Patents by Inventor Tetsuo Shinomiya

Tetsuo Shinomiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device and method for continuous high-pressure treatment
    Patent number: 6640696
    Abstract: A device and a method for continuous high-pressure treatment; the method, comprising the steps of increasing the pressure of raw materials (25) in a feed tank (9) by a pressurizing pump (1) so as to continuously feed the raw material to treatment containers (6) and (6a) and increasing the flow rate of the pressurizing pump (1) over that of a depressurizing pump (2) or continuously exhausting the raw material from the treatment containers (6) and (6a) through a pressure regulating flow path resistance (59) while depressurizing; the device, comprising pressure releasing bypass circuits (55) disposed in the flow path resistance (59) in parallel with each other, wherein the insides of the treatment containers (6) and (6a) are kept in a specified high-pressure state during the continuous processing.
    Type: Grant
    Filed: August 9, 2002
    Date of Patent: November 4, 2003
    Assignees: The Japan Steel Works, Ltd., Kaneka Corporation
    Inventors: Koji Shinobudani, Tetsuo Shinomiya, Mitsuo Nagai, Nobuhiro Haramoto, Hiroshi Miyahara, Toshiyuki Ninomiya, Yasuharu Nosho, Shinichi Hashimoto, Masakazu Kato, Kazuhiro Ueshima
  • Device and method for continuous high-pressure treatment
    Publication number: 20030010295
    Abstract: A device and a method for continuous high-pressure treatment; the method, comprising the steps of increasing the pressure of raw material (25) in a feed tank (9) by a pressurizing pump (1) so as to continuously feed the raw material to treatment containers (6) and (6a) and increasing the flow rate of the pressurizing pump (1 ) over that of a depressurizing pump (2) or continuously exhausting the raw material from the treatment containers (6) and (6a) through a pressure regulating flow path resistance (59) while depressurizing; the device, comprising pressure releasing bypass circuits (55) disposed in the flow path resistance (59) in parallel with each other, wherein the insides of the treatment containers (6) and (6a) are kept in a specified high-pressure state during the continuous processing.
    Type: Application
    Filed: August 9, 2002
    Publication date: January 16, 2003
    Inventors: Koji Shinobudani, Tetsuo Shinomiya, Mitsuo Nagai, Nobuhiro Haramoto, Hiroshi Miyahara, Toshiyuki Ninomiya, Yasuharu Nosho, Shinichi Hashimoto, Masakazu Kato, Kazuhiro Ueshima