Patents by Inventor Tetsushi Takahashi
Tetsushi Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240119866Abstract: To calculate PageRank with high accuracy using transaction data held by a plurality of data sources as input and keeping the transaction data of each data source secret. A data source apparatus (1) calculates a transaction rate for each combination of transaction entities (S12). The data source apparatus (1) encrypts the transaction rate and transmits the encrypted transaction rate to each secure computation apparatus (2) (S13). Each secure computation apparatus (2) receives a ciphertext of the transaction rate from a plurality of data source apparatuses (1) (S21). The secure computation apparatus (2) securely calculates a ciphertext which becomes, when decrypted, PageRank of the computational objective transaction entity by using the ciphertext of the transaction rate related to the computational objective transaction entity and the ciphertext of the PageRank of a transaction counterpart (S22).Type: ApplicationFiled: February 10, 2021Publication date: April 11, 2024Applicant: NIPPON TELEGRAPH AND TELEPHONE CORPORATIONInventors: Satoshi TAKAHASHI, Tetsushi MORITA, Osamu TAKINO
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Patent number: 8757777Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: GrantFiled: August 22, 2013Date of Patent: June 24, 2014Assignee: Seiko Epson CorporationInventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
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Publication number: 20130335485Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: ApplicationFiled: August 22, 2013Publication date: December 19, 2013Applicant: SEIKO EPSON CORPORATIONInventors: Akira MATSUZAWA, Mutsuhiko OTA, Tetsushi TAKAHASHI, Yasuyuki MATSUMOTO
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Patent number: 8534800Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: GrantFiled: November 30, 2012Date of Patent: September 17, 2013Assignee: Seiko Epson CorporationInventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
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Patent number: 8342656Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: GrantFiled: November 18, 2011Date of Patent: January 1, 2013Assignee: Seiko Epson CorporationInventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
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Publication number: 20120062655Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: ApplicationFiled: November 18, 2011Publication date: March 15, 2012Applicant: SEIKO EPSON CORPORATIONInventors: Akira MATSUZAWA, Mutsuhiko OTA, Tetsushi TAKAHASHI, Yasuyuki MATSUMOTO
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Patent number: 8061813Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: GrantFiled: September 12, 2007Date of Patent: November 22, 2011Assignee: Seiko Epson CorporationInventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
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Patent number: 7850288Abstract: An ink jet recording head comprising: a nozzle orifice for jetting ink; an ink chamber communicating with the nozzle; a diaphragm for pressurizing ink in the ink chamber; a piezoelectric thin film on the diaphragm; and an electrode for the piezoelectric thin film wherein the piezoelectric thin film and the electrode are patterned to the same shape.Type: GrantFiled: October 24, 2006Date of Patent: December 14, 2010Assignee: Seiko Epson CorporationInventors: Tsutomu Hashizume, Tetsushi Takahashi
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Patent number: 7827659Abstract: A method of manufacturing an ink jet recording head. The method includes providing a laminated structure in which a first electrode layer is located on a diaphragm, a piezoelectric layer is located on the first electrode layer, and a second electrode layer is located on the piezoelectric layer and etching the first electrode layer, the second electrode layer and the piezoelectric layer so that a portion of the diaphragm is exposed. In this method, at least the second electrode layer and the piezoelectric layer are etched simultaneously.Type: GrantFiled: August 24, 2007Date of Patent: November 9, 2010Assignee: Seiko Epson CorporationInventors: Tsutomu Hashizume, Tetsushi Takahashi
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Patent number: 7789495Abstract: A liquid ejection head including: a flow-channel forming substrate having a pressure generating chamber which communicates with a liquid supply channel which communicates with one end of the pressure generating chamber in terms of a first direction so as to have a first length for supplying liquid to the pressure generating chamber; and a pressure generating unit that causes the change in pressure in the pressure generating chamber, wherein the liquid supply channel is formed by narrowing the width of the pressure generating chamber in a second direction substantially perpendicular to the first direction so as to have a second length shorter than the first length, a stepped surface is formed between the side surface of the pressure generating chamber in the second direction and the side surface of the liquid supply channel in the second direction, and wherein a bridge is provided at a corner defined by the stepped surface, the side surface of the pressure generating chamber in the second direction on the stepType: GrantFiled: July 31, 2007Date of Patent: September 7, 2010Assignee: Seiko Epson CorporationInventors: Yasuyuki Matsumoto, Tetsushi Takahashi, Akira Matsuzawa
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Patent number: 7673975Abstract: An ink jet recording head comprising: a nozzle orifice for jetting ink; an ink chamber communicating with the nozzle; a diaphragm for pressurizing ink in the ink chamber; a piezoelectric thin film on the diaphragm; and an electrode for the piezoelectric thin film wherein the piezoelectric thin film and the electrode are patterned to the same shape.Type: GrantFiled: July 7, 2006Date of Patent: March 9, 2010Assignee: Seiko Epson CorporationInventors: Tsutomu Hashizume, Tetsushi Takahashi
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Patent number: 7381341Abstract: Disclosed is a method of manufacturing a liquid jet head, which enables a passage-forming substrate to be easily handled, thus realizing good formation of pressure generating chambers and an improvement in manufacturing efficiency. The method includes the steps of: forming a vibration plate and piezoelectric elements on one surface of the passage-forming substrate; thermally adhering a reinforcing substrate for reinforcing the rigidity of the passage-forming substrate, onto the passage-forming substrate; processing the passage-forming substrate to have a predetermined thickness; depositing an insulation film on other surface of the passage-forming substrate at lower temperature than that for adhering the passage-forming substrate and the reinforcing substrate, and patterning the insulation film into a predetermined shape; and etching the passage-forming substrate using the patterned insulation film as a mask to form the pressure generating chambers.Type: GrantFiled: January 19, 2005Date of Patent: June 3, 2008Assignee: Seiko Epson CorporationInventors: Masato Shimada, Tetsushi Takahashi
