Patents by Inventor Tetsuo Oda

Tetsuo Oda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240355888
    Abstract: The present invention provides: a semiconductor device which has higher resistance to bias at high temperatures and high humidities than ever before, while achieving good connection between a field limiting layer and a field plate; and a power conversion device which uses this semiconductor device. A semiconductor device according to the present invention is characterized by comprising a floating field limiting layer that is provided in a termination region and a field plate that is electrically connected to the field limiting layer, and is also characterized in that: the field plate is formed of a polysilicon; the field plate and the field limiting layer are connected to each other via an Al electrode; and the connection between the field limiting layer and the Al electrode and the connection between the field plate and the Al electrode are established at different contacts.
    Type: Application
    Filed: November 11, 2022
    Publication date: October 24, 2024
    Inventors: Masaki SHIRAISHI, Daisuke KAWASE, Tetsuo ODA, Tomoyasu FURUKAWA, Yutaka KATO, Tsubasa MORITSUKA
  • Publication number: 20240275898
    Abstract: A data file providing method includes a step of, by a scanner, uploading a data file generated by scanning process to a file relay apparatus on the Internet. The data file providing method includes a step of, by the file relay apparatus, storing the uploaded data file in a temporary storage location. The data file providing method includes a step of, by the scanner, displaying information indicating a uniform resource locator (URL) of the temporary storage location. The data file providing method includes a step of, by the file relay apparatus, transmitting the data file stored in the temporary storage location in response to a web access based on the URL.
    Type: Application
    Filed: May 25, 2021
    Publication date: August 15, 2024
    Inventors: Tetsuo ODA, Yasuhito NAGAKOSHI, Asako KINOSHITA
  • Patent number: 11881514
    Abstract: Provided is a highly reliable semiconductor device in which an influence on device characteristics can be reduced while improving a high temperature and high humidity bias resistance of a termination structure (termination region) of a chip by a relatively simple method. The semiconductor device includes an active region disposed on a main surface of a semiconductor substrate, and a termination region disposed on the main surface so as to surround the active region. The termination region includes an interlayer insulating film formed on the main surface of the semiconductor substrate, and an organic protective film formed so as to cover the interlayer insulating film. An insulating film having a thickness of 100 nm or less and containing nitrogen is provided between the interlayer insulating film and the organic protective film.
    Type: Grant
    Filed: November 22, 2021
    Date of Patent: January 23, 2024
    Assignee: HITACHI POWER SEMICONDUCTOR DEVICE, LTD.
    Inventors: Shigeo Tokumitsu, Masaki Shiraishi, Yutaka Kato, Tetsuo Oda
  • Patent number: 11843036
    Abstract: Provided is a highly reliable semiconductor device in which an influence on device characteristics can be reduced while improving a high temperature and high humidity bias resistance of a termination structure (termination region) of a chip by a relatively simple method. The semiconductor device includes an active region disposed on a main surface of a semiconductor substrate, and a termination region disposed on the main surface so as to surround the active region. The termination region includes an interlayer insulating film formed on the main surface of the semiconductor substrate, and an organic protective film formed so as to cover the interlayer insulating film. An insulating film having a thickness of 100 nm or less and containing nitrogen is provided between the interlayer insulating film and the organic protective film.
    Type: Grant
    Filed: November 22, 2021
    Date of Patent: December 12, 2023
    Assignee: HITACHI POWER SEMICONDUCTOR DEVICE, LTD.
    Inventors: Shigeo Tokumitsu, Masaki Shiraishi, Yutaka Kato, Tetsuo Oda
  • Publication number: 20220199786
    Abstract: Provided is a highly reliable semiconductor device in which an influence on device characteristics can be reduced while improving a high temperature and high humidity bias resistance of a termination structure (termination region) of a chip by a relatively simple method. The semiconductor device includes an active region disposed on a main surface of a semiconductor substrate, and a termination region disposed on the main surface so as to surround the active region. The termination region includes an interlayer insulating film formed on the main surface of the semiconductor substrate, and an organic protective film formed so as to cover the interlayer insulating film. An insulating film having a thickness of 100 nm or less and containing nitrogen is provided between the interlayer insulating film and the organic protective film.
    Type: Application
    Filed: November 22, 2021
    Publication date: June 23, 2022
    Applicant: Hitachi Power Semiconductor Device, Ltd.
    Inventors: Shigeo Tokumitsu, Masaki Shiraishi, Yutaka Kato, Tetsuo Oda
  • Patent number: 5238254
    Abstract: A ferrofluid seal apparatus comprises magnetic fluid holding means for storing a magnetic fluid with one of an inner and an outer elements which are relatively rotated. The magnetic fluid holding means has a storage section for storing a part of the magnetic fluid which flows out of said magnetic fluid holding means.
    Type: Grant
    Filed: February 20, 1992
    Date of Patent: August 24, 1993
    Assignee: Koyo Seiko Co., Ltd.
    Inventors: Hirokazu Takii, Tetsuo Oda, Shinji Abe, Kazuya Suzuki, Hirotsugu Kusano
  • Patent number: 5152539
    Abstract: A ferrofluid seal apparatus comprises magnetic fluid holding or positing means for storing or retaining a magnetic fluid in a sealing arrangement wherein inner and outer elements are relatively rotated. The magnetic fluid holding means includes an arrangement for retaining the magnetic fluid which flows out from its original position.
    Type: Grant
    Filed: September 21, 1990
    Date of Patent: October 6, 1992
    Assignee: Koyo Seiko Co., Ltd.
    Inventors: Hirokazu Takii, Tetsuo Oda, Shinji Abe, Kazuya Suzuki, Hirotsugu Kusano
  • Patent number: D772265
    Type: Grant
    Filed: March 19, 2015
    Date of Patent: November 22, 2016
    Assignee: PFU Limited
    Inventors: Nao Honda, Kiichi Taniho, Tetsuo Oda, Shinichiro Kamimaru
  • Patent number: D782510
    Type: Grant
    Filed: March 19, 2015
    Date of Patent: March 28, 2017
    Assignee: PFU Limited
    Inventors: Nao Honda, Kiichi Taniho, Tetsuo Oda, Shinichiro Kamimaru