Patents by Inventor Tetsuro Takeya

Tetsuro Takeya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5756654
    Abstract: Disclosed is a process for manufacturing polyarylene sulfide comprising pre-polymerizing a dihalogeno-aromatic compound with a liquid or gaseous sulfur compound in the presence of a lithium compound in an aprotic organic solvent followed by further polymerizing the resulting pre-polymerized system; which is characterized in that sufficient water is added to the pre-polymerized solution (I) to separate it into a tick polymer phase and a solvent phase, then a solvent is added to the thus-separated, thick polymer phase and the resulting polymer phase is further polymerized, for efficiently manufacturing high-purity polyarylene sulfide. The process does not require any complicated steps of washing the polymer with a multi-stage washing system and is free from the increase in the production costs of the polymer. In the process, the lithium salt used can be recovered efficiently.
    Type: Grant
    Filed: August 21, 1996
    Date of Patent: May 26, 1998
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Kiyoshi Sase, Kohji Namiki, Tetsuro Takeya
  • Patent number: 4749775
    Abstract: Polyester polymers consisting essentially of repeating units having the formula ##STR1## repeating units having the formula--O--Ar.sup.1 --CO-- [II],repeating units having the formula--O--Ar.sup.2 --O-- [III],and repeating units having the formula ##STR2## wherein Ar.sup.1 is selected from ##STR3## Ar.sup.2 is selected from ##STR4## halogen substituted radicals of these radicals, and ##STR5## wherein X is selected from --O--, --S--, --SO.sub.2 --, --CO--, --O(CH.sub.2).sub.n O--.--CH.sub.2).sub.n, and ##STR6## wherein each n independently represents a member having a value of from 1 to 10, and each R.sup.4 is independently selected from alkyl radicals of 1 to 5 carbon atoms, andR.sup.2 and R.sup.3 are independently selected from hydrogen atom, halogen radicals, alkyl radicals of 1 to 5 carbon atoms, and phenyl radical, and R.sup.2 and R.sup.3 may be identical or different from each other, andR.sup.
    Type: Grant
    Filed: July 7, 1987
    Date of Patent: June 7, 1988
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Tetsuro Takeya, Tatsuya Tomioka, Shigeru Murakami, Kenkichi Takahashi