Patents by Inventor Tetsuji Ueda
Tetsuji Ueda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10668619Abstract: A machine learning device of a controller observes, as state variables expressing a current state of an environment, teaching position compensation amount data indicating a compensation amount of a teaching position in control of a robot according to the teaching position and data indicating a disturbance value of each of the motors of the robot in the control of the robot, and acquires determination data indicating an appropriateness determination result of the disturbance value of each of the motors of the robot in the control of the robot. Then, the machine learning device learns the compensation amount of the teaching position of the robot in association with the motor disturbance value data by using the observed state variables and the determination data.Type: GrantFiled: June 1, 2018Date of Patent: June 2, 2020Assignee: Fanuc CorporationInventor: Tetsuji Ueda
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Patent number: 10576628Abstract: A machine learning device of a controller observes data on a movement speed of each motor of a robot and an adjustment amount of the movement speed, a target speed of a tip end of the robot, and a movement path proximate to the tip end of the robot, as state variables expressing a current state of an environment, and acquires determination data indicating an appropriateness determination result of the movement speed of the tip end of the robot. Then, the machine learning device learns the target speed data, the movement speed data, and the movement path data in association with the adjustment amount of the movement speed of each of the motors of the robot by using the observed state variables and the acquired determination data.Type: GrantFiled: June 1, 2018Date of Patent: March 3, 2020Assignee: Fanuc CorporationInventor: Tetsuji Ueda
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Patent number: 10493627Abstract: A workpiece picking system is provided, including: a conveyor that transfers multiple workpieces in one transfer direction; a position detection unit that detects transfer positions of the workpieces transferred by the conveyor; a distributing robot that sorts the workpieces transferred by the conveyor in a single row into two rows by a predetermined rule following the movement of the conveyor by performing line tracking based on the detected transfer positions; and a pair of picking robots that pick-up the workpieces, following the movement of the conveyor by performing line tracking based on the transfer positions detected by the position detection unit, and disposing only the workpieces in one of the rows sorted by the distributing robot, in an operating range of the picking robots. The pair of picking robots are arranged in a direction orthogonal to the transfer direction of the conveyor.Type: GrantFiled: August 25, 2017Date of Patent: December 3, 2019Assignee: Fanuc CorporationInventors: Yoshiaki Katou, Tetsuji Ueda
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Publication number: 20180354126Abstract: A machine learning device of a controller observes data on a movement speed of each motor of a robot and an adjustment amount of the movement speed, a target speed of a tip end of the robot, and a movement path proximate to the tip end of the robot, as state variables expressing a current state of an environment, and acquires determination data indicating an appropriateness determination result of the movement speed of the tip end of the robot. Then, the machine learning device learns the target speed data, the movement speed data, and the movement path data in association with the adjustment amount of the movement speed of each of the motors of the robot by using the observed state variables and the acquired determination data.Type: ApplicationFiled: June 1, 2018Publication date: December 13, 2018Applicant: FANUC CORPORATIONInventor: Tetsuji Ueda
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Publication number: 20180354125Abstract: A machine learning device of a controller observes, as state variables expressing a current state of an environment, teaching position compensation amount data indicating a compensation amount of a teaching position in control of a robot according to the teaching position and data indicating a disturbance value of each of the motors of the robot in the control of the robot, and acquires determination data indicating an appropriateness determination result of the disturbance value of each of the motors of the robot in the control of the robot. Then, the machine learning device learns the compensation amount of the teaching position of the robot in association with the motor disturbance value data by using the observed state variables and the determination data.Type: ApplicationFiled: June 1, 2018Publication date: December 13, 2018Applicant: FANUC CORPORATIONInventor: Tetsuji Ueda
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Patent number: 10150200Abstract: The occurrence of grinding unevenness is prevented even when the movement speed of a robot is changed. Provided is a grinding robot system including: a motor-driven grinder that performs grinding; a robot that grinds a grinding target by means of the grinder in a state in which one of the grinder or the grinding target is attached to a distal end thereof and is moved, and the other is set at a fixed position; and a control unit that controls the robot and the grinder, wherein the control unit calculates a rotational-speed command value for the grinder that changes according to the movement speed of the distal end of the robot and controls the rotational speed of the grinder on the basis of the calculated rotational-speed command value.Type: GrantFiled: April 10, 2017Date of Patent: December 11, 2018Assignee: FANUC CORPORATIONInventor: Tetsuji Ueda
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Patent number: 10114280Abstract: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (?) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.Type: GrantFiled: February 11, 2016Date of Patent: October 30, 2018Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
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Patent number: 10040224Abstract: An optical shaping method according to the present invention is an optical shaping method for shaping a three-dimensional structure by repeating a process for forming a cured resin layer 53 by irradiating an optically curing resin liquid 51 with light so that cured resin layers 53 are laminated. The process for forming the cured resin layer 53 includes, while applying a sheet light Ls to the optically curing resin liquid 51, applying a first light beam L1 intersecting the sheet light Ls to this optically curing resin liquid, and thereby forming the cured resin layer 53 in an area where the sheet light Ls intersects the first light beam L1. The irradiation place of the sheet light Ls is moved and the process for forming the cured resin layer 53 is repeated.Type: GrantFiled: December 9, 2014Date of Patent: August 7, 2018Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Ken Saruhashi, Isamu Furukawa, Kunihiro Iwamoto, Konosuke Arata, Mitsutoshi Asano, Kentaro Tsuboi, Tetsuji Ueda, Junichi Ikeda