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Patent number: 7354140Abstract: An ink jet recording head comprising: a nozzle orifice for jetting ink; an ink chamber communicating with the nozzle; a diaphragm for pressurizing ink in the ink chamber; a piezoelectric thin film on the diaphragm; and an electrode for the piezoelectric thin film wherein the piezoelectric thin film and the electrode are patterned to the same shape.Type: GrantFiled: June 26, 2003Date of Patent: April 8, 2008Assignee: Seiko Epson CorporationInventors: Tsutomu Hashizume, Tetsushi Takahashi
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Publication number: 20080062225Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: ApplicationFiled: September 12, 2007Publication date: March 13, 2008Applicant: SEIKO EPSON CORPORATIONInventors: Akira MATSUZAWA, Mutsuhiko OTA, Tetsushi TAKAHASHI, Yasuyuki MATSUMOTO
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Publication number: 20080030552Abstract: A liquid ejection head including: a flow-channel forming substrate having a pressure generating chamber which communicates with a liquid supply channel which communicates with one end of the pressure generating chamber in terms of a first direction so as to have a first length for supplying liquid to the pressure generating chamber; and a pressure generating unit that causes the change in pressure in the pressure generating chamber, wherein the liquid supply channel is formed by narrowing the width of the pressure generating chamber in a second direction substantially perpendicular to the first direction so as to have a second length shorter than the first length, a stepped surface is formed between the side surface of the pressure generating chamber in the second direction and the side surface of the liquid supply channel in the second direction, and wherein a bridge is provided at a corner defined by the stepped surface, the side surface of the pressure generating chamber in the second direction on the stepType: ApplicationFiled: July 31, 2007Publication date: February 7, 2008Applicant: SEIKO EPSON CORPORATIONInventors: Yasuyuki MATSUMOTO, Tetsushi TAKAHASHI, Akira MATSUZAWA
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Patent number: 7318277Abstract: A method of manufacturing a liquid jet head includes the steps of: forming a piezoelectric element on one plane of a passage-forming substrate with a vibration plate interposed therebetween, and removing the vibration plate in an area where a communicating portion is formed, thus forming a penetrated hole; forming a predetermined metal layer on the one plane of the passage-forming substrate on which the piezoelectric element is formed to seal the penetrated hole with the metal layer, and patterning the metal layer in an area corresponding to the piezoelectric element, thus forming a lead electrode; adhering a reservoir-forming plate, in which a reservoir portion is formed, to the one plane of the passage-forming substrate; wet-etching the passage-forming substrate from the other plane thereof until the vibration plate and the metal layer are exposed, thus forming a pressure generating chamber and the communicating portion; and removing the metal layer by etching to allow the reservoir portion and the communicType: GrantFiled: May 20, 2005Date of Patent: January 15, 2008Assignee: Seiko Epson CorporationInventors: Tatsuro Torimoto, Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi
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Publication number: 20080001502Abstract: An ink jet recording head comprising: a nozzle orifice for jetting ink; an ink chamber communicating with the nozzle; a diaphragm for pressurizing ink in the ink chamber; a piezoelectric thin film on the diaphragm; and an electrode for the piezoelectric thin film wherein the piezoelectric thin film and the electrode are patterned to the same shape.Type: ApplicationFiled: August 24, 2007Publication date: January 3, 2008Applicant: Seiko Epson CorporationInventors: Tsutomu Hashizume, Tetsushi Takahashi
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Publication number: 20070103517Abstract: An ink jet recording head comprising: a nozzle orifice for jetting ink; an ink chamber communicating with the nozzle; a diaphragm for pressurizing ink in the ink chamber; a piezoelectric thin film on the diaphragm; and an electrode for the piezoelectric thin film wherein the piezoelectric thin film and the electrode are patterned to the same shape.Type: ApplicationFiled: October 24, 2006Publication date: May 10, 2007Inventors: Tsutomu Hashizume, Tetsushi Takahashi
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Patent number: RE39474Abstract: An A method of manufacturing an ink-jet recording head comprising: which includes an elastic sheet providing facing pressure generating chambers; , nozzle orifices, each communicating with the pressure generating chambers; , and piezoelectric vibrators formed on the elastic sheet, each of the piezoelectric vibrators having, a lower electrode formed on the elastic sheet, the method including forming a piezoelectric layer formed on the lower electrode, and forming an upper electrode formed on the piezoelectric layer such that the upper electrode faces the respective pressure generating chamber, wherein the area where the lower electrode, piezoelectric layer and upper electrode overlap is located within an area defined by the pressure generating chamber in the longitudinal direction thereof.Type: GrantFiled: December 16, 2002Date of Patent: January 23, 2007Assignee: Seiko Epson CorporationInventors: Tsutomu Hashizume, Tetsushi Takahashi, Akira Matsuzawa
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Patent number: RE45057Abstract: A method of manufacturing an ink jet recording head. The method includes providing a laminated structure in which a first electrode layer is located on a diaphragm, a piezoelectric layer is located on the first electrode layer, and a second electrode layer is located on the piezoelectric layer and etching the first electrode layer, the second electrode layer and the piezoelectric layer so that a portion of the diaphragm is exposed. In this method, at least the second electrode layer and the piezoelectric layer are etched simultaneously.Type: GrantFiled: November 9, 2012Date of Patent: August 5, 2014Assignee: Seiko Epson CorporationInventors: Tsutomu Hashizume, Tetsushi Takahashi