
    Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
    Type: Application
    Filed: July 26, 2012
    Publication date: November 22, 2012
    Applicants: OPTO-ELECTRONICS LABORATORY, INC., SHIN-ETSU QUARTZ PRODUCTS CO., LTD.
    Inventors: Tetsuji Ueda, Michinari Ohuchi, Hiroyuki Nishimura, Akira Fujinoki, Masahiro Nakatsuka, Hidetsugu Yoshida