Patents by Inventor Tetsuo Sugiyama

Tetsuo Sugiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8247315
    Abstract: By an evacuation unit including first and second turbo molecular pumps connected in series, the ultimate pressure in a reaction chamber is reduced to ultra-high vacuum. By a knife-edge-type metal-seal flange, the amount of leakage in the reaction chamber is reduced. A microcrystalline semiconductor film and an amorphous semiconductor film are stacked in the same reaction chamber where the pressure is reduced to ultra-high vacuum. By forming the amorphous semiconductor film covering the surface of the microcrystalline semiconductor film, oxidation of the microcrystalline semiconductor film is prevented.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: August 21, 2012
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Makoto Furuno, Tetsuo Sugiyama, Taichi Nozawa, Mitsuhiro Ichijo, Ryota Tajima, Shunpei Yamazaki
  • Publication number: 20090233425
    Abstract: By an evacuation unit including first and second turbo molecular pumps connected in series, the ultimate pressure in a reaction chamber is reduced to ultra-high vacuum. By a knife-edge-type metal-seal flange, the amount of leakage in the reaction chamber is reduced. A microcrystalline semiconductor film and an amorphous semiconductor film are stacked in the same reaction chamber where the pressure is reduced to ultra-high vacuum. By forming the amorphous semiconductor film covering the surface of the microcrystalline semiconductor film, oxidation of the microcrystalline semiconductor film is prevented.
    Type: Application
    Filed: March 10, 2009
    Publication date: September 17, 2009
    Inventors: Makoto FURUNO, Tetsuo SUGIYAMA, Taichi NOZAWA, Mitsuhiro ICHIJO, Ryota TAJIMA, Shunpei YAMAZAKI