Patents by Inventor Tetsuro Komukai

Tetsuro Komukai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7153613
    Abstract: The invention relates to a process for the fabrication of an optical fiber-processing phase mask that is reduced in terms of pitch variations on the mask and stitching errors, and provides a process for the fabrication of a chirped type optical fiber-processing phase mask wherein a grating form of grooves provided in one surface of a quartz substrate is configured as an optical fiber-processing grating pattern. At an exposure step, writing data obtained by arranging and compiling a plurality of data for a repetitive groove-and-strip pattern while the pitch of repetition is modulated are used and an electron beam resist is provided on a phase mask blank, so that writing is carried out all over the writing area on said phase mask blank continuously in a vertical direction to said grating form of grooves.
    Type: Grant
    Filed: September 3, 2002
    Date of Patent: December 26, 2006
    Assignees: Dai Nippon Printing Co., Ltd., Nippon Telegraph and Telephone Corporation
    Inventors: Masaaki Kurihara, Shigekazu Fujimoto, Tetsuro Komukai, Tetsuro Inui
  • Patent number: 6876792
    Abstract: The present invention relates to a precision phase mask for forming diffraction grating in optical fiber and optical waveguide, to provide them with nonlinear chirped grating for dispersion compensation use and having low fluctuation or crosstalk in the group delay characteristics. The diffraction grating is formed by means of interference fringe between diffracted lights of different orders, in which the cycle of the diffraction grating 20 increases nonlinearly, wherein plurality of diffraction gratings G1, G2, G3 . . . having different cycles are assembled on a plane in increasing order of the cycle with the directions of the diffraction gratings directed to the same direction, and assembled in such a manner that, where the cycle of grating changes nonlinearly and discontinuously, the regions having larger rate of change of the cycle contain proportionally more discontinuous phases per unit length.
    Type: Grant
    Filed: April 21, 2003
    Date of Patent: April 5, 2005
    Assignees: Dai Nippon Printing Co., Ltd., Nippon Telegraph and Telephone Corporation
    Inventors: Masaaki Kurihara, Shigekazu Fujimoto, Tetsuro Komukai, Tetsuro Inui
  • Patent number: 6795614
    Abstract: The present invention relates to a method of producing an optical fiber-processing phase mask having minimized connection errors that may degrade the spectral line shape and group delay characteristics of an optical fiber diffraction grating fabricated by using the phase mask. The present invention provides a method of producing an optical fiber-processing phase mask having a repeating pattern of grating-shaped grooves and strips provided on one surface of a transparent substrate, so that diffracted light produced by the repeating pattern is applied to an optical fiber to fabricate a diffraction grating in the optical fiber by interference fringes of diffracted light of different orders.
    Type: Grant
    Filed: October 25, 2001
    Date of Patent: September 21, 2004
    Assignees: Dai Nippon Printing Co., Ltd., Nippon Telegraph and Telephone Corporation
    Inventors: Toshikazu Segawa, Masaaki Kurihara, Tetsuro Komukai, Masataka Nakazawa
  • Publication number: 20040005117
    Abstract: The present invention relates to a precision phase mask for forming diffraction grating in optical fiber and optical waveguide, to provide them with nonlinear chirped grating for dispersion compensation use and having low fluctuation or crosstalk in the group delay characteristics. The diffraction grating is formed by means of interference fringe between diffracted lights of different orders, in which the cycle of the diffraction grating 20 increases nonlinearly, wherein plurality of diffraction gratings G1, G2, G3 . . . having different cycles are assembled on a plane in increasing order of the cycle with the directions of the diffraction gratings directed to the same direction, and assembled in such a manner that, where the cycle of grating changes nonlinearly and discontinuously, the regions having larger rate of change of the cycle contain proportionally more discontinuous phases per unit length.
    Type: Application
    Filed: April 21, 2003
    Publication date: January 8, 2004
    Inventors: Masaaki Kurihara, Shigekazu Fujimoto, Tetsuro Komukai, Tetsuro Inui
  • Patent number: 6631145
    Abstract: An arrayed-waveguide grating (AWG) is provided in a tunable mode-locked laser resonator where when a clock signal corresponding to a predetermined wavelength is input, the arrayed-waveguide grating (AWG) generates an output signal having an oscillation wavelength which has an arbitrary wavelength interval independent of the wavelength of said clock signal and a different propagation delay for each wavelength. Furthermore, a transmitter and a wavelength converter is provided that uses a tunable mode-locked laser where the frequency of the clock signal determines the wavelength and where a transmitted data signal at a fixed data rate is generated by setting the clock signal frequency sufficiently higher than the data rate. Furthermore, a wavelength converter and wavelength router is provided that uses said tunable mode-locked laser and in which the output wavelength is determined by extracting said clock signal from the input data signal.
    Type: Grant
    Filed: July 27, 2000
    Date of Patent: October 7, 2003
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Kohichi Robert Tamura, Masataka Nakazawa, Tetsuro Komukai
  • Publication number: 20030077039
    Abstract: The invention relates to a process for the fabrication of an optical fiber-processing phase mask that is reduced in terms of pitch variations on the mask and stitching errors, and provides a process for the fabrication of a chirped type optical fiber-processing phase mask wherein a grating form of grooves provided in one surface of a quartz substrate is configured as an optical fiber-processing grating pattern. At an exposure step, writing data obtained by arranging and compiling a plurality of data for a repetitive groove-and-strip pattern while the pitch of repetition is modulated are used and an electron beam resist is provided on a phase mask blank, so that writing is carried out all over the writing area on said phase mask blank continuously in a vertical direction to said grating form of grooves.
    Type: Application
    Filed: September 3, 2002
    Publication date: April 24, 2003
    Inventors: Masaaki Kurihara, Shigekazu Fujimoto, Tetsuro Komukai, Tetsuro Inui
  • Publication number: 20030006212
    Abstract: The present invention relates to a method of producing an optical fiber-processing phase mask having minimized connection errors that may degrade the spectral line shape and group delay characteristics of an optical fiber diffraction grating fabricated by using the phase mask. The present invention provides a method of producing an optical fiber-processing phase mask having a repeating pattern of grating-shaped grooves and strips provided on one surface of a transparent substrate, so that diffracted light produced by the repeating pattern is applied to an optical fiber to fabricate a diffraction grating in the optical fiber by interference fringes of diffracted light of different orders.
    Type: Application
    Filed: October 25, 2001
    Publication date: January 9, 2003
    Inventors: Toshikazu Segawa, Masaaki Kurihara, Tetsuro Komukai, Masataka Nakazawa
  • Patent number: 6466714
    Abstract: The invention relates to a method of fabricating an optical fiber-processing phase mask in which a stitching error ascribable to a deterioration in the wavelength selectivity of the optical fiber diffraction grating to be fabricated is reduced. At an exposure step, a writing stage 5 with a phase mask blank 10 placed thereon is continuously fed in one direction while portions of the phase mask blank corresponding to grooves 26 or strips 27 in a direction perpendicular to the direction of feeding are sequentially scanned with writing beams 14, whereby the entire area of the phase mask blank 10 to be written is continuously written.
    Type: Grant
    Filed: April 27, 1999
    Date of Patent: October 15, 2002
    Assignee: Dai Nippon Printing Co., Ltd. and Nippon Telegraph and Telephone Corporation
    Inventors: Masaaki Kurihara, Toshikazu Segawa, Tetsuro Komukai, Masataka Nakazawa