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Publication number: 20180056514Abstract: A workpiece picking system is provided, including: a conveyor that transfers multiple workpieces in one transfer direction; a position detection unit that detects transfer positions of the workpieces transferred by the conveyor; a distributing robot that sorts the workpieces transferred by the conveyor in a single row into two rows by a predetermined rule following the movement of the conveyor by performing line tracking based on the detected transfer positions; and a pair of picking robots that pick-up the workpieces, following the movement of the conveyor by performing line tracking based on the transfer positions detected by the position detection unit, and disposing only the workpieces in one of the rows sorted by the distributing robot, in an operating range of the picking robots. The pair of picking robots are arranged in a direction orthogonal to the transfer direction of the conveyor.Type: ApplicationFiled: August 25, 2017Publication date: March 1, 2018Applicant: Fanuc CorporationInventors: Yoshiaki KATOU, Tetsuji Ueda
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Publication number: 20170341200Abstract: The occurrence of grinding unevenness is prevented even when the movement speed of a robot is changed. Provided is a grinding robot system including: a motor-driven grinder that performs grinding; a robot that grinds a grinding target by means of the grinder in a state in which one of the grinder or the grinding target is attached to a distal end thereof and is moved, and the other is set at a fixed position; and a control unit that controls the robot and the grinder, wherein the control unit calculates a rotational-speed command value for the grinder that changes according to the movement speed of the distal end of the robot and controls the rotational speed of the grinder on the basis of the calculated rotational-speed command value.Type: ApplicationFiled: April 10, 2017Publication date: November 30, 2017Applicant: FANUC CORPORATIONInventor: Tetsuji UEDA
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Patent number: 9746773Abstract: Methods for selecting titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours as suitable material for the EUV lithography member.Type: GrantFiled: June 18, 2013Date of Patent: August 29, 2017Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
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Publication number: 20170038672Abstract: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (?) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.Type: ApplicationFiled: February 11, 2016Publication date: February 9, 2017Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
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Patent number: 9296636Abstract: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (?) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.Type: GrantFiled: April 9, 2012Date of Patent: March 29, 2016Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
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Patent number: 9278881Abstract: A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography.Type: GrantFiled: January 2, 2014Date of Patent: March 8, 2016Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
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Publication number: 20160008980Abstract: An inspection system includes a force sensor for detecting force acting between an inspection gauge and an object formed with a machined portion. The inspection system determines the quality of the machined portion, based on a positional relationship between the object and the inspection gauge when the inspection gauge and the machined portion are fitted to each other. The fitting operation between the inspection gauge and the machined portion is carried out by a robot which is operated in accordance with force control using a detection value of the force sensor.Type: ApplicationFiled: July 1, 2015Publication date: January 14, 2016Applicant: FANUC CORPORATIONInventors: Tetsuji Ueda, Masaru Oda
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Publication number: 20150202805Abstract: An optical shaping method according to the present invention is an optical shaping method for shaping a three-dimensional structure by repeating a process for forming a cured resin layer 53 by irradiating an optically curing resin liquid 51 with light so that cured resin layers 53 are laminated. The process for forming the cured resin layer 53 includes, while applying a sheet light Ls to the optically curing resin liquid 51, applying a first light beam L1 intersecting the sheet light Ls to this optically curing resin liquid, and thereby forming the cured resin layer 53 in an area where the sheet light Ls intersects the first light beam L1. The irradiation place of the sheet light Ls is moved and the process for forming the cured resin layer 53 is repeated.Type: ApplicationFiled: December 9, 2014Publication date: July 23, 2015Inventors: Ken SARUHASHI, Isamu FURUKAWA, Kunihiro IWAMOTO, Konosuke ARATA, Mitsutoshi ASANO, Kentaro TSUBOI, Tetsuji UEDA, Junichi IKEDA
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Publication number: 20140206524Abstract: A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography.Type: ApplicationFiled: January 2, 2014Publication date: July 24, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
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Patent number: 8635886Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.Type: GrantFiled: July 26, 2012Date of Patent: January 28, 2014Assignees: Shin-Etsu Quartz Products Co., Ltd., Opto-Electronics Laboratory, Inc.Inventors: Tetsuji Ueda, Michinari Ohuchi, Hiroyuki Nishimura, Akira Fujinoki, Masahiro Nakatsuka, Hidetsugu Yoshida
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Publication number: 20130283858Abstract: Methods for selecting titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours as suitable material for the EUV lithography member.Type: ApplicationFiled: June 18, 2013Publication date: October 31, 2013Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Shigeru Maida, Hisatoshi Otsuka, Tetsuji Ueda, Masanobu Ezaki
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Publication number: 20120291488Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.Type: ApplicationFiled: July 26, 2012Publication date: November 22, 2012Applicants: OPTO-ELECTRONICS LABORATORY, INC., SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventors: Tetsuji Ueda, Michinari Ohuchi, Hiroyuki Nishimura, Akira Fujinoki, Masahiro Nakatsuka, Hidetsugu Yoshida